4 results about "Chloroxylenol" patented technology

Applicants have developed novel methods and compositions for treating, preventing or ameliorating the effects plant phytopathogen infestation in plants, including of Candidatus Liberibacter spp. the causal agents of citrus greening and potato zebrachip disease. Novel compositions include one or more active agents of aminocaproic acid, carbinoxamine maleate, chloroxylenol, chlorpropamide, cinoxacin, duartin, and cyclopentolate hydrochloride as well as their derivatives, or salt / acid forms thereof. Methods of preventing disease development and infestation by plant pathogens are disclosed as well as methods of making, using and producing such compositions.

An antibacterial cleansing composition including from about 0.01% to about 1% of chloroxylenol by weight of the composition; from about 5% to about 15% of sodium lauryl sulfate by weight of the composition; from about 1% to about 5% of a co-surfactant by weight of the composition, wherein the co-surfactant is selected from zwitterionic surfactant, amphoteric surfactant, nonionic surfactant, or combinations thereof; wherein the weight ratio of sodium lauryl sulfate to the co-surfactant ranges from about 3:1 to about 5:1; and wherein the composition comprises a pH of from about 2 to about 5.

Applicants have developed novel methods and compositions for treating, preventing or ameliorating the effects plant phytopathogen infestation in plants, including of Candidatus Liberibacter spp. the causal agents of citrus greening and potato zebrachip disease. Novel compositions include one or more active agents of aminocaproic acid, carbinoxamine maleate, chloroxylenol, chlorpropamide, cinoxacin, duartin, and cyclopentolate hydrochloride as well as their derivatives, or salt / acid forms thereof. Methods of preventing disease development and infestation by plant pathogens are disclosed as well as methods of making, using and producing such compositions.

The present invention provides a wafer cleaning solution and a method for producing the same. [Solution] The wafer cleaning solution comprises a nonionic surfactant, an anionic surfactant, an antibacterial agent, a pH adjuster, and water. The number-average molecular weight of the nonionic surfactant is 3,000 to 6,000. The anionic surfactant is selected from at least one of the group consisting of sodium lauryl sulfate and polyethylene glycol tridecyl ether phosphate. The acid dissociation constant (pKa) of the pH adjuster is 1.38 to 4.76. The antibacterial agent is selected from at least one of the group consisting of kathon, methylisothiazolinone, triclosan, chloroxyllenol, methacrylate oxide decylpyridinium bromide salt, and quaternary ammonium salt compounds.