Patents
Literature
Hiro is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Hiro

41 results about "Cyclononane" patented technology

Cyclononane is an alicyclic hydrocarbon consisting of a ring of nine carbon atoms. Its molecular formula is C₉H₁₈.

Synthetic route and preparation method of irbesartan

The invention relates to a synthetic route and a preparation method of irbesartan. The method comprises three steps: (1) reacting a compound I (2-cyano-4'-methyl diphenyl), an inorganic salt oxidant, and an inorganic salt reductant in dichloromethane and water to form a compound IRB-02 (2-cyano-4'-bromomethylbiphenyl); (2) reacting a compound IRB-02, a compound IRB-01 (2-butyl-1, 3-diaza spiro [4.4] nonane-1-vinyl-4-ketone hydrochloride), tetrabutylammonium bromide and inorganic alkali in dichloromethane and water to obtain a compound IRB-03 (2-butyl-3-[(2-cyano biphenyl-4-base)methyl]-1,3-diaza spiro [4.4] nonane-1-vinyl-4-ketone); and (3) reacting a compound IRB-03, tetrabutylammonium bromide, zinc chloride and sodium azide in toluene to obtain the irbesartan.
Owner:珠海保税区丽珠合成制药有限公司

5-dichloroacetyl-3,6-dimethyl-3-ethyl-9-oxa-1,5-diazabicyclo[4.3.0]nonane and synthetic method

InactiveCN101381369AOvercome the shortcomings of serious pollutionHigh yieldBiocideOrganic chemistryNonaneOrganic synthesis
The invention relates to 5-dichloroacetyl-3, 6-dimethyl-3-ethyl-9-oxa-1, 5-diazabicylo (4.3.0) nonane and a synthesis method thereof, which belong to the organic synthesis technology. The structural formula of the 5-dichloroacetyl-3, 6-dimethyl-3-ethyl-9-oxa-1, 5-diazabicylo (4.3.0) nonane is as shown in a figure. The synthesis method is as follows: firstly, an acetylpropionic acid and 2-methyl-2-ethyl-1, 3-propylene diamine are taken as raw materials, and water in a system is separated in a solvent by the reflux water diversion method; secondly, the temperature of the system is reduced to 50 DEG C, and an acid-binding agent is added into the system to make the pH value of the system maintain 8.4; thirdly, the temperature of the system is controlled, dichloroacetyl chloride is dripped into the system to maintain constant pH value, and is stirred for a certain period; and fourthly, organic phases are washed into neutrality, and the product of the 5-dichloroacetyl-3, 6-dimethyl-3-ethyl-9-oxa-1, 5-diazabicylo (4.3.0) nonane is obtained after drying through anhydrous MgSO4, removal of a solvent and recrystallization of obtained coarse products by ethyl acetate-petroleum ether. The product and the method have the advantages of easily obtained raw materials, high yield, simple operation, short reaction period, low production cost and no environmental pollution.
Owner:NORTHEAST AGRICULTURAL UNIVERSITY

Photoresist resin monomer synthesized from 3-ethylbicyclo[3.3.1]nonane-2,4-dione, and synthesis method thereof

The invention discloses a photoresist resin monomer synthesized from 3-ethylbicyclo[3.3.1]nonane-2,4-dione, and a synthesis method thereof, and belongs to the technical fields of chemical synthesis and photoetching. The structural general formula of the photoresist resin monomer is represented by formula I shown in the description; and in the formula I, R1 is saturated alkane or cycloalkane, and R2 is hydrogen or a methyl group. The synthesis method comprises the following steps: carrying out a Grignard reaction on 3-ethylbicyclo[3.3.1] nonane-2,4-dione and an alkyl Grignard reagent or a cycloalkyl Grignard reagent under the protection of an inert gas, adding water for quenching after the Grignard reaction is finished, and carrying out post-treatment purification to obtain an intermediate;and carrying out an esterification reaction on the intermediate and acryloyl chloride or methacryloyl chloride, and carrying out post-treatment purification after the esterification reaction is finished in order to obtain the resin monomer. The resin monomer is a degradable resin monomer, and polymer resin containing the resin monomer has good etching resistance and can improve the resolution ofphotoresist photoetching patterns.
Owner:上海博栋化学科技有限公司

H-GI-POF high-temperature optical fiber and preparation method thereof

The invention belongs to the technical field of optical fibers, and particularly relates to an h-GI-POF high-temperature optical fiber and a preparation method thereof. The h-GI-POF high-temperature light-guide fiber comprises an inner core layer and an outer skin layer, the inner core layer and the outer skin layer are arranged in a concentric structure, the inner core layer and the outer skin layer are composed of high polymers with different refractive indexes, the high polymers are formed by copolymerization of perfluorodioxolane and perfluoro dioxin bicyclononane, and the refractive indexof the inner core layer is larger than that of the outer skin layer. The inner core layer is integrally formed by five core layers of which the refractive indexes are gradually reduced from the coreto the outside, and the outer skin layer is formed by a single-layer skin layer, so that the transparency reaches 98% or above, the glass transition temperature Tg exceeds 150 DEG C, and the high-temperature optical fiber is suitable for ultra-high-speed communication. Compared with the SI-POF in the prior art, six layers of core materials are used, and each core layer has a gradual change refractive index, so that the incident light transmission delay is shorter than that of the common SI-POF, the signal transmission bandwidth is larger, and the transmission speed is higher.
Owner:中闽光纤科技有限公司

Quinolone analogue as well as preparation method and application thereof

The invention discloses a quinolone analogue and a preparation method and application thereof.The preparation method comprises the steps that S, S-2, 8-diazo-bicyclo [4.3. 0] nonane is dissolved in an organic solvent, and organic alkali is added; dissolving di-tert-butyl dicarbonate in an organic solvent, and dropwise adding into the reaction system to react to obtain a compound 1; dissolving the compound 1, slowly adding sodium hydride at 0-10 DEG C, and uniformly dispersing; the preparation method comprises the following steps: adding a compound 1 into a reaction system, dropwise adding a 1-cyclopropyl-6, 7-difluoro-8-methoxy-1, 4-dihydro-4-oxo-3-quinoline carboxylic acid solution into the reaction system, and reacting to obtain a compound 2; and dissolving the compound 2, and adding acid for reaction to obtain a compound 3, namely the target quinolone analogue. The preparation method of the quinolone analogue is simple and easy to implement, and the quinolone analogue can be prepared on a large scale. When the quinolone analogue is used for detecting related substances of moxifloxacin hydrochloride and preparations thereof, the quality of moxifloxacin hydrochloride can be further improved, the safety is improved, and the risk of medication is reduced.
Owner:CHANGZHOU FANGYUAN PHARMA +1
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products