Three methods for the preparation of polyhedral oligomeric silsesquioxanes (POSS) using the action of bases capable of attacking silicon atoms or any other compounds capable of reacting with protic solvents (such as ROH, H2O, etc.) and producing hydroxides[ OH]-, alkoxide [RO]- and other compounds. The first method utilizes these bases to effectively redistribute the silicon-oxygen framework in polymerized silsesquioxane [RSiO1.5]∞ into POSS nanostructures, that is, the formula [(RSiO1.5)n]∑ The homoleptic segment shown in #, the functionalized homoleptic segment shown in [(RXSiO1.5)n]∑#, the heterogeneous segment shown in [(RSiO1.5)m(R'SiO1.5)n]∑# Segment (heteroleptic) and {(RSiO1.5)m(RXSiO1.0)n}∑ #shown as a functionalized heterosegment nanostructure, where ∞=1-1,000,000 or higher. The second method uses a base to help form POSS nanostructures from silane RSiX3 and linear or cyclic silsesquioxanes of the formula RX2Si-(OSiRX)m-OSiRX2, that is, the formula [(RSiO1.5)n ]∑#, the homogeneous segment shown in [(RSiO1.5)m(R'SiO1.5)n]∑# and the miscellaneous segment shown in [(RSiO1.5)m(RXSiO1.0)n]∑# Functionalized heterosegment nanostructures, where m=0-10, X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO and R. The third method utilizes bases to selectively open silicon-oxygen-silicon (Si-O-Si) bonds in the POSS structure to form POSS species with incompletely condensed nanostructures. These methods also provide control over the stereochemistry of X. The three methods can generate new POSS species, which can be finally transformed into POSS species suitable for polymerization, grafting or other desired chemical reactions after additional chemical control.