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1100 results about "Protic solvent" patented technology

In chemistry, a protic solvent is a solvent that has a hydrogen atom bound to an oxygen (as in a hydroxyl group), a nitrogen (as in an amine group) or a fluorine (as in hydrogen fluoride). In general terms, any solvent that contains a labile H⁺ is called a protic solvent. The molecules of such solvents readily donate protons (H⁺) to reagents. Conversely, aprotic solvents cannot donate hydrogen.

Process for the formation of polyhedral oligomeric silsesquioxanes

Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]−, alkoxide [RO]−′, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ∞=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)nΣ#, homoleptic, [(RXSiO1.5)n]Σ#, functionalized homoleptic, [(RSiO1.5)m(R′SiO1.5)n]Σ#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}Σ#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]Σ# homoleptic and [(RSiO1.5)m(R′SiO1.5)n]Σ# heteroleptic and [(RSiO1.5)m(RXSiO1.0)n]Σ# functionalized heteroleptic nanostructures from silanes RSiX3 and linear or cyclic silsesquioxanes of the formula RX2Si—(OSiRX)m—OSiRX2 where m=0-10, X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R. The third process utilizes base to selectively ring-open the silicon-oxygen-silicon (Si—O—Si) bonds in POSS structures to form POSS species with incompletely condensed nanostructures. These processes also afford stereochemical control over X. The three processes result in new POSS species that can undergo additional chemical manipulations to ultimately be converted into POSS-species suitable for polymerization, grafting, or other desirable chemical reactions.
Owner:HYBRID PLASTICS INC

Method for preparing polyimide/ silicon dioxide hollow micro-sphere composite film

The invention discloses a method for preparing polyimide/silicon dioxide hollow microballoon laminated film which has low dielectric constant and keeps thermal property, and steps of reaction are that: silicon dioxide hollow microballoon is put into ethanol solution, amino-containing silane coupling agent is added after ultra sonic dispersion, stirred for reaction, separated centrifugally, washed and dried; then under the protection of nitrogen flow, the dianhydride and the diamine with a mole-ratio 1:1 are added into the high boiling polarity aprotic solvent to prepare solvent containing 10 percent (wt/wt) of solid-content; the silicon dioxide hollow microballoon modified by silane coupling agent is put into the solvent, and the weight of the silicon dioxide hollow microballoon modified by the silane coupling agent is 2-50 percent of the weight of laminated film, the polyamide acid viscous fluid is prepared upon ultra sonic dispersion and a reaction of twenty-four hours at room temperature; the polyamide acid viscous fluid is taken and poured into the glass plate mould; finally the mould is put in vacuum to dry, the temperature is heated up continuously after the solvent is removed for cyclic reaction. Thus, the polyimide/silicon dioxide hollow microballoon laminated film is prepared..
Owner:SOUTHEAST UNIV

Method for Specifically Detecting Analyte Using Photocurrent, and Electrode, Measuring Cell and Measuring Device for Use Therein

A method, an electrode, a measuring cell, and a measuring device are disclosed which can detect and quantitatively determine an analyte having specific bonding properties, in a highly sensitive, simple and accurate manner using photocurrent. This method comprises contacting a working electrode and a counter electrode with an electrolyte medium, wherein the working electrode has an analyte immobilized thereon through a probe substance and wherein the analyte is bonded to a sensitizing dye; irradiating the working electrode with light to photoexcite the sensitizing dye; and detecting photocurrent flowing between the working electrode and the counter electrode, wherein the photocurrent is generated by transfer of electrons from the photoexcited sensitizing dye to the working electrode. The working electrode comprises an electron accepting layer comprising an electron accepting substance capable of accepting electrons released from the sensitizing dye in response to photoexcitation, wherein the probe substance is supported on a surface of the electron accepting layer. The electron accepting substance is an oxide semiconductor having an energy level lower than that of a lowest unoccupied molecular orbit (LUMO) of the sensitizing dye. The electrolyte medium comprises an electrolyte and at least one solvent selected from an aprotic solvent and a protic solvent, wherein the electrolyte comprises a salt capable of providing an oxidized sensitizing dye with electrons.
Owner:TOTO LTD

Process for the formation of polyhedral oligomeric silsesquioxanes

Three methods for the preparation of polyhedral oligomeric silsesquioxanes (POSS) using the action of bases capable of attacking silicon atoms or any other compounds capable of reacting with protic solvents (such as ROH, H2O, etc.) and producing hydroxides[ OH]-, alkoxide [RO]- and other compounds. The first method utilizes these bases to effectively redistribute the silicon-oxygen framework in polymerized silsesquioxane [RSiO1.5]∞ into POSS nanostructures, that is, the formula [(RSiO1.5)n]∑ The homoleptic segment shown in #, the functionalized homoleptic segment shown in [(RXSiO1.5)n]∑#, the heterogeneous segment shown in [(RSiO1.5)m(R'SiO1.5)n]∑# Segment (heteroleptic) and {(RSiO1.5)m(RXSiO1.0)n}∑ #shown as a functionalized heterosegment nanostructure, where ∞=1-1,000,000 or higher. The second method uses a base to help form POSS nanostructures from silane RSiX3 and linear or cyclic silsesquioxanes of the formula RX2Si-(OSiRX)m-OSiRX2, that is, the formula [(RSiO1.5)n ]∑#, the homogeneous segment shown in [(RSiO1.5)m(R'SiO1.5)n]∑# and the miscellaneous segment shown in [(RSiO1.5)m(RXSiO1.0)n]∑# Functionalized heterosegment nanostructures, where m=0-10, X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO and R. The third method utilizes bases to selectively open silicon-oxygen-silicon (Si-O-Si) bonds in the POSS structure to form POSS species with incompletely condensed nanostructures. These methods also provide control over the stereochemistry of X. The three methods can generate new POSS species, which can be finally transformed into POSS species suitable for polymerization, grafting or other desired chemical reactions after additional chemical control.
Owner:HYBRID PLASTICS INC
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