4 results about "Alloy deposition" patented technology

The application discloses a kind of heat insulation films and preparation methods thereof.The heat insulation film includes substrate layer, hard coating layer, first dielectric layer, first barrier layer, noble metal layer, second barrier layer, second dielectric layer and adhesive layer from inside to outside.The first dielectric layer is aluminum-doped zinc oxide, the noble metal layer is a silver-gold alloy layer with controllable thickness, and has a gradient distribution of gold content in the thickness direction;The second dielectric layer is formed into a layered composite structure by alternately stacking titanium dioxide and hafnium oxide.The preparation method includes substrate cleaning and surface activation, hard coating layer coating and curing, magnetron sputtering of dielectric layer and barrier layer, alloying deposition of noble metal layer, alternating sputtering of layered composite dielectric, and adhesive layer coating and compounding.The application realizes excellent infrared barrier performance while maintaining high visible light transmittance through the synergistic design of multi-layer structure and components, significantly improves the stability in a humid and hot environment, and reduces the risk of performance degradation.

The invention relates to a method for growing a ferroelectric layer (11) of a rhombohedral ferroelectric alloy on a substrate (10), wherein a growth sublayer (21) formed of a stack of crystalline sheets linked together by van der Waals bonds is arranged on the substrate, and then the rhombohedral crystalline ferroelectric alloy in the form of crystalline grains (12) is deposited onto the growth sublayer at a suitable temperature with a component that segregates between the crystalline grains. Figure for the abstract: Fig. 1.

Sliding element (1), comprising: a back sheet (10) made of steel as the outermost layer of the sliding element (1), a sintered lining (11) consisting of Cu, Bi and Sn, and an electroplated cover layer (12) as a sliding surface, which is formed from an alloy deposition film of Bi and Sb, wherein the cover layer (12) consists of Bi, Sb and unavoidable impurities, and wherein the Sb concentration on the surface of the cover layer (12) is 0.92 wt% or more and 2.1 wt% or less, wherein the cover layer (12) has a concentration gradient, wherein the Sb concentration increases as the depth or distance from the surface of the cover layer (12) increases.

This invention relates to the field of alloy material composition design and preparation technology, and particularly to a multi-component alloy deposition design method. Specifically, it includes the following steps: (1) proposing an alloy composition design model based on multi-target confocal magnetron sputtering technology; (2) based on the alloy composition design model, calculating the deposition rate, sputtering power, and sputtering time of each component according to the accurate multi-alloy target composition required for the study; (3) stacking and integrating alloy sublayers with different design compositions onto a single sample based on the above steps. The method provided by this invention can achieve accurate prediction and design of alloy composition, with a large controllable range, from 0-100 at.% and a prediction deviation of less than 5 at.%; it can achieve high-throughput preparation of alloy samples by combining alloy sublayers with multiple compositions onto a single sample through a single experimental procedure.