The invention relates to a nanometer grid, a nanometer polymer grid material and their preparation method and use method and belongs to the field of a photoelectric high and new technology. The nanometer polymer grid material is a homopolymer or copolymer utilizing the nanometer grid as a monomer and has a general structural formula shown in the following description. The nanometer polymer grid material has the characteristics that 1, the nanometer grid monomer has hole and semiconductor photoelectric characteristics, 2, raw materials are cheap and easily available, reaction conditions are mild and operation is easy, 3, the nanometer polymer grid material has excellent mechanical characteristics, 4, the nanometer polymer grid material has good solubility and is convenient for nanometer film or fibration processing, and 5, a rigid skeleton has the advantages of high glass-transition temperature, high heat, electrochemical stability and spectrum stability. The nanometer polymer grid material can be used as a novel nanometer polymer photoelectric material and has a good application prospect in the fields of organic electrons, spinning electrons, photoelectrons, mechano-electronic and nano-biology.