PendingCN122503155AEfficient and selective separationmeet needs
The application provides a carbonyl sulfur removal method and a carbonyl sulfur removal device. A complex promoter is introduced in the carbonyl sulfur removal process, and the complex promoter comprises a main promoter and an auxiliary promoter. The main promoter comprises a quaternaryammonium salt compound and / or a cyclic ether compound, and the auxiliary promoter comprises a sulfonate surfactant and / or a glycoside surfactant. The application can realize efficient and selective removal of carbonyl sulfur under the conditions of near normal temperature (1-21 DEG C) and low pressure (0.1-6.0 MPa), can improve the removal rate, reduce the loss of effective gas, eliminate secondary pollution, and can meet the actual needs of industrial continuous operation.
The invention discloses a method for selectively adsorbing copper ions by adopting an aspartic acidsilicon-based carbon dot material, and belongs to the technical field of nano material preparation and environmental pollution treatment. A surface-functionalized silicon-based carbon dot material is prepared by heating through a water bath method, the surface-functionalized silicon-based carbon dot material and an acid solution containing copper ions are mixed and subjected to ultrasonic treatment, and the copper ions in the solution are adsorbed by the aspartic acid silicon-based carbon dot material. The surface of the aspartic acid silicon-based carbon dot material is modified by functional groups, the functional groups can be combined with copper ions through coordinate bonds, the specific functional groups are introduced to selectively capture the copper ions for coordination to form a stable chelate, and the aspartic acid silicon-based carbon dot material can expose more adsorption sites and adsorb more copper ions.