107 results about "Radical oxidation" patented technology

The invention relates to a chemical mechanical grinding system and method for a hard and brittle semiconductor wafer, and the chemical mechanical grinding method comprises the following steps: preparing an oil-based thermal activity-optical activity composite grinding fluid by adopting an organic thermal decomposition type oxidizing agent, an organic optical decomposition oxidizing agent, polyethylene glycol, glycerol and vegetable oil; building an ultraviolet light-diamond abrasive grinding wheel chemical mechanical grinding platform which has an ultraviolet light irradiation function and is adjustable and controllable in irradiation intensity and ultraviolet light wavelength; the chemical mechanical grinding platform and the minimal quantity lubrication liquid supply device are started, and the wafer to be machined and the diamond abrasive grinding wheel are controlled to rotate relative to each other for opposite grinding; turning on an ultraviolet light generator to accurately irradiate the thermal activity-optical activity composite grinding liquid drops on the surface of the wafer, inducing a thermal decomposition type oxidizing agent and an optical decomposition type oxidizing agent to generate active free radicals by utilizing grinding heat energy and ultraviolet light irradiation energy, and initiating a free radical oxidation reaction of a wafer surface layer material to form an oxidation layer with low interface bonding force; the oxide layer on the surface of the wafer is removed through small-load micro-cutting of the diamond abrasive, and the semiconductor wafer with the subsurface almost free of mechanical damage is efficiently obtained.

The invention discloses a sludge treatment method and system, and relates to the field of solid waste treatment, and the method specifically comprises the following operation steps: S1, multi-frequency resonance pretreatment: destroying a sludge colloid structure through stepped mechanical vibration: collapsing an extracellular polymer network at a low frequency, breaking down microbial cell walls at an intermediate frequency to release intracellular water, pathogenic bacteria are inactivated through a high-frequency cavitation effect; s2, performing electrochemical in-situ flocculation; s3, gradient pressure dehydration; s4, low-temperature mineralization stabilization; and S5, vacuum condensation and recovery. According to the sludge treatment method and system, through stepped low-frequency, medium-frequency and high-frequency mechanical resonance, the colloid structure of the sludge can be directionally damaged, the fluidity of the sludge is remarkably improved, chemical conditioners are remarkably reduced, agent residues and secondary pollution are avoided, pathogens are physically inactivated through the high-frequency cavitation effect, and the treatment effect of the sludge is improved. Micro-nano oxygen bubbles are synchronously generated to strengthen free radical oxidation, and a sterile environment is created for subsequent mineralization.

The invention relates to the technical field of biomedicine, and discloses a triclosan antibacterial coating surgical suture and a preparation method thereof.The suture comprises a base material and a surface antibacterial coating, the base material is selected from one of an absorbable single-strand material, an absorbable multi-strand material, a non-absorbable single-strand material and a non-absorbable multi-strand material, and the surface antibacterial coating is selected from one of an absorbable multi-strand material and a non-absorbable multi-strand material; the antibacterial coating comprises triclosan, a high-molecular carrier and an auxiliary agent, the surface energy of a hydrophobic material is improved, the porosity of a hydrophilic material is increased, the adhesive force between the coating and different base materials is ensured, the base materials can be covered, the uniformity deviation of the coating is avoided, and the coating is free of cracking or falling off through the combination of plasma cleaning and roughening treatment on the surface of the base materials. A synergistic system is formed by triclosan, nano-silver and titanium dioxide, a dual mechanism of targeted destruction of bacterial cell membranes and free radical oxidation is achieved, the antibacterial rate is increased, the MRSA inhibition rate is increased, the degradation rate is regulated and controlled through the polylactic acid-glycolic acid copolymer carrier molecular weight and the lactic acid / glycolic acid proportion, and a curing dynamic formula is combined.

The invention provides a pharmaceutical wastewater treatment process. The pharmaceutical wastewater treatment process comprises the following steps: A1, pretreatment, A2, adsorption treatment, A3, oxidation treatment and A4, filtration treatment. In the step A2, a composite adsorbent comprising the following raw materials: attapulgite, activated carbon, carbon nanotubes, 4-carboxyphenylboronic acid, polyethyleneimine, sodium dithiocarbamate, epoxy resin E-44, deionized water and modified nano zero-valent iron is used, and self-repairing is realized through dynamic chemical bonds such as boric acid ester bonds, imine bonds and thiol-disulfide bonds; the adsorbent can be self-repaired during microscopic damage, so that the service life is prolonged, and relatively high adsorption capacity is kept. In the step A3, a gel microsphere oxidant comprising the following raw materials: hydrogen peroxide, potassium persulfate, copper-iron sulfide, nitrogen-doped carbon quantum dots, sodium alginate powder, sodium polyacrylate and a phosphate buffer solution is used, and efficient degradation is realized through a synergistic mechanism of free radical oxidation, non-free radical oxidation and photocatalysis.

The invention provides a surface modification method for a lithium-rich manganese-based positive electrode material, which comprises the following steps of: washing by using a peroxide-containing aqueous solution, properly increasing the washing temperature (preferably 40-80 DEG C), regulating the reaction pH value to 1-7, accurately controlling the ratio of acidity to free radical oxidation reaction, and optimizing the interface stability, oxygen vacancy density and Li < + > diffusion rate, thereby obtaining the lithium-rich manganese-based positive electrode material. Meanwhile, the dosage of peroxide (preferably persulfate) is reduced, the reaction time is shortened, the modification efficiency is improved, the raw material consumption is reduced, and the production cost is reduced.

Aiming at the problems of large flue gas nitrogen oxide generation amount, easy exceeding and serious pollution possibly existing in ammonia gas blending combustion, the invention provides an ammonia gas out-of-furnace bypass combustion blending combustion oxidation method, which comprises the following steps: preparing NO2 by virtue of an ammonia combustion system, generating O.free radicals by virtue of photo-thermal cracking of NO2, oxidizing NO in flue gas into NO2, cracking NO2 into N2, removing NO by virtue of NO2, and performing denitration by virtue of denitration, so that the nitrogen oxide in the flue gas is not easily generated. According to the method, SO2 is oxidized into SO3 through O.free radicals, the SO3 reacts with calcium for desulfurization, CO and VOCs are oxidized into CO2 and H2O, collaborative purification of multiple pollutants is achieved, reduction denitration and wet desulfurization are replaced and used for denitration and desulfurization of combustion flue gas and collaborative treatment of the multiple pollutants, and deep pollution reduction, carbon reduction, energy conservation and efficiency improvement are achieved.

The invention provides a monocrystalline silicon wafer cleaning system and method. The cleaning system comprises a first cleaning tank; a second washing tank; a third cleaning tank; a fourth cleaning tank; a high-pressure conveying device; the fourth cleaning tank comprises a first tank body used for containing a first cleaning solution containing a hydrogen peroxide aqueous solution, a second tank body used for containing a second cleaning solution containing the hydrogen peroxide aqueous solution and a third tank body used for containing a third cleaning solution containing the hydrogen peroxide aqueous solution. The at least one first light source is used for providing light for the first tank body, the at least one second light source is used for providing light for the third tank body, the first tank body is communicated with the second tank body through a first free radical oxidation resistant reverse osmosis membrane, and the second tank body is communicated with the third tank body through a second free radical oxidation resistant reverse osmosis membrane; at least one composite plate is arranged in each of the first groove body and the second groove body; and each composite plate comprises doped graphene, so that the problems of high cleaning cost of the monocrystalline silicon wafer and complex wastewater treatment are solved.

A method of preparing glucaric acid comprising contacting D-glucose and oxygen with a first catalyst composition comprising a first copper radical oxidase, a single electron oxidizer, and a small molecule activator under conditions suitable for formation of glucodialdose; and contacting glucodialdose and oxygen with a second catalyst composition comprising a second copper radical oxidase, a single electron oxidizer and a small molecule activator under conditions suitable for the formation of a product mixture comprising glucaric acid or salts thereof. A method comprising contacting a sugar with a catalyst composition comprising an oxidoreductase, a single electron oxidizer and a small molecule activator under conditions suitable for the formation of one or more oxidized sugar oxidation products comprising glucaric acid wherein the oxidoreductase comprises at least two copper radical oxidases, at least two mutated copper radical oxidases or combinations thereof.

The invention relates to a method for degrading organic pollutants in water by activating percarbonate with zero-valent iron, which comprises the following steps: injecting to-be-treated water containing trace organic pollutants into a device containing zero-valent iron, adding percarbonate after adsorption saturation, and keeping the treatment time for 10-60 minutes after the adding amounts of the zero-valent iron and the percarbonate are 0.1-1.0 g / L and 5-30 mM respectively, the treatment of the trace organic pollutants in the water is completed. The zero-valent iron provided by the invention activates percarbonate to degrade trace organic pollutants in water, the zero-valent iron not only serves as an activator of the percarbonate, but also serves as a catalyst generated in situ to further catalyze decomposition of the percarbonate to generate free radicals and oxidize the pollutants; extra additives are not needed. According to the method, the treatment efficiency of micropollutants in water is improved, reaction products are non-toxic and harmless, secondary pollution risks are avoided, the treatment cost is reduced, and the potential application value is achieved.

The invention discloses a waste gas purification method, and belongs to the technical field of environmental protection. The method comprises the following steps: converting nitrogen-containing substances into NOO and adding the NOO into a high-temperature non-combustion area at the tail end of a hearth or the front end of a flue in combustion equipment, wherein fuel is burnt out; nO is cracked in the region to generate active free radicals; the free radicals oxidize NO in the flue gas to generate NO, and oxidize SOO, CO and VOCs to generate oxidation products; continuously cracking the generated NOs to form chain circulation; and the oxidation product is removed in a subsequent purification system. The NOs comprise pure NOs and dimers NO (nitrogen tetroxide) thereof, and NO is decomposed into NOs to participate in the reaction at high temperature. According to the invention, by optimizing the NO adding position, collaborative purification of multiple pollutants such as NOx, SOs, CO, VOCs and the like is realized, a reducing agent does not need to be added, ammonia escape is avoided, the investment and operation cost is low, and the method is particularly suitable for treatment of high-concentration CO and VOCs flue gas in industries such as coking and the like.

The invention discloses application of compound resina draconis in preparation of a medicine for treating acute myocardial infarction. The compound resina draconis has the effects of resisting free radical oxidation and platelet aggregation, expanding coronary artery, inhibiting increase of myocardial enzymology CPK and LDH and reducing myocardial oxygen consumption, so that the myocardial infarction range is reduced, and myocardial ischemic ST segment elevation is improved; the compound is combined with aspirin for treating acute myocardial infarction, and the compound and aspirin have a synergistic effect, play a role in resisting platelet aggregation and inhibit synthesis of thromboxane A2, and show a good ischemic myocardial protection effect. Meanwhile, according to the technical scheme that the compound resina draconis is used independently or combined with aspirin, the application range of the medicine is widened, contribution is made for research and development of the medicine for relieving side effects caused by aspirin treatment, and the application prospect is good.

The invention relates to the technical field of bamboo processing and modification treatment, and discloses a method for improving high-permeability bamboo modification, which comprises the following steps: preparing a mixed aqueous solution of 9.25-37 mmol / L of alkali compound and 9.3-27.8 mmol / L of persulfate, and dipping bamboo at normal temperature for 3-6 hours; the soaked bamboo wood is heated and activated, and the activation mode is selected from one of 60-80 DEG C constant-temperature water bath treatment, 300-550 W microwave radiation treatment or 100-400 W ultrasonic radiation treatment; and after the activated bamboo wood is cleaned to be neutral, freeze drying is conducted at the temperature ranging from-50 DEG C to-70 DEG C. According to the method, free radicals generated by alkali liquor swelling and synergistic thermal activation of persulfate are utilized, bamboo blocking pore extracts are oxidized and degraded, a fluid conduction path is dredged, the permeability and porosity of the bamboo are improved, the original mechanical strength of the bamboo is kept, and the technical problems that traditional modified liquid medicine is difficult to permeate, and a skeleton is damaged due to strong base treatment are solved.

The application belongs to the field of heavy metal water pollution treatment, and relates to a method for rapidly and efficiently oxidizing trivalent arsenic through enhanced electron transfer, which comprises multifunctional biochar preparation and efficient oxidation process design. The method uses sludge as a biochar precursor, obtains multifunctional biochar with strong alkalinity, high specific surface area and super electron conduction through high-temperature pyrolysis, directly introduces oxygen into an As(III) solution, adds the biochar into the system after the aeration is completed, and fully stirs. The method is simple, economically feasible, has extremely high oxidation efficiency, does not require additional chemical reagents, has no reagent residues, and does not require external light or electricity. The non-free radical oxidation path dominated by electron transfer and singlet oxygen is not easily affected by inorganic ions and humic acid in actual water bodies, has strong anti-interference ability, and has a wide application range. The application not only helps to enrich the catalytic oxidation theoretical system, but also greatly improves the practical feasibility of biochar application, and has good environmental and economic benefits.

The invention belongs to the technical field of building materials, and relates to an underwater stabilizer for an offshore wind power grouting material and a preparation method of the underwater stabilizer, and the underwater stabilizer comprises the following components in parts by weight: 3.1-3.8 parts of self-made monomer sodium acrylate; 10.0 to 10.5 parts of acrylamide; and 10.0 to 10.5 parts of 2-acrylamide-2-methylpropanesulfonic acid (2-acrylamide-2- 0.060 to 0.065 part of a cross-linking agent; 0.40 to 0.45 part of a molecular weight limiting agent; 2.0 to 2.5 parts of a free radical oxidant; 1.0-1.2 parts of a free radical reducing agent; 250 to 370 parts of deionized water; and 0.2-0.3 part of a low-temperature synthetic small material. The underwater stabilizer for the offshore wind power grouting material is uniform in molecular weight distribution, stable in product performance and good in compatibility with a polycarboxylic acid water reducing agent, the stability and the water-retaining property of a cement-based cementing material system are effectively improved, the underwater construction stability of the offshore wind power grouting material is enhanced, and the strength loss is reduced.

The application discloses a method for removing trace sulfonamidochrysoidine in water by activating peracetic acid through complexation of manganese sulfate and 2-picolinic acid, wherein, (1) a homogeneous Mn(II)-PICA complex solution is prepared by mixing and stirring a manganese sulfate solution and a 2-picolinic acid solution; (2) peracetic acid solution and the homogeneous Mn(II)-PICA complex solution are added into water containing sulfonamidochrysoidine, and the mixture is fully stirred, and in the reaction process, high-valence manganese active species Mn(V)=O is generated; the system mainly adopts a non-radical oxidation path, has high selectivity to sulfonamidochrysoidine, and realizes degradation of the sulfonamidochrysoidine. The method has high activation efficiency and fast degradation speed, and the complex system significantly improves the activation efficiency of PAA, and the removal rate of sulfonamidochrysoidine can reach more than 90 % within 10 min, which is much higher than that of a single activation system.

In view of the foregoing, exemplary embodiments provide a method of manufacturing a semiconductor device and a substrate processing apparatus capable of efficiently performing radical oxidation.SOLUTION: According to one embodiment, a method for manufacturing a semiconductor device is provided. The method of manufacturing a semiconductor device includes performing radical oxidation on a first film using plasma generated by a processing gas containing a gas of an isotope of hydrogen.SELECTED DRAWING: Figure 1

The invention relates to the technical field of medical polymer materials, in particular to a high-crosslinking ultra-high molecular weight polyethylene material and a preparation method thereof.According to the method, two times of radiation and two times of heat treatment at different temperatures are combined, and high crosslinking and low free radical content are achieved through first-time radiation and remelting treatment; and secondary radiation and annealing treatment with the temperature lower than the melting point further improve the crosslinking degree and maintain high crystallinity. The obtained material is superior to a material prepared by a traditional single method in the aspects of residual free radicals, oxidation index, swelling degree, crystallinity, mechanical property, wear rate and the like, and has the advantages of high wear resistance, high oxidation resistance and high strength.

The invention relates to the technical field of graphene materials, and discloses a modified graphene material and a preparation method thereof.The preparation method comprises the steps that sodium lignin sulfonate is used for modifying graphene oxide through pi-pi stacking, and water-based stable dispersion liquid is prepared; saponified abietic acid is introduced, so that a abietic acid radical tricyclic hydrophobic skeleton is attached to the surface of graphene; compounding tung oil emulsion, performing free radical oxidation polymerization on alpha-eleostearic acid conjugated triene double bonds at the normal temperature of 15-35 DEG C to form a film, and covalently bonding graphene into an organic film-forming system through phenol-oxygen free radical coupling; zinc borate is added, zinc ions catalyze and solidify and promote generation of zinc abietate, and borate radicals and sodium lignin sulfonate hydroxyl form an inorganic borate cross-linked network; and adjusting the solid content and grinding to obtain a finished product. The prepared conductive ink is self-dried and cured at normal temperature, a cured coating has excellent water resistance and conductive stability, and the conductive ink is suitable for a heat-sensitive flexible base material.

The invention belongs to the technical field of sewage treatment, and discloses an adsorption-degradation function integrated recoverable catalyst as well as a preparation method and application thereof. The preparation method comprises the following steps: mixing a cobalt source, an iron source, sodium acrylate, anhydrous sodium acetate and a solvent, and performing solvothermal reaction to obtain cobalt ferrite; the preparation method comprises the following steps: mixing cobalt ferrite, ammonia water, tetrapropoxysilane, resorcinol, formaldehyde, ethanol and water, reacting, pyrolyzing, etching with alkali liquor, and pyrolyzing again to obtain the catalyst. Core-shell hollow mesoporous carbon sphere encapsulated cobalt ferrite nanoparticles are prepared and used for activating PMS to degrade LFX. Due to the remarkable adsorption capacity, LFX can be effectively enriched, and free radical and non-free radical oxidation jointly act on PMS activation to complete LFX degradation. The catalyst can be effectively recovered and reused through magnetic separation, and has the advantages of small dosage, wide pH application range and high stability.

The invention relates to an odor treatment system for a municipal waste compression station. The odor treatment system comprises a control module, an online monitoring module, a gas collection module and a gas purification module. And online monitoring modules are arranged in the compression station and at the gas discharge port. The gas purification module comprises a free radical oxidation reaction device and a chemical washing device, an inlet of the gas collection module is formed in the lower middle area and the top of the compression station, and an outlet of the gas collection module, the free radical oxidation reaction device and the chemical washing device are sequentially communicated. The control module is used for acquiring monitoring data of the on-line monitoring module and controlling the power of the gas collection module and the free radical oxidation reaction device and the pH value of a washing solution in the chemical washing device in real time according to the monitoring data. The system couples free radical oxidation with a chemical absorption purification process by using an all-dimensional three-dimensional collection mode according to the intensity of a malodorous source and the component change of the garbage compression station, and solves the problems of incomplete collection of malodorous gas and low matching degree of the purification process.

The invention discloses a preparation method of 3-amino-1-adamantanol serving as a key raw material for synthesizing vildagliptin. According to the method, amantadine or amantadine salt is taken as a starting raw material according to a free radical-oxidation principle, N-Boc-amantadine is obtained through a Boc protecting group, then 3-(N-Boc-amino)-1-adamantanol is obtained through oxidation, and finally the 3-amino-1-adamantanol is obtained through three steps of removing the Boc protecting group. The method avoids using a nitration process, is simple and convenient to operate and is suitable for industrial production.

A fabrication method of a semiconductor device is described. Generally, the method includes forming a customizable oxide-nitride-oxide (ONO) stack over a substrate in an in-situ atomic layer deposition (ALD) tool or chamber. Radical oxidation or oxide deposition process steps are performed to form tunnel dielectric layer overlying the substrate. Silicon nitride deposition process steps are also performed to form a multi-layer charge trapping (CT) layer in which at least some of the process parameters of silicon nitride deposition process steps are adjusted when forming the first and second CT sub-layers of the multi-layer CT layer. Subsequently, radical oxidation or oxide deposition process steps are performed in the ALD tool to form a blocking dielectric layer overlying the multi-layer CT layer.

The present application relates to the technical field of water treatment, in particular to a preparation method of a confined carbon film electrode and application thereof. The advanced oxidation technology is a free radical oxidation system mainly with hydroxyl radicals and sulfate radicals. When degrading persistent organic pollutants, the hydroxyl radicals and sulfate radicals are easily consumed by chain reaction with anions in water and also produce toxic byproducts. In view of the above problems, the present application provides a confined carbon film electrode which is formed by depositing Fe2O3 / CNTs composite material on the surface of a microporous filter membrane to form a membrane electrode. The Fe2O3 / CNTs composite material is to confine iron oxide nanoparticles on the sidewall of the hollow pipe of carboxyl functionalized CNTs. The present application combines electrocatalysis technology and membrane separation technology, can more efficiently remove harmful substances such as persistent organic pollutants and heavy metals in water, and has higher water purification efficiency compared with the single electrocatalysis technology and membrane separation technology.

The application relates to the technical field of chemical vapor deposition equipment, and discloses a cleaning device based on a chemical vapor deposition reactor and a residue recovery structure thereof, which comprises a CVD reactor 1, a reaction part 2 is arranged in the CVD reactor 1, the reaction part 2 is a basic bearing and process adaptation structure of the CVD reactor 1, provides a temperature environment required by reaction, assists in gathering residues to a recovery area, provides an electrode basis for subsequent vacuum electrolytic cleaning, the reaction part 2 comprises a heating plate 21, the heating plate 21 is installed in the CVD reactor 1 in the form of an annular array, two cross beams 22 are connected in the CVD reactor 1, a guide plate 23 is symmetrically installed between the two cross beams 22, oxidative free radicals are generated by the vacuum electrolysis effect of a spiral electrode to oxidize metal oxide residues, ultraviolet lamps and a light-transmitting column array form global photolysis irradiation, and the two cooperate to realize efficient decomposition of multiple types of residues such as carbon-based and metal-based residues, and the problem of poor adaptability of traditional single cleaning technology is solved.

The invention provides a protective agent of an adenovirus vector vaccine, and relates to the technical field of biological products and biological vaccines. The protective agent is prepared from sucrose, 2-hydroxypropyl-beta-cyclodextrin, magnesium chloride, sodium chloride, histidine, arginine, EDTA.2Na (Ethylene Diamine Tetraacetic Acid), Tris and Tween 80; the pH (Potential of Hydrogen) is 6.0 to 7.8. The protective agent can prevent effective components in the adenovirus vector vaccine from being decomposed by light and oxidized by free radicals, enables the vaccine to be stored for a long time in an environment of 2-8 DEG C, maintains the titer level and stability of the vaccine, and lays a foundation for subpackaging the vaccine by using a transparent bottle and reducing the production cost subsequently.

The invention discloses a method for initiating graft polymerization of carbohydrates and polyphenol pigments, and belongs to the technical field of functional modification of carbohydrates. A polysaccharide substance and a polyphenol pigment are used as research objects, and an ascorbic acid-oxidoreductase-initiator ternary initiation system is constructed according to the characteristics that an ascorbic acid-initiator system can rapidly initiate the polysaccharide substance to generate free radicals and an oxidoreductase-initiator system can initiate the polyphenol pigment to generate free radicals. The grafting polymerization reaction between polysaccharide substances and polyphenol pigments is realized by utilizing the principle that free radicals of the polysaccharide substances and free radicals of the polyphenol pigments can generate free radical polymerization, the grafting rate can be improved, and the grafted polysaccharide substances have antibacterial property and free radical scavenging property.

Methods of forming semiconductor devices, memory cells, and arrays of memory cells include forming a liner on a conductive material and exposing the liner to a radical oxidation process to densify the liner. The densified liner may protect the conductive material from substantial degradation or damage during a subsequent patterning process. A semiconductor device structure, according to embodiments of the disclosure, includes features extending from a substrate and spaced by a trench exposing a portion of a substrate. A liner is disposed on sidewalls of a region of at least one conductive material in each feature. A semiconductor device, according to embodiments of the disclosure, includes memory cells, each comprising a control gate region and a capping region with substantially aligning sidewalls and a charge structure under the control gate region.

To provide a highly unsaturated fatty acids-containing emulsified formulation that is highly water-soluble and can be distributed and stored at room temperature and a method for manufacturing the same.SOLUTION: There is provided an emulsified formulation that contains (A) highly unsaturated fatty acid-containing fats and oils; (B) (b1) oil-soluble radical-scavenging antioxidants having a phenolic hydrogen and / or (b2) oil-soluble antioxidants of oxidation-reduction type; and (C) (c1) water-soluble radical-scavenging antioxidants with phenolic hydrogen and / or (c2) water-soluble antioxidants of oxidation-reduction type, wherein the content of (A) is 5 mass% to 60 mass%, the total content of (B) and (C) is 0.01 mass% to 10 mass%, the ratio of (B) / (C) is 0.2 to 5, and the emulsified particle diameter is 150 nm or less.SELECTED DRAWING: None

The application provides visible light catalytic cross-linked virus-like ruthenium oxide nanoparticles for efficient transmembrane treatment of keratoconus, which are mainly prepared from cetyltrimethylammonium bromide, sodium hydroxide, tetraethyl orthosilicate, cyclohexane, ruthenium chloride, phenylalanine and pharmaceutically acceptable components or adjuvants, and have virus-like nanoscale and rough morphology. The virus-like ruthenium oxide nanoparticles can efficiently cross the corneal epithelium, enter the corneal stroma, and react with ammonium persulfate to generate free radicals, oxidize the tyrosine groups in the collagen fibers of the cornea to form a di-tyrosine bond, and cross-link the collagen fibers of the cornea. The application does not require ultraviolet light irradiation, is convenient to use, is non-invasive and reduces the discomfort of patients during treatment, and has important significance for improving the compliance and quality of life of keratoconus patients.

The application provides a single crystal silicon wafer cleaning system and method, and the cleaning system comprises a first cleaning tank, a second cleaning tank, a third cleaning tank, a fourth cleaning tank and a high-pressure conveying device; the fourth cleaning tank comprises a first tank body for containing a first cleaning solution containing hydrogen peroxide aqueous solution, a second tank body for containing a second cleaning solution containing hydrogen peroxide aqueous solution, a third tank body for containing a third cleaning solution containing hydrogen peroxide aqueous solution, at least one first light source for providing light to the first tank body, and at least one second light source for providing light to the third tank body; the first tank body and the second tank body are communicated through a first anti-radical oxidation reverse osmosis membrane; the second tank body and the third tank body are communicated through a second anti-radical oxidation reverse osmosis membrane; at least one composite plate is arranged in the first tank body and the second tank body respectively; each composite plate comprises doped graphene, and the problems of high single crystal silicon wafer cleaning cost and complex wastewater treatment are solved.