The invention discloses a degradable photoresist resin monomer synthesized from furandione and a synthesis method thereof, and relates to the field of photoresist resin. The structural formula of theresin monomer is shown in the specification, R1 is saturated alkane or cycloalkane, and R2 is hydrogen or methyl. The synthesis method comprises the following steps: reacting furan-3, 4 (2H, 5H)-diketone (I) with an alkyl Grignard reagent or a naphthenic base Grignard reagent under the protection of inert gas, adding water for quenching after the reaction is finished, and carrying out aftertreatment and purification to obtain an intermediate (II); and 2, esterification reaction: reacting the intermediate (II) with acryloyl chloride or methacryloyl chloride under alkaline conditions, and carrying out post-treatment purification to obtain the resin monomer (III). Polymer resin formed by polymerizing the resin monomer and other resin monomers has better etching resistance, is beneficial to improving the edge roughness of a developed pattern, greatly improves the resolution of a photoetching pattern, and increases the fat solubility.