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51results about How to "Avoid rapid accumulation" patented technology

Straw compound fertilizer and preparation method thereof

The invention belongs to the technical field of fertilizers, and discloses a straw compound fertilizer. The straw compound fertilizer is composed of the following raw materials in parts by weight: 60to 100 parts of crop straw, 20 to 40 parts of wormcast, 20 to 30 parts of an inorganic compound fertilizer, 10 to 20 parts of peat soil, 3 to 8 parts of edible fungus residues, 3 to 5 parts of acidiccarbon powder, 3 to 5 parts of humic acid, 1 to 3 parts of a compound microbial inoculum and 1 to 2 parts of amino acid. The invention also discloses a preparation method of the straw compound fertilizer, wherein the preparation method comprises the following steps: (1) cleaning and airing the crop straws, shearing and grinding, and carrying out microwave radiation treatment; (2) adding water intostraw particles, wormcast, edible fungus residues and the complex microbial inoculum, mixing, putting the mixture into a biodegradable plastic bag, sealing a bag opening to obtain a compost bag, andstanding for 15-25 days to complete composting; and (3) uniformly stirring and mixing the compost with an inorganic compound fertilizer, peat soil, acidic carbon powder, humic acid and amino acid to obtain the straw compound fertilizer. The straw compound fertilizer is rich in organic matter content and high in nitrogen, phosphorus and potassium nutrient content, and has the effects of improving soil, delaying nutrient release, increasing the nutrient utilization rate and the like.
Owner:绵阳市隆豪农业有限公司

Ozone electrolysis generator and method for cleaning ozone generator

ActiveCN111118527APromote wettingStable ozone concentrationCellsElectrolysisWater flow
The invention discloses an ozone electrolysis generator. The problems that incrustation generated in a water passing groove in an existing electrolysis cavity finally and completely influences contactof a conductive film and a cathode pole piece and can influence stability of electrolytic ozone are solved; according to the technical scheme, the ozone electrolysis generator comprises an electrolysis cavity; a cathode pole piece, an anode pole piece and a proton exchange membrane are arranged in the electrolysis cavity, the proton exchange membrane is arranged between the cathode pole piece andthe anode pole piece, and the cathode pole piece, the proton exchange membrane and the anode pole piece are stacked up and down; a water inlet and a water outlet are further formed in the shell, andwater flow passes through the water inlet and then forms a water flow direction towards the water outlet in the electrolysis cavity; the cathode pole piece and the anode pole piece are both provided with water passing grooves consistent with the water flow direction, the water passing grooves are formed in the height direction of the cathode pole piece and the anode pole piece in a penetrating mode, and the effects that incrustation is not likely to be formed, and the ozone electrolysis concentration is stable are achieved.
Owner:宁波隆丰电子科技有限公司

Preparation method of EMPLGA/Gel-HA hydrogel-microsphere bionic composite support

The invention provides a preparation method of an EMPLGA/Gel-HA hydrogel-microsphere bionic composite support. The preparation method comprises the following steps: preparing high-molecular weight poly lactide-glycolide acid (PLGA) through melt polymerization under high vacuum, reducing the pressure and grafting maleic anhydride at a temperature of 100 DEG C to obtain maleinized poly lactide-glycolide acid (MPLGA); conducting reaction on quadrol and MPLGA for 30-60 minutes in a chloroform solution at a room temperature, precipitating, vacuum-drying to obtain a quadrol-modified MPLGA polymer and preparing a porous MPLGA hard support by using a pore-forming method; adding a prepared mixed aqueous solution of gelatin/hyaluronic acid into liquid paraffin containing span-80, performing glutaraldehyde cross-linking and solidifying into a sphere; respectively adding gelatin and hyaluronic acid into a glacial acetic acid solution for dissolution, uniformly mixing, and adding a Gel/HA microsphere into a mixed solution to obtain a composite system; soaking the EMPLGA hard support material in the composite system, vacuum-pumping for 20-30 minutes, taking out, freezing, drying, soaking with an ethanol solution containing carbodiimide and ethanol, and vacuum-drying to obtain the EMPLGA/Gel-HA hydrogel-microsphere bionic composite support. The bionic composite support prepared by the preparation method provided by the invention has a natural tissue environment and is good in mechanical strength.
Owner:HUNAN UNIV OF SCI & TECH

Diamond-like carbon protective film and preparation method thereof

The invention discloses a diamond-like carbon protective film and a preparation method thereof. The diamond-like carbon protective film sequentially comprises a micro-nano electronic device base material, an insulating layer belt, an internal stress buffer layer and a wear-resistant layer belt from bottom to top, wherein the lowermost layer of the insulating layer belt is a silicon-containing thin layer, then undoped DLC layers and silicon-containing thin layers are sequentially and alternately distributed, the internal stress buffer layer sequentially comprises an H-W:DLC layer, an M-W:DLC layer and an L-W:DLC layer from bottom to top, metal layers II and S-W:DLC layers are sequentially and alternately distributed on the uppermost layer of the internal stress buffer layer, and the diamond-like protective film. The plating layer can be obtained through sequential plating by adopting a physical vapor deposition method including PLD, and the prepared diamond-like carbon film has the characteristics of insulation, heat conduction and wear resistance by adopting tungsten-doped DLC layers with different concentrations and tungsten-doped DLC layers with micro concentrations in the preparation process. The use requirements and the miniaturization development direction of electronic devices can be met, and the application prospect is wide.
Owner:ARMY ENG UNIV OF PLA

Composite cooling fin, preparation method thereof and electronic equipment terminal

PendingCN111432606AAlleviate heat buildupDelay temperature riseModifications using liquid coolingModifications by conduction heat transferMetal foilHeat sink
The invention discloses a composite cooling fin which comprises a first base layer, a second base layer and a third base layer which are sequentially arranged in a stacked mode., the The first base layer is nano metal foil, and patterned grooves are formed in the first base layer; the second base layer is a phase-change heat storage functional layer and is formed by filling the patterned groove with phase-change heat storage slurry and curing; the third base layer is a heat radiation layer and is formed by coating heat radiation slurry on the phase change heat storage functional layer and curing; the main body material of the phase change heat storage slurry is phase change microcapsules and matrix resin or a shape memory polyurethane material, and the main body material of the heat radiation slurry is one or two of graphite and graphene. The invention further discloses a preparation method of the composite cooling fin and an electronic equipment terminal comprising the composite cooling fin. According to the composite cooling fin, the 3D cooling effect of the composite cooling fin is improved through the characteristics of conduction, heat storage, radiation and the like of the organic composite material.
Owner:SUZHOU TIANMAI THERMAL TECH

A kind of epitaxial wafer of light-emitting diode and its preparation method

The invention discloses an epitaxial wafer of a light emitting diode and a preparation method thereof, belonging to the technical field of semiconductors. The epitaxial wafer comprises a substrate anda buffer layer, an N-type gallium nitride layer, a multi-quantum well layer, an electron blocking layer and a P-type gallium nitride layer that are sequentially stacked on the substrate, and also comprises a composite layer stacked between the buffer layer and the N-type gallium nitride layer, wherein the composite layer comprises multiple gallium nitride layers and multiple zinc oxide layers, and the multiple gallium nitride layers and the multiple zinc oxide layers are alternately stacked. According to the scheme of the invention, the composite layer is arranged between the buffer layer andthe N-type gallium nitride layer, the composite layer comprises the multiple gallium nitride layers and the multiple zinc oxide layers that are alternately stacked, the dislocation and stress polarization extension caused by lattice mismatch between a sapphire or silicon substrate and gallium nitride can be effectively controlled, the crystal quality of the epitaxial wafer can be improved, a better crystal base for the multi-quantum well layer can be provided, the internal quantum efficiency of the light emitting diode can be improved, and thus the luminous efficiency of the light emitting diode can be improved.
Owner:HC SEMITEK ZHEJIANG CO LTD

Polishing equipment for small side plate of table tennis bat handle

The invention discloses polishing equipment for a small side plate of a table tennis bat handle. The polishing equipment comprises a shell, a polishing head, a driving machine, a dust absorption assembly, a telescopic adjusting assembly and a dust accumulation assembly, wherein a mounting groove is formed in the shell; the polishing head is mounted at an opening of the mounting groove; the driving machine is fixedly mounted in the shell and is used for driving the polishing head to rotate; the dust absorption assembly comprises a connecting lantern ring and fan blades, and the multiple fan blades are annularly and rotationally connected to the side wall of the connecting lantern ring; the telescopic adjusting assembly is installed between the polishing head and the driving machine and is used for changing and fixing the horizontal position of the fan blades, and the telescopic adjusting assembly is sleeved with the connecting lantern ring in a limiting mode; and the dust accumulation assembly is installed on the side wall of the shell in a sealed mode and is used for collecting the dust absorbed by the dust absorption assembly. According to the polishing equipment, generated dust is collected, so that dust accumulation caused by polishing is avoided, the condition that the sight of polishing personnel is not blocked is ensured, and the polishing progress is accurately mastered.
Owner:南通嘉蒂体育用品有限公司
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