3results about How to "Easy processing conditions" patented technology

This invention belongs to the field of waste plastic pyrolysis resource utilization, specifically a machine learning-based process optimization method for preparing light aromatics from waste plastic pyrolysis. This method constructs a dataset based on raw material characteristics, pyrolysis conditions, and product data from published literature, performs preprocessing, trains and optimizes various machine learning regression models, and selects the optimal model for predicting light aromatics yield based on evaluation indicators. Then, interpretability analysis is used to identify key factors affecting the yield, and raw material structural characteristics such as saturated C-H bonds, methyl branches, and carbonyl groups are used as inputs to enhance the characterization of raw material differences. Under industrial constraints, with the light aromatics yield as the optimization objective, a particle swarm optimization algorithm is used to globally optimize the reaction condition parameters to obtain the optimal combination of operating parameters. This invention can achieve light aromatics yield prediction and operating parameter recommendation under fluctuating raw material composition, improving prediction stability and generalization ability, reducing experimental iterations, and lowering optimization costs.

The application belongs to the technical field of high polymer materials, and relates to an acrylic resin, an OCA layer composition and application. The acrylic resin is prepared by copolymerization of the following monomers: acrylic compounds, alkyl acrylate compounds, siloxane acrylate compounds, epoxy acrylate compounds, hydroxyalkyl acrylate compounds, styrene compounds and functional acrylate monomers. The OCA layer prepared from the acrylic resin has high transmittance, high flatness, strong adhesion, low dielectric constant and excellent aging resistance, and has good resistance to common solvents such as IPA, NMP, TMAH and DIW used in photoetching processes.

The utility model discloses a diaphragm coating system which comprises an anilox roller and a point coating plate roller, the anilox roller is used for contacting slurry and transferring the slurry to the point coating plate roller, the point coating plate roller is used for coating a diaphragm, and the rotating speed of the anilox roller is the same as or different from that of the point coating plate roller. The anilox roller comprises a roller body and a flexible material layer, the outer surface of the roller body is cylindrical, the flexible material layer forms an annular shape, is attached to the circumferential face of the roller body and is fixedly connected with the roller body, a plurality of grooves distributed in an array mode are formed in the outer surface of the flexible material layer, and the adjacent grooves are arranged at intervals. Protrusions relative to the bottoms of the grooves are formed on the flexible material layer between the adjacent grooves, and the protrusions form grids on the outer surface of the flexible material layer. According to the diaphragm coating system disclosed by the utility model, the anilox roller and the point coating plate roller are in contact operation under different linear speeds, so that the point coating plate roller cannot be abraded, and the service life of the point coating plate roller is prolonged.