13 results about "Surface capping" patented technology

The invention provides a method for automatically detecting the coverage rate of a blade part after shot blasting, which realizes objective evaluation and screening of the surface coverage rate of the part based on an intelligent platform, and comprises the following steps: S1, establishing a database for comparison through sample coverage rate calibration; s2, performing shot blasting treatment on the part to form a to-be-detected surface; s3, the part subjected to shot blasting treatment is fixedly arranged in a designated area and transferred to a detection platform; s4, carrying out image acquisition on the shot blasting area of the part by adopting intelligent visual equipment; s5, comparing the acquired image with a calibration picture in a database through image analysis software, and judging a coverage rate value of the part; and S6, re-checking and post-processing the judgment result, and screening out qualified parts. According to the method, the roughness of parts such as blades after shot blasting can be quantitatively detected, and the coverage condition of the parts after surface treatment can be more objectively judged; the detection efficiency can be improved, and the problem of missing detection can be effectively avoided.

The invention discloses a preparation method of a mask plate for evaporation of a high-resolution OLED (Organic Light Emitting Diode). The preparation method comprises the following steps: S1) covering one side surface of a glass substrate with a metal layer; (S2) a light resistor is formed on the side, away from the substrate layer, of the metal layer, a plurality of first through holes are formed in the light resistor, and the first through holes correspond to a to-be-evaporated area on the display substrate; s3) etching a region, which is not covered by the photoresist, on the metal layer, and forming a second through hole communicated with the first through hole on the metal layer; s4) removing the light resistance; and S5) performing plasma etching on the area, which is not covered by the metal layer, on the glass substrate, and forming a third through hole communicated with the second through hole in the glass substrate. The mask plate is formed through cooperation of the glass substrate and the metal layer, the evaporation pattern is defined through the metal layer (provided with the second through holes), and the high-resolution effect of the display substrate can be achieved when the mask plate is used in cooperation with the high-density third through holes formed in the glass substrate.

The invention relates to a component (1) having an outer surface (1a) covered with a coating (2) comprising at least: a) a first layer (3), and a first layer deposited on the outer surface (1a) of the component (1) and comprising at least two sub-layers (3a, 3b): i) a first sub-layer (3a) made of a material comprising at least one element selected from the group consisting of chromium, nickel, cobalt, phosphorus, nitrogen, niobium, alloys thereof and mixtures thereof; ii) a second sub-layer (3b) deposited on the first sub-layer (3a) and made of a material comprising at least two elements selected from the group consisting of chromium, nickel, tungsten, cobalt, carbon, nitrogen, alloys thereof and mixtures thereof; iii) a third sub-layer (3c) deposited on the second sub-layer (3b) and made of a material comprising at least one element selected from the group consisting of chromium, nickel, titanium, silicon, cobalt, phosphorus, nitrogen, alloys thereof and mixtures thereof, and b) a second layer (4) deposited on the first layer (3), the second layer being an amorphous carbon layer.

The invention relates to the technical field of machine tool table tops, and discloses a preparation method for an aviation-grade clean workshop machine tool table top, which comprises the following steps: in a clean environment with a clean grade not lower than ISO5 grade, placing a polyurethane (PU) substrate on the machine tool table top; the surface of the PU substrate is subjected to through hole and precision treatment according to a preset array through a machining assembly in the machining and monitoring arm; the surface of a polyurethane (PU) substrate is covered with a composite functional coating, and the composite functional coating is subjected to thermocuring. According to the method, operation is conducted in the high-cleanliness environment with the whole process not lower than the ISO 5 level, and key links such as base plate pretreatment, profiling supporting system assembling, composite function coating coating and curing and in-situ precise grinding and polishing are strictly controlled, so that the extremely low particle release characteristic of the machine tool table top is fundamentally ensured; according to the method, the risk that the table top becomes a pollution source due to friction, abrasion or material volatilization in the precise machining or assembling process is effectively avoided.

This invention discloses a method for determining the thickness of electrochemically deposited gold, silver, and palladium noble metal capping layers, comprising the following steps: 1) preparing standard samples by electrochemically depositing nickel of different thicknesses onto a pure copper substrate, followed by gold, silver, and palladium plating; 2) testing the capping layer thickness of the standard samples using scanning electron microscopy (SEM) backscattered electron imaging technology; 3) testing the intensity of X-ray characteristic spectral lines of different capping layer thicknesses using SEM energy dispersive spectroscopy (EDS) technology, and determining optimized test conditions; constructing a surface capping layer thickness calibration curve based on SEM EDS technology; 4) detecting the electrochemically deposited capping layer thickness of different types of samples. This method can accurately determine the thickness of bonding lines or thin films of noble metal capping layers prepared by electrochemical deposition processes in the integrated circuit field, filling the technical gap of rapid measurement for such products. The detection process is convenient and fast, and the detection results are accurate and consistent.

The present application relates to a kind of flexible plate copper circuit surface covering film removal method, first with single solvent soak softening covering film resin layer, obtain first intermediate state;Then the PI layer of first intermediate state covering film is heat treated, so that PI layer film bubble, delamination, fall off, obtain second intermediate state;Finally, second intermediate state is cleaned, and residual solvent is absorbed, and after drying, third intermediate state is obtained, i.e., finished surface resin layer and PI layer are cleaned, and copper circuit is not damaged;If necessary, ultraviolet laser treatment can be added after obtaining third intermediate state, and the resin remaining on the flexible plate is removed in depth, which provides the possibility for effective failure analysis of flexible plate.

This invention relates to a femtosecond laser deposition probe and a micro / nano localized deposition device based on a femtosecond laser, which relates to the field of nanofabrication, specifically to the field of surface metallization process equipment technology and the field of probe technology used in this process. It solves the problems of existing probes being unable to simultaneously excite electrochemical reactions and conduct laser light, and the high optical path transmission loss in existing deposition devices. The probe comprises multiple parallel single-mode silica optical fibers, each fiber having a tapered end and its outer surface covered with a metal layer. The laser emitted by the femtosecond laser transmission system in the deposition device is guided by the fiber probe (301) to the surface metallization processing area within the movable reaction pool system (4), and the end of the fiber probe (301) also serves as the working electrode for the chemical reaction within the movable reaction pool system (4). The femtosecond laser deposition probe is suitable for systems combining laser and chemical reactions.

This utility model discloses an adhesive coating device for medical and sanitary dressing substrates, relating to the field of medical and sanitary dressing substrate production technology. It includes a main body with a processing platform inside. A first adhesive outlet is installed at the front end of the main body above the processing platform. A roller is rotatably connected inside the main body behind the first adhesive outlet, and a drying device is installed inside the main body behind the roller. In this utility model, material on the processing platform first passes through the first adhesive outlet, and with the help of the roller, a thin adhesive layer is applied to the material surface. After initial drying by the drying device, the material passes through a second adhesive outlet, and with the help of rollers, a second adhesive layer is applied to the material surface, ensuring the adhesive layer reaches a specified thickness. Compared to one-time molding, two-time molding prevents inconsistent drying speeds between the inner and outer layers of the adhesive layer, which could lead to different shrinkage stresses and reduce the adhesion between the adhesive layer and the material.

The invention provides a method for improving laser activation selective metallization flatness, which comprises the following steps of: before laser activation, covering a static water layer on the surface of a workpiece or a sample plate to be activated, and covering transparent glass to inhibit water surface fluctuation. The surface of the selective metallization composite material capable of being activated by laser is covered with the horizontal hydrostatic layer and the transparent glass, so that an activated area with the surface flatness superior to that in air can be activated on the composite material containing the laser sensitizer by laser, and chemical copper plating with a good effect can be carried out on the activated area. The flat and compact metal layer is obtained by covering the composite material base material with the horizontal static water layer. Compared with a traditional air medium processing method, the method has the advantages that laser parameters which can only process a rough surface with a seriously fluctuated activated area in the traditional air medium form a flat activated area during underwater processing, the laser parameters have excellent plating capacity after repeated activation, and the obtained plating layer is very excellent in thickness and strength. The method has the advantages of low cost, convenience in manufacturing, easiness in large-scale use and excellent industrial application value.

The application discloses a method for determining the transparency of insulating material and the bifaciality of a back contact component, relates to the technical field of photovoltaic cells, and aims to determine the transparency of insulating material, thereby improving the calculation accuracy of the bifaciality of a back contact cell or a back contact component. The insulating material is formed on part of the back light surface of the back contact cell. The method for determining the transparency of the insulating material comprises the following steps: obtaining the first spectral responsivity corresponding to a first region on the back light surface side of the back contact cell and the second spectral responsivity corresponding to a second region under the same incident wave band. The surface of the first region is covered with the insulating material, and the surface of the second region is not covered with the insulating material. Based on the wavelength range of the incident wave band, the first spectral responsivity and the second spectral responsivity, the transparency of the insulating material under the incident wave band is determined. The method for determining the bifaciality of the back contact component comprises the method for determining the transparency of the insulating material.

The application provides a droplet directional transport material and a preparation method and application thereof, and relates to the technical field of microfluidics.The droplet directional transport material provided by the application comprises an elastic substrate and a rigid film with a wrinkle structure covering the surface of the elastic substrate;the preparation raw material of the elastic substrate comprises a base material, a photo-thermal nano material and an organic solvent;and the preparation raw material of the rigid film comprises one of gold, silver, platinum and lead.By covering the rigid film with the wrinkle structure on the surface of the elastic substrate, the photo-thermal effect can be used to achieve the erasing and regeneration of the wrinkle structure, and the droplet directional transport material provided by the application has the wrinkle structure with a wettability gradient, so that the reversible and repeatable droplet directional transport can be realized.

The application relates to a preparation method and application of an SPR biosensing chip. The preparation method of the SPR biosensing chip comprises the following steps: S1. covering a noble metal layer on the surface of a substrate to obtain a substrate-noble metal layer; and S2. sequentially depositing a graphene nanosheet layer and a nanodiamond particle layer on the surface of the substrate-noble metal layer to obtain the SPR biosensing chip. The SPR biosensing chip prepared by the preparation method has high sensitivity and high detection precision, is easy to modify and functionalize, and is relatively easy and simple to operate because the graphene nanosheet is easy to prepare and transfer relative to the large-area layered graphene.