The invention discloses a method for producing a rear passivation double-sided solar cell. The method sequentially comprises the following steps of: positive cleaning, making a texture surface, forming a PN junction through diffusion, performing periphery and rear etching, evaporating a positive SiNx anti-reflection film, evaporating a rear passivation film or/and SiNx [11] passivation film or other passivation films, performing screen printing on a back electrode, performing screen printing on a positive electrode, and sintering. The method for producing the rear passivation double-sided solar cell has the advantages that the compounding rate of the rear surface can be greatly reduced, the back reflection is improved, and the more photon-generated carriers are collected. Compared with processes such as photoetching, laser sintering and laser opening, the method is simple in process flow and suitable for mass production. The actual working and generating efficiency can be effectively improved. The used equipment is compatible with the traditional solar cell equipment, the equipment does not need to be increased, the process cost is low, the capacity is high, and the method has good industry prospects.