An object of the present invention is to provide a cleaning composition which has excellent removability of a residue (particularly, a residue after CMP) and excellent anticorrosion properties of
copper; a cleaning method of a
semiconductor substrate; and a manufacturing method of a
semiconductor element. The cleaning composition of the present invention contains
citric acid, 1-hydroxyethane-1,1-diphosphonic acid, a
sulfonic acid-based surfactant, and water, in which a
mass ratio of a content of the
citric acid to a content of the 1-hydroxyethane-1,1-diphosphonic acid is 20 to 150, a
mass ratio of the content of the
citric acid to a content of the
sulfonic acid-based surfactant is 70 to 1,500, and a pH is 0.10 to 4.00.