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70results about How to "Increase the lattice constant" patented technology

Preparation method of in-situ synthesis low-pressure cold spraying CuNiCoFeCrAl2.8 high-entropy alloy coating

The invention provides a preparation method of an in-situ synthesis low-pressure cold spraying CuNiCoFeCrAl2.8 high-entropy alloy coating. The method comprises the following steps that Cu powder, Ni powder, Co powder, Fe powder, Cr powder and Al powder are uniformly mixed to obtain powder for cold spraying, and then low-pressure cold spraying is carried out on the surface of a metal matrix so as to obtain a mixed powder coating, and then induction remelting in-situ synthesis is carried out to obtain the CuNiCoFeCrAl2.8 high-entropy alloy coating. According to the method, the low-pressure coldspraying technology is used, the cold spraying powder is subjected to low-pressure cold spraying on the matrix, the induction remelting in-situ synthesis is carried out, the CuNiCoFeCrAl2.8 high-entropy alloy coating is obtained, an alloying reaction is sufficient, the microstructure of a mixed powder coating forms a high-entropy alloy structure with a body-centered cubic structure from a pure metal in situ, the high-entropy alloy coating is formed, the structure is compact, the porosity is low, the high-entropy alloy structure is stable in structure, few in impurities, excellent in mechanicalperformance, high in strength and high in hardness, and good in wear resistance and corrosion resistance; and the thickness of the CuNiCoFeCrAl2.8 high-entropy alloy coating is 100 microns-3 millimeter, the preparation equipment is simple, and the process is convenient.
Owner:LANZHOU UNIVERSITY OF TECHNOLOGY

Irradiation-resistant high-entropy alloy and preparation method thereof

The invention provides irradiation-resistant high-entropy alloy and a preparation method thereof. The general formula of the irradiation-resistant high-entropy alloy is TiZrHfVMoTaxNby, wherein X is no more than 0.25 and no less than 0.05, y is no more than 0.5 and no less than 0.05, and x and y are molar ratio. The preparation method of the irradiation-resistant high-entropy alloy comprises the following steps: sequentially mixing Ti, Zr, Hf, V, Mo, Ta and Nb, and then adopting vacuum electromagnetic suspension induction smelting or vacuum electric arc melting to obtain the irradiation-resistant high-entropy alloy. The irradiation-resistant high-entropy alloy is excellent in performance; helium ion simulated irradiation does not generate irradiation hardening damage; on the condition thatthe helium bubble size and traditional alloy size is equivalent, the bubble density is far lower than the density of the traditional alloy, and the lattice constant after irradiation is reduced abnormally; the irradiation resistance of the irradiation-resistant high-entropy alloy is far better than that of the traditional alloy; the irradiation-resistant high-entropy alloy has excellent strengthand plasticity; the compression yield strength of the irradiation-resistant high-entropy alloy under the cast condition is as high as 1.1 Gpa, and the compression ratio and elongation exceed 50%.
Owner:DALIAN UNIV OF TECH

Rare-earth type lithium iron phosphate serving as cathode material of lithium secondary battery and preparation method thereof

The invention relates to rare-earth type lithium iron phosphate serving as the cathode material of a lithium secondary battery and a preparation method thereof. The rare-earth type lithium iron phosphate contains 100 mole fractions of lithium iron phosphate, 3.9-7.8 mole fractions of rare-earth alloy and 1.1-2.2 mole fractions of cellulose acetate. The preparation method of the rare-earth type lithium iron phosphate comprises the following steps of: putting an iron source compound, a lithium source compound, a phosphorus source compound and a rare-earth material into a powder mixer for powder mixing; in the powder mixing process, gradually spraying cellulose acetate dissolved in acetone to the mixed powder so that cellulose acetate is uniformly stuck on the mixture particles of the four materials, and drying; pre-sintering the dried mixture particles in an atmosphere furnace under inert gas protection; and carrying out heat preservation on the pre-sintered powder in the atmosphere furnace under inert gas protection to obtain the rare-earth type lithium iron phosphate. The rare-earth type lithium iron phosphate provided by the invention has the advantages of good conductive performance, relatively short preparation time and the like.
Owner:HUAWEI TEHCHNOLOGIES CO LTD

Semiconductor device and method for improving semiconductor device performance

The invention discloses a semiconductor device and a method for improving semiconductor device performance. The method for improving semiconductor device performance comprises the following steps: an amorphousizing ion implantation is carried out on substrates on both sides of a gate structure to form amorphous layers, wherein the amorphous layers comprise first amorphous layers, second amorphous layers and third amorphous layers, and the first amorphous layers are located within a portion of the substrates below the gate structure; the second amorphous layers and the substrates with a second thickness located below the second amorphous layers are removed by etching, first grooves are formed in the amorphous layers, and second grooves and third grooves penetrating each other are formed below the first grooves; the third grooves are filled with an organic material layer; sidewalls of the second grooves are etched to form sigma-shaped dips; and the first grooves, the second grooves with the sigma-shaped dips and the third grooves are filled with a stress layer. According to the invention, the stress in the channel region is increased, the carrier mobility of the semiconductor device is improved and the electrical performance of the semiconductor device is improved.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

High-temperature and high-emissivity hafnium oxide base infrared radiating coating and preparing method thereof

InactiveCN109355613ARadiantStrong ionic polarityMolten spray coatingSpray GranulationEmissivity
The invention discloses a high-temperature and high-emissivity hafnium oxide base infrared radiating coating. According to the high-temperature and high-emissivity hafnium oxide base infrared radiating coating, HfO2 powder and rare earth oxide powder serve as main raw materials, water and a binding agent are added in the HfO2 powder and the rare earth oxide powder to prepare uniform slurry, and then the high-temperature and high-emissivity hafnium oxide base infrared radiating coating is formed sequentially through spray granulation, high-temperature roasting and heat spraying. According to the high-temperature and high-emissivity hafnium oxide base infrared radiating coating, compounding of HfO2 powder and Gd2O3 or Sm2O3 and other rare earth oxide is provided for the first time, the heatspraying technology is combined, the full-wave band normal integral emissivity of the obtained high infrared radiating coating at the normal temperature can reach 0.85 or above, the slow ascending tendency is achieved along with increasing of the high temperature, and good high temperature resisting performance and full-wave band infrared radiation performance can be combined; and the related preparing technology is simple, the synthesis time is short, energy consumption is low, and important study and popularization value is achieved.
Owner:WUHAN UNIV OF TECH

Soft magnetic material and preparation method thereof

The invention provides a soft magnetic material which is large in magnetic conductivity and low in magnetic loss and a preparation method thereof. The soft magnetic material comprises main components, auxiliary components and a sintering aid, wherein the main components relate to Fe2O3, NiO, ZnO and CuO, and the auxiliary components relate to Gd2O3 and B2O3; with the total molar weight of the soft magnetic material as the basic standard, the content of the Fe2O3 is 46-53mol%, the content of the NiO is 11-19mol%, the content of the ZnO is 22-27mol%, the content of the CuO is 6-11mol%, the content of the Gd2O3 is 0.1-1mol%, the content of the B2O3 is 0.1-2mol%, and the content of the sintering aid is 0.4-2mol%. According to the soft magnetic material and the preparation method thereof, the magnetic performance of products is improved, the products can have higher magnetic conductivity and low magnetic loss under the 13.56MHz condition, and then the communication distance of an NFC system of a mobile phone is improved; the Gd2O3 can increase the lattice constant, prevent domain wall movement, reduce superexchange interaction between ions on the A phase of a tetrahedron and ions on the B phase of an octahedron, improve cut-off frequency and reduce the magnetic loss, the B2O3 can form liquid-phase sintering, promote grain growth, make tissue compacter, and reduce internal and external air hole rates of a grain, and coercivity can be reduced and initial magnetic conductivity can be improved if a proper amount of B2O3 is added.
Owner:BYD CO LTD

Light-emitting diode epitaxy structure with hole energy adjustment layer

The invention provides a light-emitting diode epitaxy structure with a hole energy adjustment layer, and relates to a semiconductor device which has at least one potential jump barrier or surface barrier and is especially suitable for light emission. A P-type semiconductor material hole energy adjustment layer with a low barrier layer is inserted into a P-type semiconductor material transport layer of the LED epitaxy structure; the material is Al<x1>In<y1>Ga<1-x1-y1>N; in the formula, x1 is smaller than or equal to 1 and greater than or equal to 0; y1 is smaller than or equal to 1 and greater than or equal to 0; 1-x1-y1 is greater than or equal to 0; the thickness is 1-300nm; the lattice constant of the hole energy adjustment layer is greater than those of a P-type semiconductor material transport layer I and a P-type semiconductor material transport layer II; and the forbidden bandwidth is smaller than those of the P-type semiconductor material transport layer I and the P-type semiconductor material transport layer II. The hole energy is increased by a polarization electric field to improve the hole injection efficiency; a hole barrier is not increased; and the defects of low hole injection efficiency and low internal quantum efficiency in the prior art are overcome.
Owner:ZHIXIN SEMICON (HANGZHOU) CO LTD

Preparation method of glass ceramic with good thermal conductivity

The invention relates to a preparation method of glass ceramic with good thermal conductivity, and belongs to the technical field of glass ceramic materials. According to the invention, waste glass powder and silicon dioxide are used as raw materials, alumina fiber toughening-modified epoxy resin is used as a binder, and aluminum nitride, diamond, copper powder and waste ceramic powder with high thermal conductivity are used as fillers, and the glass ceramic with good thermal conductivity is prepared by doping rare earth lanthanum oxide through low-temperature co-firing. The diamond has high thermal conductivity, low dielectric constant, high resistivity and high breakdown field intensity; the aluminum nitride has excellent electrical properties and thermal properties, is a good thermal shock resistant material, has strong molten metal erosion resistance, is also an electrical insulator, and has good dielectric properties. By means of the low-temperature co-firing process, the preparation method is low in sintering temperature, low in dielectric constant and short in signal delay time; the glass serves as a fluxing agent to promote densification of the glass-ceramic composite material; in addition, the ceramic filler is used for improving the mechanical strength and insulativity of the substrate and preventing warping caused by the surface tension of the glass during sintering.
Owner:黄兰英
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