The invention discloses a polarization-doped InN-based
tunneling field effect transistor, and the problem that the random
doping fluctuation caused by the conventional physical
doping technology leadsto a decrease in device performance, the manufacturing process is complicated and the reliability is low are mainly solved. The polarization-doped InN-based
tunneling field effect transistor comprises a substrate (1), a buffer layer (2) and a
body region (3) from the bottom to top. An upper right part of the
body region is provided with a polarized inversion layer (4), a
dielectric layer (8) is deposited on an upper portion of the
body region and a left side and an upper portion of the polarized inversion layer, a gate step (9) is etched on the left side of the
dielectric layer, a modulationplate (10), a gate
electrode (11) and a tunneling gate (12) are orderly deposited on an upper part of the
dielectric layer from the right to the left, lower steps (5) are etched at two sides of the body region, and the upper parts of the left and right sides of the steps are provided with a source
electrode (7) and a drain
electrode (6). According to the invention, the annealing process in the traditional physical
doping technology is avoided, the output current and sub-threshold swing of a device are improved, the device reliability is improved, and the polarization-doped InN-based tunnelingfield effect
transistor can be used in a low-power circuit
system.