64 results about "Vinyloop" patented technology

Polar modifier systems based on a blend of DTHFP, ETE, TMEDA, DMTHFMA and / or functionally similar compounds with BDMAEE and SMT are used to make block copolymers having high levels of pendant vinyl double bond repeat units, which is through highly selective 1,2-bond butadiene addition, low vinylcyclopentane formation, unimodal narrow molecular weight distribution, and a low level of randomized co-monomer repeat units. The block copolymers have very high levels of 1,2-vinyl content and high 3,4-vinyl bond addition of the conjugated diene monomer and low vinylcyclopentane content. The polar modifier systems provide a fast polymerization rate, with a unimodal narrow molecular weight distribution. The polar modifier systems allow operation at a higher temperature than in prior art systems, which reduces cooling requirements.

In an embodiment, a printed circuit board substrate (12) comprises a polymer matrix; a reinforcing layer (42); and a plurality of coated boron nitride particles (44); wherein the plurality of coated boron nitride particles comprise a coating having an average coating thickness of 1 to 100 nanometers. The polymer matrix can comprise at least one of an epoxy, a polyphenylene ether, polystyrene, an ethylene-propylene dicyclopentadiene copolymer, a polybutadiene, a polyisoprene, a fluoropolymer, or a crosslinked matrix comprising at least one of triallyl cyanurate, triallyl isocyanurate, 1,2,4-trivinyl cyclohexane, trimethylolpropane triacrylate, or trimethylolpropane trimethacrylate.

The invention relates to a production technology of high-transparency and high-vinyl methyl vinyl silicon rubber. The production technology comprises the following steps of performing primary filtering and fine filtering on DMC, so as to remove colored impurities including iron rust and the like; removing impurities from auxiliary materials, VMC and divinyltetramethyldisiloxane through vacuum bubble dehydration and physical dynamic adsorption; using a high-temperature and low-pressure dehydration technology, adding the dehydrated material into a polymerizing kettle, adding a catalyst, VMC and a termination sealing agent to polymerize, and balancing after the polymerizing is completed; preheating the balanced rubber material, and then sending into a low molecule removal device to remove low molecule and produce the rubber. The production technology has the advantages that the problems of easiness in crosslinking and broad distribution of molecular weight in the high-vinyl raw rubber are solved; in the low molecule removal process, the gradual heating manner is adopted, and the problems of falling and crosslinking of vinyl, instability of vinyl content, slight yellowing of a product and the like due to continuous high temperature of local part in the raw rubber production heating process are solved.

A photosensitive resin composition comprising (A) an acid-modified vinyl-containing epoxy resin, (B) a photopolymerization initiator containing a compound having an oxime ester bond and (C) a sensitizer containing any of coumarin compounds of the following general formula (1).

The invention relates to an antifreeze hard epoxy asphalt pavement material and a preparation method thereof. The antifreeze hard epoxy asphalt pavement material is composed of the following components according to the weight ratio: 28-30 parts of petroleum asphalt, calcium stearate 5-9 parts for vinyl epoxy resin, 18-22 parts for vinyl epoxy resin, 9-13 parts for trimellitic anhydride, 5-6 parts for butyric acid, 4-6 parts for 1-hexene, and 3-5 parts for magnesium chloride. The pavement material is prepared by heating, melting, stirring, pulverizing, heat preservation and other steps of each material component. The prepared pavement material has good frost resistance and high hardness, which can prevent cracking due to cold weather as a road material. phenomenon occurs.