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18 results about "Benzoylformic acid" patented technology

Photocuring composition and application thereof

The invention provides a photocuring composition and application thereof. The composition comprises the following components: (a) at least one benzoyl formate compound; (b) at least one ethylenically unsaturated photopolymerizable compound; the benzoyl formate compound is obtained by reacting a compound shown in a general formula (I) with a compound shown in a general formula (II) or a general formula (III), or is obtained by further reacting the compounds shown in the general formula (I), the general formula (II) and the general formula (III) with a compound with an end-capped substituent group for end capping. The sensitivity of the obtained product is not reduced compared with that of existing small molecules, and the hardness of the product is improved under LED curing.
Owner:CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +2

Alpha-ketoamide derivatives and processes for their preparation

The application belongs to the technical field of compound synthesis, and particularly relates to an alpha-ketoamide derivative and a preparation method thereof, wherein the preparation method of the alpha-ketoamide derivative comprises the following steps: S1, first, a graphite carbon rod electrode and a platinum sheet electrode are respectively assembled on two sides of a 10mL three-port glass bottle; S2, then, a magnetic son is added into the three-port glass bottle, the bottle mouths on two sides are sealed, the three-port glass bottle is transferred to a glove box for feeding, and benzoylformic acid, morpholine and 10mol% of ferrocene in 4mL hexafluoroisopropanol are sequentially added; S3, after the feeding is completed, the last bottle mouth of the three-port glass bottle is sealed, and a constant current of 3mA is introduced for electrolysis. The application realizes the amination reaction of alpha-keto acid by using an electrocatalytic decarboxylation strategy, selectively synthesizes alpha-ketoamide derivatives, and the reaction is suitable for primary amine compounds, secondary amine compounds, is also suitable for aromatic and aliphatic alpha-keto acids, and excellent functional group tolerance is exhibited.
Owner:JINING UNIV

Saccharomyces cerevisiae engineering bacterium capable of synthesizing p-anisaldehyde from beginning and construction method of saccharomyces cerevisiae engineering bacterium

The invention relates to the technical field of bioengineering bacteria. The invention provides a saccharomyces cerevisiae engineering bacterium capable of synthesizing p-anisaldehyde from the beginning and a construction method of the engineering bacterium. A saccharomyces cerevisiae recombinant strain JS1-15 is used as an original strain; the saccharomyces cerevisiae engineering bacteria are obtained by heterologous expression of 4-hydroxymandelic acid synthetase HmaS, heme oxygenase HMO, benzoyl formate decarboxylase BFD and methyltransferase 4VPMT1. The saccharomyces cerevisiae engineering bacteria are used for preparing the saccharomyces cerevisiae engineering bacteria. The saccharomyces cerevisiae engineering bacterium disclosed by the invention can realize a complete de novo biosynthesis path from 4-hydroxyphenylpyruvic acid to p-anisaldehyde by taking glucose as a unique carbon source, and has good industrial application potential.
Owner:GUANGXI UNIV

Photocurable ink composition and application thereof

PendingCN121064666AInksPolymer scienceOligomer
The invention provides a photocuring ink composition and application thereof, and can be applied to the technical field of photocuring materials. Based on the total mass of the photocuring ink composition, the photocuring ink composition comprises the following components in percentage by mass: 0.5%-15% of a benzoyl formate photoinitiator; 8%-20% of an adhesive resin; 15%-70% of a polymerizable acrylate monomer or an oligomer thereof; and 1%-50% of a coloring component. The photocuring ink composition provided by the invention is good in photocuring property, excellent in solvent wiping resistance, low in mobility and small in odor, has a wide application prospect, and is particularly beneficial to popularization and application in the food packaging industry.
Owner:CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO LTD +1

A diaminopimelate dehydrogenase mutant and application thereof in synthesis of d-phenylglycine

ActiveCN116656639BBacteriaMicroorganism based processesDiaminopimelate dehydrogenaseMutant
The present application relates to diaminopimelic acid dehydrogenase mutant and its application in D-phenylglycine synthesis. The present application discloses a diaminopimelic acid dehydrogenase mutant which is obtained by molecular modification of diaminopimelic acid dehydrogenase from Bacillus thermozeamaize, a nucleic acid coding the diaminopimelic acid dehydrogenase mutant, a recombinant expression vector containing the nucleic acid, a recombinant expression transformant containing the recombinant expression vector, and the use of the diaminopimelic acid dehydrogenase mutant in the synthesis of D-phenylglycine from asymmetric reduction of aminated benzoylformic acid. Compared with other D-phenylglycine synthesis methods, the route of the present application is simple, the theoretical yield is high, the atom economy is good, the substrate concentration and the product yield are high, and the optical purity of the product is greater than 99%. Therefore, the present application belongs to an environmentally friendly, high stereoselectivity and green and environmentally friendly biosynthesis method, and has good application prospect in the actual production of D-phenylglycine.
Owner:EAST CHINA UNIV OF SCI & TECH

A uv-led curable composition and inkjet ink containing the same

PendingCN122647947AEndcappingPolymer science
The application provides a UV-LED curable composition and an inkjet ink containing the same, the composition comprising the following components: (a) a photoinitiator component, wherein at least one benzoyl formate compound is contained; (b) a polymerizable compound; (c) a colorant; wherein the benzoyl formate compound is obtained by the reaction of a compound represented by general formula (I) and a compound represented by general formula (II) or general formula (III), or the benzoyl formate compound is obtained by the reaction of a compound represented by general formula (I) and a compound represented by general formula (II) or general formula (III) and the reaction of a compound with a blocking substituent to block the compound, and the UV-LED curable composition of the application can make the inkjet ink have the characteristics of high activity, low yellowing and low odor, and has a good application prospect.
Owner:CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO LTD +2

Photocurable composition and use thereof

PendingCN122465469APolymer scienceFormate
The present application provides a kind of photocuring composition and its application, the composition includes the following components: (a) at least one benzoyl formate compound;(b) at least one ethylenically unsaturated photopolymerizable compound;Wherein the benzoyl formate compound is by the compound shown in general formula (I) and the compound shown in general formula (II) and the compound shown in general formula (III) are reacted, the solubility of the benzoyl formate compound of the present application is excellent, the sensitivity of the obtained product does not reduce compared with the existing small molecule sensitivity, and the hardness of the product is improved under LED curing.
Owner:CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO LTD +2

Treatment method of alkali wastewater generated in production of methyl benzoylformate

The invention belongs to the technical field of alkali wastewater treatment of photoinitiators, and discloses a method for treating alkali wastewater generated in the production process of methyl benzoylformate, which comprises the following steps: standing and filtering the alkali wastewater generated in the production process of methyl benzoylformate, adding a flocculating agent and acid at the same time, adjusting the pH value to 6-7, stirring, precipitating and carrying out suction filtration to obtain refined mother liquor; heating the refined mother liquor for rectification, and collecting fractions and residual liquid; condensing the fractions, heating and purifying to obtain methanol, and reusing the methanol in the production of methyl benzoylformate; the residual liquid is heated and rectified, a fraction and a base solution are collected, and the fraction is rectified water; cooling the base solution, and preserving heat until the base solution does not cake any more and suspension exists in the base solution; the rectified water is reused for methyl benzoylformate production; carrying out suction filtration on the rectification base solution obtained in the previous step to obtain kettle liquid and inorganic salt crystals, collecting the inorganic salt crystals, and separating to obtain sodium sulfate solids; the method solves the problems of low methanol recovery rate, high organic matter residue, difficulty in solid waste treatment and the like in the alkali wastewater.
Owner:SHANGYU DONGHAI CHEM IND CO LTD

Tea wing bug aggregation pheromone as well as preparation method and application thereof

The invention provides a tea wing bug aggregation pheromone. The tea wing bug aggregation pheromone takes methyl benzoylformate as an effective component. The invention further provides a preparation method and application of the tea wing bug aggregation pheromone. The tea wing bug aggregation pheromone has the advantages of being green, safe, long in validity period and free of negative effects on the yield and quality of fruit trees. The application frequency of chemical pesticides can be effectively reduced by using the tea wing bug aggregation pheromone, so that the pesticide application interval is prolonged, and the problems of pesticide residues and phytotoxicity of fruit trees are reduced.
Owner:CHINA AGRI UNIV

An amide derivative and a process for its preparation

The application belongs to the technical field of compound synthesis, and particularly relates to an amide derivative and a preparation method thereof, wherein the preparation method of the amide derivative comprises the following steps: S1, graphite carbon rod electrodes and platinum sheet electrodes are respectively arranged on two sides of a 10mL three-port glass bottle; S2, a magnet is added to the three-port glass bottle, the bottle mouth is sealed, and then the three-port glass bottle is transferred to a glove box for feeding, and benzoylformic acid, morpholine, 10mol% ferrocene, tetrabutylammonium iodide, 75mg molecular sieves and 4mL anhydrous acetonitrile are sequentially added; S3, after the feeding is completed, the bottle mouth of the three-port glass bottle is tightly wrapped with sealing film, and argon is introduced into the three-port glass bottle. The application utilizes the oxidation capacity of electrochemistry, uses ferrocene as a redox medium, performs decarboxylation activation on alpha-keto acid, and is combined with an amine compound to synthesize an amide derivative, so that the construction of a C-N bond is realized. The method is not only suitable for aromatic alpha-keto acid, but also suitable for aliphatic alpha-keto acid, and can be compatible with primary amine and secondary amine compounds.
Owner:JINING UNIV

Application of leucine dehydrogenase and mutant thereof in synthesis of L-phenylglycine compound

The invention belongs to the technical field of biology, and particularly relates to application of leucine dehydrogenase and a mutant thereof in asymmetric synthesis of an L-phenylglycine compound. The amino acid sequence of the leucinase mutant M2-1 is as shown in SEQ ID NO.2, the amino acid sequence of the leucinase mutant M2-2 is as shown in SEQ ID NO.3, the amino acid sequence of the leucinase mutant M2-3 is as shown in SEQ ID NO.4, and the amino acid sequence of the leucinase mutant M2-4 is as shown in SEQ ID NO.5. The leucine dehydrogenase and the leucine dehydrogenase mutant show significantly improved catalytic activity and strict stereoselectivity on benzoyl formic acid derivatives, and have practical industrial application value.
Owner:SHENYANG PHARMA UNIV

Photocuring composition and application thereof

The invention provides a photocuring composition and application thereof. The composition comprises the following components: (a) at least one benzoyl formate compound; (b) at least one ethylenically unsaturated photopolymerizable compound; the benzoyl formate compound is obtained by reacting a compound shown in a general formula (I) with a compound shown in a general formula (II), or is obtained by further reacting the compounds shown in the general formula (I) and the general formula (II) with a compound with an end-capped substituent group for end-capping. The sensitivity of the obtained product is not reduced compared with that of existing small molecules, and the hardness of the product is improved under LED curing.
Owner:CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +2

Active energy beam-curable resin composition

PCT designated stage expiredWO2025159133A1Polymer scienceMeth-
The present invention addresses the problem of providing an active energy beam-curable resin composition having excellent tack-free properties on the surface of a cured film. As a means of solving the foregoing, provided is an active energy beam-curable resin composition containing components (A), (B), (C), and (D): Said composition is characterized in that: (A) is a urethane acrylate having a polytetramethylene ether skeleton and / or a polytrimethylene ether skeleton; (B) is at least one photopolymerization initiator selected from the group consisting of benzophenone derivatives, methyl benzoyl formate derivatives, and alpha-hydroxyacetophenone derivatives; (C) is fumed silica; and (D) is a reactive diluent having a (meth) acryloyl group. and (C) the fumed silica. Said composition is also characterized in that: when the total of the component (A) and the component (D) is 100 parts by mass, the (C) fumed silica content is 4 parts by mass or more; and the surface tack of a cured film cured by LED light having 365 nm in the presence of air is 20 gf / cm 2 or less.
Owner:SEKISUI FULLER CO LTD

Photocurable composition and use thereof

Provided in the present application are a photocurable composition and the use thereof. The composition comprises the following components: (a) at least one benzoyl formate compound; and (b) at least one ethylenically unsaturated photopolymerizable compound; and the benzoyl formate compound is obtained by reacting a compound represented by general formula (I) with the compound represented by general formula (II) or general formula (III), or is obtained by further reacting and terminating the compounds represented by formula (I), formula (II) and general formula (III) with a compound having an end-capping substituent. The benzoyl formate compound of the present application has good dissolving performance, the sensitivity of the obtained product is not reduced relative to that of existing micromolecules, and the hardness of the product is improved under the curing of an LED.
Owner:CHANGZHOU TRONLY ADVANCED ELECTRONICS MATERIALS CO LTD +2

Leucine dehydrogenase and application thereof in synthesis of L-phenylglycine compound

PendingCN120555387AOxidoreductasesFermentationGlycineBenzoylformic acid
The invention belongs to the technical field of biology, and particularly relates to leucine dehydrogenase and application thereof in synthesis of L-phenylglycine compounds. The amino acid sequence of the leucine dehydrogenase BmLeuDH is as shown in SEQ ID NO. 1, and the amino acid sequence of the leucine dehydrogenase BcLeuDH is as shown in SEQ ID NO. 3. As a biocatalyst, the leucine dehydrogenase disclosed by the invention can stereoselectively catalyze benzoylformic acid and derivatives thereof to prepare corresponding L-phenylglycine compounds, shows a wide substrate spectrum and strict stereoselectivity, and particularly shows excellent catalytic activity on benzoylformic acid. According to the invention, an L-phenylglycine compound synthetase tool library is enriched, and a green and efficient biocatalyst is provided for synthesis of the L-phenylglycine compound, especially L-phenylglycine.
Owner:SHENYANG PHARMA UNIV

An environmentally-friendly solvent-free UV battery box coating formula, preparation method and application method for replacing blue film

PendingCN122356980AElectrolytic agentMeth-
This invention discloses a formulation, preparation method, and application method of an environmentally friendly solvent-free UV battery box coating that can replace blue film, belonging to the field of UV curable coatings and new energy battery protection technology. The coating is a 100% solids-containing solvent-free system, and its formulation includes: polyurethane acrylate, silicone-modified acrylate; TMPTA, IBOA, DMAA; TPO / L-TPO type acylphosphine oxide, phenyl bis(2,4,6-trimethylbenzoyl)phosphine oxide, methyl benzoylformate; titanium dioxide, phthalocyanine blue, fumed silica; adhesion promoter, leveling agent, and silane coupling agent. This coating has zero VOC, insulation withstand voltage ≥DC6000V / 60s, adhesion grade 0, no abnormalities after 72h electrolyte resistance, and UL94V0 flame retardancy. It can be applied in various ways, replacing PET blue film and pressure-sensitive adhesive processes, meeting the insulation protection and green manufacturing requirements of high-voltage platform power batteries.
Owner:HAINAN WEIXIN MATERIAL TECHNOLOGY (SHANGHAI) CO LTD

Benzoylformic acid amide derivative

PendingUS20260070874A1Cosmetic preparationsImpression capsUltraviolet lightsBenzoylformic acid
A benzoylformic acid amide derivative is provided that has photopolymerization initiation properties and photosensitization effect with respect to long-wavelength ultraviolet light, and a cured product obtained from a curable composition that contains the benzoylformic acid amide derivative has an extremely low content of a low molecular weight component, and has high yellowing resistance, durability and safety.
Owner:KJ CHEM