The application provides a two-dosage-form
copper etching liquid and a preparation method thereof, and belongs to the technical field of
copper etching liquids, and comprises the following steps: mixing deionized water,
ethylene glycol monobutyl
ether and a
hydrogen peroxide aqueous solution to obtain an A agent; mixing and reacting deionized water, a glucose acid
aqueous solution, aminotri (methylenephosphonic acid),
lactic acid,
triisopropanolamine, gamma-
glycidyl ether oxypropyl trimethoxysilane and
aluminum lactate to obtain an aluminum-containing
hybrid precursor; adding a first
phosphoric acid aqueous solution,
methanesulfonic acid and
lactic acid into the aluminum-containing
hybrid precursor, and then adding
triisopropanolamine, a second
phosphoric acid aqueous solution, 5-amino
tetrazole and deionized water, and performing aging and
filtration to obtain a B agent; and mixing the A agent, the B agent and deionized water to obtain the two-dosage-form
copper etching liquid. The application can improve the storage stability, etching uniformity and copper
surface flatness of the etching liquid.