Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

119results about How to "Achieve passivation" patented technology

Polyaniline modified glass flake heavy-duty anti-corrosive coating and preparation method thereof

The invention relates to coating technology, in particular to a polyaniline modified glass flake heavy-duty anti-corrosive coating and a preparation method thereof to solve the problems that when theprior glass flake anti-corrosive coatings are constructed, most of the glass flake anti-corrosive coatings require to coat primer on the surface of steel or other metal matrix to improve the corrosionresistance and prevent corrosion between the coat and the interface of the matrix, and the like. The polyaniline modified glass flake heavy-duty anti-corrosive coating comprises epoxy resin, a polyaniline modified glass flake, an amine curing agent and the like. A polyaniline coating layer is formed on the surface of the glass flake by an oxidative polymerization method; the glass flake after thetreatment has the passivating effect on metal; and a phytic coating layer on the surface of the glass flake also has the corrosion inhibiting effect on the metal. The polyaniline modified glass flakeheavy-duty anti-corrosive coating has strong corrosion resistance and permeability resistance, can be applied to heavy-duty anti-corrosive projects such as petrochemical equipment, pipelines, offshore oil platforms, wharf facilities, shipping and the like, and is particularly suitable for protecting wave splashing zones and tidal difference zones.
Owner:INST OF METAL RESEARCH - CHINESE ACAD OF SCI

Cutter blunting machine

The invention relates to a cutter blunting machine, which comprise a rack, a grinding material tank, a grinding material, a drive motor, an output frame and rotating shafts, wherein the grinding material tank is capable of vertically moving along the height direction of the rack for adjustment; the grinding material is contained in the grinding material tank; the drive motor is arranged on the rack and an output shaft of the drive motor is vertically downward; the output frame is fixed to the lower end of the output shaft; the rotating shafts are arranged in parallel with the output shaft and rotatably arranged on the output frame around the respective axes; a to-be-blunted cutter is detachably mounted on the lower end parts of the rotating shafts; and when the cutter blunting machine works, the lower end parts of the rotating shafts and the to-be-blunted cutter stretch into the grinding material tank; the drive motor drives the rotating shafts to rotate and revolve on own axes, so that the cutter is blunted by the grinding material. According to the cutter blunting machine, the rotating shafts rotate around the output shaft of the drive motor and revolve on own axes, and the cutter is driven to rotate inside the grinding material tank provided with the grinding material, so that the cutter is blunted. The cutter blunting machine has the advantages that the structure is simple; the implementation is convenient; and the cost is low.
Owner:江苏仓环铜业股份有限公司

Back surface junction N-type double-sided crystal silicon cell and preparation method thereof

The invention provides a back surface junction N-type double-sided crystal silicon cell and a preparation method thereof. The cell comprises a front surface Ag electrode, a front surface antireflection film, a phosphorus diffusion N+ front surface field layer, an N-type substrate, a boron diffusion emission electrode P+ layer, a back surface passivation composite film and a back surface AgAl electrode. The front surface and the back surface of the cell have a textured structure. The back surface passivation composite film comprises a borosilicate glass layer and a silicon nitride layer. The borosilicate glass layer is arranged on the boron diffusion emission electrode P+ layer. The silicon nitride layer is deposited on the borosilicate glass layer. Both of the front surface and the back surface of the cell can effectively receive sunlight irradiation for power generation so that comprehensive efficiency of the cell can be enhanced; and the laminated film of the borosilicate glass layer and the silicon nitride layer through oxidation treatment is adopted to act as a boron emission electrode passivation layer and a diffusion masking layer of subsequent phosphorus diffusion so that boron emission electrode passivation and diffusion masking functions can be realized simultaneously, and the process of multiple times of etching and mask deposition in the manufacturing process can be reduced. The back surface junction N-type double-sided crystal silicon cell is simple in technology, high in production efficiency and low in production technology cost.
Owner:中国东方电气集团有限公司

N-type back junction crystalline silicon cell and preparation method thereof

The invention provides an N-type back junction crystalline silicon cell and a preparation method thereof. The battery comprises a front surface Ag electrode, a front surface antireflection film, a phosphorus diffusion N+ front surface field layer, an N-type base, a boron diffusion emitter P+ layer, a back passivation composite film and a back AgAl electrode, wherein the PN junction is located on the back surface of the cell; a polishing structure is adopted by the back surface of the battery; the back passivation composite film comprises a borosilicate glass layer and a silicon nitride layer; the borosilicate glass layer is located on the boron diffusion emitter P+ layer; and the silicon nitride layer is deposited on the borosilicate glass layer; a boron emitter is passivated by the borosilicate glass layer and silicon nitride laminated film structure generated in the boron diffusion process; the polishing structure is adopted by the back surface; and the passivation effect of the boron emitter is further improved. The preparation technology of the battery is relatively simple, can be compatible with equipment of the current crystalline silicon cell production line, and is suitable for large-scale industrial production; and the cost can be reduced.
Owner:中国东方电气集团有限公司

Preparation method of low-defect quasi-two-dimensional perovskite film based on methanesulfonic acid negative ion induction

The invention discloses a preparation method of a low-defect quasi-two-dimensional perovskite film based on methanesulfonic acid negative ion induction. According to the method, methanesulfonic acid (MeS) negative ions are led in an L2An-1MnX3n+1 perovskite precursor to adjust phase compositions, so that a more effective energy transfer way is generated. Crystal boundary and surface defect inactivation is achieved by the MeS negative ions, and non-radiative recombination is effectively restrained. The service life of an exciton of the prepared quasi-two-dimensional perovskite film is obviouslyprolonged, and three-dimensional perovskite crystal particles are obviously increased. CsMeS is added into quasi-two-dimensional metal halide perovskite precursor solution to adjust perovskite phasecompositions, so that more three-dimensional perovskite crystal particles are generated as compared with a traditional method, and the more effective energy transfer way is generated. According to themethod, mixing of perovskite crystal lattices in the used CsMeS is omitted, the crystal lattices only exist on the surfaces of the perovskite crystal lattices, crystal boundary and surface defect inactivation can be achieved by MeS negative ions in the CsMeS, and non-radiative recombination is effectively restrained.
Owner:SHANGHAI UNIV

Process of carrying out low-temperature chemical cleaning passivation on thermal power plant boiler by utilizing EDTA (Ethylene Diamine Tetraacetic Acid)

The invention relates to a low-temperature chemical cleaning method for a thermal power plant boiler and in particular relate to a process of carrying out low-temperature chemical cleaning passivation by utilizing EDTA (Ethylene Diamine Tetraacetic Acid). The process comprises the following steps: A. connecting a chemical cleaning platform with a system which needs to be cleaned to form a cleaning system, and flushing with circulating water after the connected cleaning system is subjected to a hydraulic test until effluent is transparent and is free from impurities; B. heating the cleaning system cyclically; C. carrying out alkali wash, and flushing; washing by use of EDTA; and passivating. The process has the following characteristics: energy is saved, the consumption is reduced, the cleaning period is shortened, the cleaning cost is reduced, and the boiler can be cleaned and passivated in one step. After the thermal power plant boiler is cleaned by the EDTA at low temperature, a passivation process is added. An alkali substance is added into EDTA cleanout fluid to regulate the pH value of the EDTA cleanout fluid so as to passivate the cleaned boiler. The cleaning process disclosed by the invention is suitable for boilers of various specifications and is beneficial to implementation and popularization on site.
Owner:NINGXIA ELECTRIC POWER RES INST

Continuous flow cell electric amalgamation chip based on silicon structure on insulator

The invention discloses a cell-electrofusion chip of continuous flow based on silicone structure of an insulator and a processing technology thereof. The cell-electrofusion chip comprises a shell, a microelectrode array chip fixed in the shell, a sample input and output pipe communicating with the inside and the outside of the shell, and a silicone glass sheet encapsulated on the surface of the shell. The microelectrode array chip consists of a siliceous basal layer, a silicon dioxide insulating layer, a low-resistivity silicon electrode layer and a silicon dioxide protective film in turn from down to up. Using the micro machining technology, a groove is etched on the low-resistivity silicon electrode layer of silicon materials on the insulator till the silicon dioxide insulating layer forms a microelectrode structure. In virtue of microscale and arrangement of microchannel, external electric signals forms gradient field with sufficient intensity and increases cell-electrofusion efficiency. At the same time, a linear type microchannel constructed on the chip contributes for the flow of cell suspension and reduces cell adhesion in flow movement as low as possible. The development of the cell-electrofusion experiment of continuous flow can approximate to provide fusion cells with unlimited quantity.
Owner:CHONGQING UNIV

Method for achieving aluminum powder passivation by wrapping aluminum powder with zirconium oxide

ActiveCN106498365AAddress reactivitySolve the problem of changing its own chemical propertiesChemical vapor deposition coatingVacuum pumpingAluminium powder
The invention discloses a method for achieving aluminum powder passivation by wrapping aluminum powder with zirconium oxide. The method comprises the following steps that firstly, the aluminum powder needing to be wrapped is placed in a powder clamping device with the bottom provided with a filter net, and then the powder clamping device is placed in a cavity of an atom layer deposition reactor to be subjected to vacuum pumping; secondly, the cavity is heated, the cavity is constantly inflated with fluidization gas in the heating process, and the aluminum powder is pre-scattered; thirdly, when the cavity temperature reaches the preset temperature, the atom layer deposition reaction is started, and a layer of zirconium oxide film is deposited on the surface of the aluminum powder; and fourthly, the third step is repeatedly conducted, multiple layers of zirconium oxide films are deposited on the surface of the aluminum powder, and aluminum powder passivation is achieved. According to the method, the atom deposition technology is used for wrapping the surfaces of aluminum powder particles with a layer of zirconium oxide film with the nanometer thickness, aluminum powder passivation is achieved, and the beneficial effects that operation is convenient, and the technology is simple are achieved.
Owner:HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products