The invention relates to the technical field of
cosmetics, in particular to a rapid
acne-removing composition containing colloidal
sulfur as well as a preparation method and application of the rapid
acne-removing composition. The invention relates to a rapid
acne-removing composition containing colloidal
sulfur. The rapid acne-removing composition is prepared from the colloidal
sulfur,
cyclodextrin inclusion
licochalcone A and hydroxyapatite, the invention relates to a preparation method of a rapid acne-removing composition containing colloidal sulfur. The preparation method comprises the following steps: S1, preparing
cyclodextrin inclusion
licochalcone A; s2, constructing a colloidal sulfur-
hydroxyapatite composite system; mixing and preparation: mixing the
cyclodextrin inclusion
licochalcone A prepared in the step S1 with the composite dispersion
system prepared in the step S2, then adding dermatologically acceptable auxiliary materials, and homogenizing to obtain a target composition; the acne-removing
mask has the beneficial effects that the acne-removing
mask has a synergistic effect and can quickly remove acnes; slow-release synergism is realized, and
irritation is reduced; repairing the
skin barrier; the preparation method is simple.