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104results about How to "Avoid process complexity" patented technology

High-strength light foam ceramic plate and manufacturing method thereof

The invention discloses a high-strength light foam ceramic plate and a manufacturing method thereof, and belongs to the field of building material manufacturing. The ceramic plate comprises the following materials in percentage by weight: 10-30 percent of sludge/bottom mud, 20-30 percent of building waste, 15-25 percent of waste ceramic, 10-25 percent of waste glass, 5-15 percent of bentonite, 5-15 percent of kaolin, 0.5-5 percent of aluminum powder, 5-10 percent of sodium bicarbonate, 0.5-1.5 percent of animal albumen foaming agent and 9-16 percent (percentage of total amount of the solid matters) of water. The manufacturing method comprises the following steps of: mixing and crushing the main raw material; adding the animal albumen foaming agent and water; granulating; filling a granular material into a refractory combined mould; leveling; filling in a kiln; firing; and performing cold processing to produce a ceramic plate finished product. The high-strength light foam ceramic plate has the advantages of high product strength, small volume weight, fire proofing, excellent freeze proofing, long-term water proofing, readily available main raw material which basically comes from environmental solid waste, has a wide source and is low in cost and adoption of the animal albumen foaming agent of small using amount and wide source; the manufacturing process has the advantages of simplicity, high efficiency, energy conservation, environmental friendliness, no secondary pollution; and the high-strength light foam ceramic plate can be used as thermal insulation decorative materials, fire barriers and the like of exterior walls of buildings.
Owner:SICHUAN UNIV

Non-curing rubber asphalt waterproof material and preparation method thereof

The invention discloses a non-curing rubber asphalt waterproof material and a preparation method thereof. The non-curing rubber asphalt waterproof material comprises raw materials in parts by weight as follows: 30-70 parts of base asphalt, 15-40 parts of waste tire rubber powder, 0.25-1.0 part of a desulfurizing agent, 0.8-4 parts of a composite modifier, 0.5-5 parts of a softening agent, 0.25-3 parts of a cross-linking agent and 5-15 parts of filler, wherein the grain size of the waste tire rubber powder is 20-80 meshes. The preparation method comprises steps as follows: raw material preparation, hot melting and mixture homogenization are performed; finally, the cross-linking agent and the filler in parts by weight are sequentially added to a storage tank and are stirred and mixed for 15-20 min, and the non-curing rubber asphalt waterproof material is formed. The waste tire rubber powder is directly subjected to circular shearing desulfurization by a high-shear homogenizer under the action of the desulfurizing agent in a high-temperature asphalt medium, rubber molecules are uniformly dispersed in an asphalt system in a linear structure manner and then form a stable stereoscopic meshed rubber structure with the filler under the action of the cross-linking agent, and the product performance is more stable.
Owner:河北交投特种材料科技有限公司 +1

A radar/infrared compatible invisible coating resistant to 600 DEG C and a preparing method thereof

A radar/infrared compatible invisible coating resistant to 600 DEG C is disclosed. The invisible coating is on the surface of a metal substrate, and includes an adhesive layer, a 8YSZ-Al2O3 ceramic bottom layer, a high-temperature resistance coating, a 8YSZ isolating layer and a high-temperature conductor coating in order from bottom to top form the surface of the metal substrate. The high-temperature resistance coating and the high-temperature conductor coating are in paster forms, and pasters are arranged periodically. A preparing method of the invisible coating is also disclosed. The structure of the invisible coating has a radar/infrared compatible stealth function. A resistance type periodic structure is introduced so that the invisible coating has a good wave absorbing function, anda defect that traditional wave absorbing coatings need absorbents so as to cause unsatisfied wave absorbing performance, big influences on processes and instable performance is solved. A conductor periodic structure is introduced to the surface layer, and the radar/infrared compatible stealth function is achieved by utilizing a high reflectivity characteristic for the infrared waveband and a hightransmittance characteristic for the radar waveband.
Owner:NAT UNIV OF DEFENSE TECH

Method for packaging wafer level glass micro-cavity of light-emitting diode (LED)

The invention discloses a method for packaging a wafer level glass micro-cavity of a light-emitting diode (LED), and the method comprises the following steps: (1) etching a micro-slot array corresponding to the pattern of a packaged LED array on a silicon wafer, wherein the micro-slots are communicated through a micro-channel, and a proper amount of heat gas releasing agent is arranged inside the micro-slots; (2) forming a closed cavity; (3) heating the bonded wafer in the air to form a spherical glass micro-cavity and a cylindrical glass micro-channel connected with the spherical glass micro-cavity, cooling to room temperature, annealing, and removing silicon to obtain a wafer level glass micro-cavity; (4) sputtering a metal layer on the silicon wafer, and preparing a metal lead through photolithography, so as to obtain a lead substrate, wherein the position of the metal lead corresponds to the position of the micro-channel of the glass micro-cavity; (5) mounting an LED chip on the lead substrate, and leading; (6) bonding the wafer level glass micro-cavity with the substrate to form a bonded wafer; and (7) filling the gap between the LED chip and the wafer level glass micro-cavity with silicone through the glass micro-channel. According to the invention, the light emitting efficiency is high, and a packaged glass lens realizes beam collimation.
Owner:SOUTHEAST UNIV

Method for reducing stress on peripheral region of silicon through hole

The invention relates to a method for reducing stress on the peripheral region of a silicon through hole. The silicon through hole can be subjected to etching, side wall insulation, seed layer deposition, through hole filling and other process steps in a preparation process to generate process residual stress; in addition, the thermal expansion coefficient of copper is greatly different from that of a peripheral material, therefore, a certain stress concentration phenomenon is generated on the periphery region of the silicon through hole, and the stress can bring adverse effects on the performances and reliabilities of semiconductor devices around the silicon through hole. The invention provides a solution for processing a stress eliminating structure with a certain depth and specific shape within a certain region at the periphery of the silicon through hole in order to overcome the limitation of reducing the stress at the periphery of the hole and the stress influence range in an annealing way adopted at present. Compared with the prior art, the method has the beneficial effects that the process complexity of the annealing way for eliminating the stress is lowered, the area of a stress influence region is greatly reduced, the service life of the silicon through hole can be remarkably prolonged and the working stability of peripheral devices can be remarkably improved through arranging the specific stress eliminating structure within a certain region at the periphery of the silicon through hole by using the traditional etching way, and the method has the advantages of simple and reliable process and easiness for realization.
Owner:NAT CENT FOR ADVANCED PACKAGING

Method for preparing wafer-level uniform-dimension glass microcavity by positive pressure thermal forming

The invention discloses a method for preparing a wafer-level uniform-dimension glass microcavity by positive pressure thermal forming. The method comprises the following steps of: etching an array consisting of microgrooves on a silicon wafer, and etching microchannels connecting the microgrooves, wherein the minimum groove width of the microgrooves is 5 times more than the runner width; and putting a proper amount of thermal outgassing agent into at least one microgroove, correspondingly bonding the plurality of microgrooves to form a sealed cavity by using a glass wafer, heating to soften the glass, making the thermal outgassing agent heated to release gases to generate positive pressure, acting the positive pressure on the softened glass corresponding to the plurality of microgrooves which are connected through the microchannels so as to form a spherical microcavity with uniform dimension, and cooling the microcavity. By connecting the same microgrooves through the microchannel, the inside air pressure of the microgrooves is substantially consistent, and the formed glass microcavity has uniform dimension. When the dimension of the microgrooves is far greater than that of the microchannel, the microchannels with smaller radius hardly expand due to higher additional pressure. Therefore, the glass corresponding to the microchannels can keep smooth.
Owner:SOUTHEAST UNIV

Manufacture method of shallow trench isolation structure for adjusting stress of isolation oxide by ion implantation

The invention discloses a manufacture method of a shallow trench isolation structure for adjusting stress of isolation oxide by ion implantation. The method comprises the following steps of: step a, forming a protection layer on a semiconductor substrate; step b, forming a trench for isolating a PMOS (P-channel Metal Oxide Semiconductor) active region and a NMOS (N-channel Metal Oxide Semiconductor) active region on the semiconductor substrate and the protection layer; step c, forming a filling material layer in the trench, so that the trench is filled with the filling material layer to form a shallow trench isolation structure;step D, removing the excess filling material on the surface of the protection layer. The invention has the beneficial effects that for devices adopting HARP (high aspect ratio process) as shallow trench isolation, the stress of the isolation oxide around the PMOS (P-channel Metal Oxide Semiconductor) is adjusted from tensile to pressing by ion implantation, so that the stress state of the PMOS (P-channel Metal Oxide Semiconductor) trench region is changed and the performance is improved; the process is simple and practicable and the process complexity of selective shallow trench filling can be overcome effectively.
Owner:SHANGHAI HUALI MICROELECTRONICS CORP

Power battery as well as power battery cover plate and manufacturing method thereof

The application relates to a power battery as well as a power battery cover plate and a manufacturing method thereof. The power battery cover plate comprises a cover plate body, an insulation protective layer covered on an inner layer of the cover plate body, and a post terminal penetrating through the cover plate body, wherein an injection molding layer for realizing a sealed connection between the post terminal and the cover plate body is arranged between the post terminal and the cover plate body, and the injection molding layer and the post terminal are molded through an injection moldingmode and form a chemical bond connection. According to the application, a chemically bonded injection molding layer is molded and formed on the surface of the post terminal by adopting an injection molding mode, the sealed connection between the post terminal and the cover plate body can be achieved by using the injection molding layer, and thus the problems of complex process, higher cost, low structural strength, lower reliability of the power battery and the like caused by adopting a riveting or snap spring structure for sealing in the prior art can be effectively avoided; and according tothe application, the complexity of a manufacturing process can be reduced through the injection molding mode, a low cost can be achieved, and the structural strength and the equipment reliability canbe ensured.
Owner:SHENZHEN EVERWIN PRECISION TECH

Method for preparing high-silicon steel sheet by powder compression sintering

ActiveCN110842194AGuaranteed to be free of inclusionsGuaranteed inclusionSiliconMaterials science
The invention discloses a method for preparing a high-silicon steel sheet by powder compression sintering, and belongs to the technical field of powder metallurgy. According to the method, gas atomized Fe-6.5 wt.% Si powder is used as a raw material, the powder is in a compact state through powder presetting, the powder is placed in a vacuum sintering furnace to be metallurgically bonded through high-temperature sintering, multi-passes hot rolling are carried out to a certain thickness and then 1-4 times of cold rolling are carried out, and finally annealing is carried out at high temperatureto obtain the high-silicon steel sheet with excellent performance. Compared with adopting water atomized powder, gas atomized high-silicon steel powder is adopted and oxide inclusions of an alloy system are greatly reduced, meanwhile, the problem that spherical gas atomized powder is difficult to form is solved by adopting a direct compression sintering method, so that the process complexity and the subsequent problems of degumming and carbon residue caused by adding a forming agent are avoided, and the method has the advantages of being simple to operate, high in production efficiency, high in product precision, short in process flow, free of pollution and inclusions, excellent in performance and the like.
Owner:UNIV OF SCI & TECH BEIJING

Production method of carbon vanadium nitride solid melt and hard alloy thereof

The invention relates to a production method of a carbon vanadium nitride solid melt and a hard alloy thereof, belongs to the technical field of hard alloys and aims to solve the technical problem ofproviding a production method which is low in cost and easy in process control for the carbon vanadium nitride solid melt and the hard alloy thereof. The production method of the carbon vanadium nitride solid melt comprises the following steps: a, carrying out ball milling, namely putting solid powder into absolute ethyl alcohol in a liquid-solid ratio of (4-8):1, and carrying out ball milling mixing with a ball material ratio of (5-10):1, wherein the solid powder is carbon vanadium nitride powder and carbon nitriding metallic powder, and the carbon nitriding metallic powder is titanium carbonitride powder or carbon vanadium nitride powder; b, carrying out filtration and drying; c, carrying out pressing molding; d, carrying out reductive carbonization, thereby obtaining the carbon vanadiumnitride solid melt. Ti(C, N) or V(C, N) made by using a common carbon thermal reduction method provided by the invention is a nitrogen source produced carbon vanadium nitride solid melt and a corresponding hard alloy, the content of N in the melt is easy to control, and the production process is simple and feasible, convenient to control and low in cost.
Owner:PANZHIHUA UNIV

Method for preparing high-silicon steel sheet through powder rolling

The invention discloses a method for preparing a high-silicon steel sheet through powder rolling, and belongs to the technical field of powder metallurgy. The method comprises the following steps thatelectrolytic iron powder and silicon powder coated with iron powder are adopted, the raw materials are simply mixed through a v-shaped mixer to form Fe-6.5wt.%Si. A green sheet is formed through a powder rolling method, is subjected to high-temperature sintering so as to be subjected to metallurgical bonding, and is subjected to multi-pass hot rolling to a certain thickness and then is subjectedto cold rolling for 2-4 times, and finally annealing is carried out at a high temperature to obtain the high-silicon steel sheet with excellent performance. By adopting the powder rolling method, theprocess flow for preparing the sheet can be effectively shortened, the formability of a powder system is greatly improved by adopting the silicon powder coated with the iron powder in raw materials, so that the process complexity and the subsequent debinding residual carbon problem caused by addition of a forming agent are avoided, and the method has the advantages of being simple to operate, highin production efficiency, high in product precision, free of pollution and included foreign materials, excellent in performance and the like.
Owner:UNIV OF SCI & TECH BEIJING

Over-temperature protection circuit, semiconductor device and fabrication method of semiconductor device

PendingCN108109999ATimely and accurate collectionGuaranteed to workTransistorSolid-state devicesControl signalEngineering
The invention provides an over-temperature protection circuit, a semiconductor device and a fabrication method of the semiconductor device. The over-temperature protection circuit comprises a currentsource, a temperature sampling tube, a comparator, a control signal generation unit and an MOS field-effect transistor, wherein the current source is used for providing a constant-current source, thetemperature sampling tube is used for detecting a temperature, the comparator is used for generating a temperature detection signal according to the detected temperature, the control signal generationunit is used for generating a temperature control signal according to the temperature detection signal, and the MOS field-effect transistor is used for achieving over-temperature protection by switch-off or switch-on according to the temperature control signal. The real-time temperature can be timely and accurately acquired by a temperature sampling device, so that the over-temperature protectioncircuit effectively works, an error during the heat transferring process is not needed to be considered, and the design of the over-temperature protection circuit is simplified; and meanwhile, the semiconductor device and a control module are integrated in a package tube shell by a joint sealing mode to form the over-temperature protection circuit, chips based on different processed are organically combined, and process complexity and high cost brought by a single chip for achieving the same function are prevented.
Owner:SHANGHAI NATLINEAR ELECTRONICS CO LTD

Core composite type silicon piezoresistive pressure sensor

ActiveCN110567632ASolve the problem of full-scale accuracy defectsRealize high-precision measurement requirementsFluid pressure measurement using ohmic-resistance variationForce measurement using piezo-resistive materialsPiezoresistive pressure sensorsPressure measurement
The invention provides a core composite type silicon piezoresistive pressure sensor in order to solve the problem of full-range precision defect in pressure measurement of an existing silicon piezoresistive pressure sensor. The pressure sensor comprises a plurality of silicon piezoresistive pressure sensor cores, a core composite shell and an information processing circuit board. Each silicon piezoresistive pressure sensor core comprises a silicon piezoresistive pressure sensor chip used for collecting the pressure of a to-be-measured piece. The ranges of the silicon piezoresistive pressure sensor cores are different, and the ranges of the silicon piezoresistive pressure sensor cores cover the full range of use. The core composite shell is used for packaging a plurality of silicon piezoresistive pressure sensor core assemblies and providing a unified test pressure medium for the silicon piezoresistive pressure sensor core assemblies. The information processing circuit board is arrangedon the core composite shell, and the information processing circuit board is used for controlling and realizing cooperative measurement and switching output of the silicon piezoresistive pressure sensor cores.
Owner:BEIJING AUTOMATION CONTROL EQUIP INST

No-alcohol preparation method of natural propolis

Disclosed is a method of preparing natural propolis without a non-alcoholic way; firstly, raw materials are selected; the raw propolis is crushed under low temperature; the crushed raw propolis is sieved for eliminating the impurities; a magnet suction device is used to remove the metallic iron substances in raw propolis powder and raw propolis particles until the metallic iron substances are removed completely; the raw propolis is rinsed by clean water; the rinsed raw propolis and water are placed into a stainless steel barrel with the ratio of 1:3; and then the stainless steel barrel is placed in a big pot to be heated. When the liquid temperature inside the stainless steel barrel reaches 95 DEG C, the raw propolis is melted in water and then the solution is stirred sufficiently until the particles are melted, so as to enable the raw propolis to be completely dissolved into water; then the stainless steel barrel is taken out from the big pot and cooled with the top cover closed; according to the steps of preparing raw propolis block, the raw propolis which is heated to dissolve in water is cooled, then the condensed propolis block is taken out and raw propolis block is taken out which is prepared into natural propolis after drying treatment. The method of preparing natural propolis without a non-alcoholic way has the advantages of retaining whole ingredients of propolis, improving yield and quality of propolis, reducing cost, non-pollution, being simple, convenient and practical.
Owner:陈宜斗
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