4results about How to "Monodisperse" patented technology

The application relates to the technical field of nanomaterials, and discloses monodisperse nanometer carbonate and a preparation method and application thereof. The method for preparing the monodisperse nanometer carbonate comprises the following steps: (1) performing acid-base neutralization reaction on a calcium source and / or a magnesium source and a surfactant in the presence of an organic solvent; wherein the calcium source is an alkaline calcium source, the magnesium source is an alkaline magnesium source, and the surfactant is an organic acid; (2) mixing water with the product obtained through the acid-base neutralization reaction in step (1); (3) performing first carbonization reaction on the mixture obtained through step (2) and a carbon source a; (4) performing second carbonization reaction on the product obtained through the first carbonization reaction and a carbon source b; wherein the carbon source a is different from the carbon source b. The monodisperse nanometer carbonate particles disclosed by the application are small in particle size, 1-5 nm in size, small in particle size, uniform in particle size distribution, monodisperse, and good in dispersity.

The invention discloses a medical high-purity nano cerium oxide-based suspension as well as a preparation method and application thereof. The mass concentration of the cerium oxide-based particles in the suspension is 1-200mg / L, the chemical general formula of the cerium oxide-based particles is CexM1-xO alpha D delta, M is a cation doped element, D is an anion doped element or group, x is more than 0 and less than or equal to 1.0, alpha is more than 1.0 and less than or equal to 2.0, delta is more than or equal to 0 and less than or equal to 0.2, and the cerium oxide-based particles Ce < 3 + > in the suspension account for 25-55% of the total Ce in percentage by mass; the average primary particle size of the cerium oxide-based particles is 3-50 nm, and the dispersity of the cerium oxide-based particles in the suspension is less than 0.7. The suspension prepared by the method is high in trivalent cerium content, high in oxygen vacancy content and high in biological activity and safety, and the preparation method is low in cost, stable in technical route, free of biological harmful additives and easy for large-scale industrial production.

The present application belongs to the field of gene drug delivery, and particularly relates to a kind of lipid compound with glutaric acid skeleton and lipid carrier, nucleic acid lipid nanoparticle composition and pharmaceutical preparation based thereon.The compound with the structure of formula (I) of the present application can be prepared into lipid carrier alone or together with other lipid compounds.The lipid carrier has high encapsulation efficiency for nucleic acid drugs, which helps to improve the delivery efficiency of nucleic acid drugs in vivo;Multiple biodegradable functional groups are contained, so that the lipid metabolism is fast, and the biological safety is high.Moreover, the lipid carrier can also deliver nucleic acid drugs to organs that need to be enriched, and has good application prospect.

This invention relates to the field of chemical mechanical polishing (CMP) pad technology, specifically to a highly hydrophilic and wear-resistant CMP polishing pad, its preparation method, and its application. The invention uses cyanosiloxane monomers as raw materials, preparing highly active carboxylate silsesquioxane powder through one-step alkaline hydrolysis, and achieving nanoscale uniform dispersion of this powder in polyurethane. After pre-treating the base fabric with an acid-base oscillating impregnation agent, the nanoscale uniformly dispersed slurry is coated onto the base fabric, and then solidified to obtain the target product. This invention solves the technical problems of difficulty in balancing hydrophilicity and wear resistance, and poor polishing uniformity in existing hydrophilic modification polishing pads. The polishing pad produced is used for wafer polishing, exhibiting less than 3% intra-wafer non-uniformity, fewer surface defects, and extended service life. The process of this invention is fully compatible with existing wet production lines for polyurethane polishing pads, requiring no additional equipment. The process is simplified, batch stability is strong, and industrial mass production is possible, adapting to the high-precision, low-defect polishing requirements of advanced semiconductor processes below 14nm.