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284results about How to "Unresponsive" patented technology

High-temperature-resistant nuclear-shell structure type flame retardant, and preparation method and application thereof

The invention discloses a high-temperature-resistant nuclear-shell structure type flame retardant, and a preparation method and an application thereof. The flame retardant takes polymethyl-phenyl siloxane modified epoxy resin as a capsule material and takes ammonium polyphosphate as a capsule core. The preparation method comprises the following steps of: mixing bisphenol A-type epoxy resin, polymethyl-phenyl siloxane and a catalyst, reacting for 3-5 hours at the temperature of 120-140 DEG C and obtaining the polymethyl-phenyl siloxane modified epoxy resin; then suspending ammonium polyphosphate powdery particles in a dispersing agent, adding the polymethyl-phenyl siloxane modified epoxy resin and a curing agent, stirring and reacting for 1-4 hours at the temperature of 60-100 DEG C, after the reaction is finished, stirring, reducing the temperature, suction filtering, drying and obtaining the high-temperature-resistant nuclear-shell structure type flame retardant. Compared with the traditional IFR (intumescent flame retardant) system, the flame retardant has better performances such as compatibility, flame retardance and water resistance; simultaneously the capsule material and the capsule core have the flame-retardant synergistic effect; and since the reaction area is increased, compared with the uncovered complex flame-retardant system, the microencapsulated expansion type flame retardant has higher flame-retardant efficiency.
Owner:GUANGZHOU CHEM CO LTD CHINESE ACADEMY OF SCI

Self-circulation micro-fluidic chip as well as preparation method and usage of micro-fluidic chip

The invention discloses a self-circulation micro-fluidic chip, as well as a preparation method and a usage of the self-circulation micro-fluidic chip. The micro-fluidic chip comprises a microfluid layer, an electroosmosis driving layer and a chip base layer from top to bottom, wherein the electroosmosis driving layer defines a microfluid flow channel and a wide/narrow electrode liquid metal flow channel with the microfluid layer and the chip base layer respectively; the microfluid flow channel and the wide/narrow electrode liquid metal flow channel are independent and are filled with a to-be-driven solution and a liquid metal respectively; the electroosmosis driving layer and the wide/narrow electrode liquid metal flow channel are interdigital; the lower surface of the electroosmosis driving layer is completely covered with the wide/narrow electrode liquid metal flow channel; the upper surface of the electroosmosis driving layer is exposed in the microfluid flow channel; and the two ends of the wide/narrow electrode liquid metal flow channel are communicated with a power supply via four metal electrodes. The micro-fluidic chip has the advantages of small size, high integration level, portability, good stability and the like, is low in preparation cost and wide in application scope, and a preparation technology of the micro-fluidic chip is also very simple and practicable.
Owner:SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV

Water-soluble high molecule intercalating agent containing thiourea group and preparation method

The invention discloses a water-solubility macromolecular chelant containing sulfourea group and a preparation method thereof. The chelant of the invention is prepared by the following method: (a) adjusting the pH value of formaldehyde with acid liquor to activate the formaldehyde; (b) adding the sulfourea, adjusting the pH value with alkali, and reacting at the temperature of 75-90 DEG C; (c) adjusting the pH value with the acid, adding the alcoholic solution of benzene sulfonyl chloride to react at 70-90 DEG C; (d) reducing temperature to 50-60 DEG C, adjusting the pH value with the alkali, and reducing the temperature to below 40 DEG C to prepare the chelant. The chelant of the invention has chelation sedimentation function to almost all of the transition stated heavy metals, which can not only be used in the treatment of the heavy metal sewage containing copper, zinc, nickel, mercury, cadmium, and the like, but also can be used in the stabilization treatment of the heavy metal in the solid wastes such as mud, waste incineration flying ashes, and the like. The preparation method of the invention has the advantages of no need of high temperature and high voltage, low one-time investment, easy availability of raw materials, and zero waste gas, waste liquid and waste residue in the production process.
Owner:TIANJIN YIMING ENVIRONMENTAL TECH CO LTD

Flexible water system zinc ion battery

The invention discloses a flexible water system zinc ion battery. The flexible water system zinc ion battery comprises a cathode layer, an anode layer, a current collection layer, a diaphragm and an aqueous electrolyte. The current collection layer comprises a breathable layer and a substrate layer, the substrate layer is provided with at least one opening holes. The perforated structure of the breathable layer and the substrate layer solves the problems of gas generation and electrolyte drying in the battery circulation process, so that the internal and external gaseous water of the battery reaches the states of circulation exchange and dynamic balance, and the circulation performance of the battery is greatly improved; and the assembled flexible water system zinc ion battery has the advantages of light weight, thin thickness, low cost, environmental friendliness, high safety, good rate capability, high power density and the like, and the excellent bending performance and flexibilityof the flexible water system zinc ion battery can meet the bending requirements of different angles, so that the flexible water system zinc ion battery is suitable for large-scale application and industrial production in the field of wearable electronic equipment.
Owner:SHENZHEN CITY THROUGH SCI & TECH OF NEW ENERGY CO LTD

Method for preparing inertia high-boiling silicone oil from organic silicone high-boiling residues

The invention discloses a method for preparing inertia high-boiling silicone oil from organic silicone high-boiling residues. With organic silicone high-boiling residues as the reaction raw material, the method includes the four steps of hydrolysis, hydrosilylation, neutralization, and devolatiligation and decoloration. The organic silicone high-boiling residues as the raw material are rectified high-boiling residues or decomposed high-boiling residues. The rectified high-boiling residues are high-boiling residues obtained by separating dimethyldichlorosilance out of the organic silicone high-boiling residues in advance through rectification. The decomposed high-boiling residues are high-boiling residues obtained by decomposing the organic silicone high-boiling residues in advance through a decomposing device and separating out monosilane. The decomposed high-boiling residues or rectified high-boiling residues which are difficult to process and use are used as the raw material, and the inertia high-boiling silicone oil which is controllable in viscosity, low in activity and high in stability is prepared through hydrolysis, addition and other reaction. The method is controllable in reaction process, simple in post-processing method, conventional in reaction device, high in production efficiency, stable in product quality and suitable for large-scale industrial production.
Owner:浙江中天东方氟硅材料股份有限公司

Chitosan oligosaccharide hydrophilic interaction chromatography stationary phase and preparation method thereof

The invention relates to a preparation method for a chitosan oligosaccharide hydrophilic interaction chromatography stationary phase. The click chemistry is adopted as a bonding reaction method for bonding chitosan oligosaccharide, firstly, terminal alkynyl is introduced on the surface of silica gel, secondly, the following solvents of water and methanol or the mixture of the solvents is taken as the reaction solvent, and then the chitosan oligosaccharide modified with azido group is bonded to the surface of the silica gel to obtain the chitosan oligosaccharide hydrophilic interaction chromatography stationary phase; the chitosan oligosaccharide is adopted as the polarity functional group with simple structure, and the chitosan oligosaccharide taken as the polarity stationary phase can realize the highly effective separation to the strongly polar compounds under the hydrophilic interaction liquid chromatogram mode; the chitosan oligosaccharide taken as the functional group has stable property, the surface structure does not change due to the change of pH, and the chitosan oligosaccharide is not liable to react with the solute molecule; and the click chemistry is adopted as the bonding reaction method, therefore, the purpose of immobilization with high selectivity and high transformation ratio can be achieved under the mild conditions.

Electrochemical oxidation device for removing chloride ions in water

The invention provides an electrochemical oxidation device for removing chlorine ions in water. The electrochemical oxidation device for removing chlorine ions in water comprises a DC(direct current)stabilized power supply, a constant current pump, a storage tank, an oxidation dechlorination tank, a gas collection tank, a drainage storage tank and a rotor flow meter; the oxidation dechlorinationtank is provided with an electrode array which comprises an oxide anode with titanium plates as a substrate and a titanium mesh cathode and is connected to a power source; through the electrode arraycomprising the oxide anode with titanium plates as the substrate and the titanium mesh cathode, the high potential and the catalytic activity of the anode are utilized to directly oxidize the chlorideions in the water; the chloride ions in the water are first oxidized on the surface of the anode to form adsorbed chlorine atoms, and then the two adsorbed chlorine atoms are chemically combined to form one chlorine gas molecule which is separated from the surface of the electrode; and electrons are mainly used as reagents, and no other agents are needed to add. By adopting the electrochemical oxidation device, no other agents are needed to add; and the electrochemical oxidation device is flexible in operation, environmentally friendly, and easy to maintain, and can be continuously operated.
Owner:WUHAN UNIV

Forming method of semiconductor structure

A forming method of a semiconductor structure includes the steps: providing a substrate with fins on the surface, wherein the surface of the substrate and the surface of part of sidewalls of the fins are equipped with dielectric layers, and the surfaces of the dielectric layers are lower than the top surfaces of the fins; forming first protective layers on the surfaces of the dielectric layers, the surfaces of the sidewalls of the fins and the surfaces of the bottoms of the fins through a deposition technology, the density of the first protective layers being higher than the density of silicon oxide; forming second protective layers on the surfaces of the first protective layers through an oxidation technology; forming mask layers on the surfaces of the second protective layers, wherein the mask layers enable part of the second protective layers on the surfaces of the fins to be exposed, and the second protective layers are used for isolating the first protective layers from the mask layers; doping ions inside the fin through an ion implantation technology with the mask layers being masks; and removing the mask layers, the second protective layers and the first protective layers after the ion implantation, and exposing the surfaces of the dielectric layers, and part of the sidewalls and the bottom surfaces of the fins. A semiconductor structure formed through the method has a good shape, and has an accurate and uniform critical dimension.
Owner:SEMICON MFG INT (SHANGHAI) CORP

Electrochemical high-grade oxidation apparatus

The invention relates to an electrochemical high-grade oxidation apparatus, which belongs to the field of sewage processing. The high-grade oxidation apparatus comprises a front security filter, an adjusting water storage tank, DC stabilized power supply, a high-grade oxidation pool, an electrode, a waste water internal circulation system, and an air floatation defoaming zone. the electrode is positioned in the high-grade oxidation pool, the upper end of the high-grade oxidation pool is the air floatation defoaming zone; an anode of the electrode is the microporous tubular-type active electrochemical membrane anode; an anode matrix is the microporous titanium black ceramic tube, the active electrocatalysis layers are arranged on the surface of the matrix and in the micropore, the active electrocatalysis layer is a mixing layer of IrO2, Ti4O7 and SnO2; one end of the electrode anode ceramic tube is taken as a water inlet, and the other end is enclosed; and the waste water internal circulation system is taken as the water inlet of the electrode anode and is communicated with an internal circulation water outlet of the oxidation pool at the side surface of the high-grade oxidation pool corresponding to an anode enclosed end through a pipeline and an internal circulation booster pump. The electrochemical high-grade oxidation apparatus has the characteristics of little electrode amount, strong mass transfer capability, high degradation efficiency and low processing cost.
Owner:深圳市大净环保科技有限公司 +1

Phase-change material packaging process and phase change heat storage product

The invention discloses a phase-change material packaging process and a phase change heat storage product prepared by using the process. The phase change heat storage product comprises a spherical silica gel shell and a sphere prepared from a phase-change material, wherein the sphere is arranged in the spherical silica gel shell. The packaging process is simple, can realize packaging of phase-change materials with phase-change temperatures in a range of 100 to 200 DEG C and has the advantages of a good packaging effect, low cost and easy realization. The product provided by the invention is ingeniously designed, fully utilizes the characteristics of high temperature resistance, aging resistance, no toxicity, uneasy reaction with acid and alkaline substances and the like of silica gel and enables a packaged phase-change material to be used for a long time during heat storage; moreover, heat conduction powder is added, so good heat conductivity is obtained, the phase-change material is allowed to realize effective heat exchange with the outside, the utilization rate of energy is increased, and energy conservation and environmental protection are benefited. Since the product employs spherical structure design, the product can be more easily put into a variety of heat storage tanks or heat exchange apparatuses, which is beneficial for wide popularization and application of the product.
Owner:张曹

Evaporation plating device and evaporation plating method

The invention discloses an evaporation plating device and an evaporation plating method. The evaporation plating device comprises a film plating chamber, a crucible which is arranged at the bottom ofthe film plating chamber and used for containing and heating film plating materials and a fixture which is arranged on the top of the film plating chamber, is opposite to the crucible and is used forclamping a to-be-plated product; and the bottom of the film plating chamber is provided with at least one first air inlet hole, inert gas is introduced into the film plating chamber through the firstair inlet holes, and the film plating chamber is provided with at least one exhaust hole. The film plating materials are heated to be sublimated and gasified, diffused out from the crucible and then driven by the inert gas to quickly move towards the to-be-plated product, the film plating speed is higher, and the production efficiency is high. In the evaporation plating material gasifying and moving process, the evaporation plating materials can be mixed uniformly through the inert gas, therefore, the density of all areas of the evaporation plating materials is more consistent before the evaporation plating materials are plated on the to-be-plated product, the film plating uniformity is good, the film forming quality is better, and the precision is higher.
Owner:HKC CORP LTD +1

System and method for reducing ash content of pyrolysis carbon black of waste tires and recovering Zn

ActiveCN110760204AEfficient recyclingImprove the performance of pyrolysis carbon blackPigmenting treatmentProcess engineeringResidual oil
The invention relates to a system and a method for reducing the ash content of pyrolysis carbon black of waste tires and recovering Zn. The system comprises a distillation chamber, a first condensation tower and a second condensation tower which are sequentially connected, wherein the first condensation tower is also connected with a zinc collecting tank; the second condensation tower is also connected with an oil collecting tank and a tail gas treatment device; and the distillation chamber is connected with a vacuum pump. According to the method disclosed by the invention, the pyrolysis carbon black is reprocessed by using a vacuum distillation chamber, carbon black and zinc oxide in the pyrolysis carbon black are subjected to a carbothermic reduction reaction under a high-temperature vacuum environment to generate zinc and vaporize at a high temperature, condensation recovery is realized, and residual oil in the carbon black is removed by high-temperature vaporization at the same time; according to the method disclosed by the invention, the ash content of the pyrolysis carbon black can be reduced, the performance of the pyrolysis carbon black is greatly improved, meanwhile, the purposes of recovering zinc and removing excess oil are achieved, the treated carbon black achieves the purposes of deodorization and oil removal, the ash content of the treated carbon black can be obviously reduced, and the recovery rate of crude zinc and oil is high.
Owner:珠海格力绿色再生资源有限公司

Silyl ether mixed defoaming agent emulsion and preparation method thereof

The invention discloses silyl ether mixed defoaming agent emulsion and a preparation method thereof. The silyl ether mixed defoaming agent emulsion is prepared from the following components: linear simethicone, allyl ether modified polysiloxane, polyoxypropylene glyceryl ether, modified white carbon black, triethanolamine and a compound emulsifier. The preparation method comprises the following steps: uniformly mixing the linear simethicone and the modified white carbon black, and heating to obtain a mixture I; adding triethanolamine into the mixture I, stirring and cooling to obtain a mixture II; adding the allyl ether modified polysiloxane and the polyoxypropylene glyceryl ether, and further stirring to obtain a mixture III; adding the compound emulsifier into the mixture III, and stirring at high speed to obtain coarse emulsion; adding thickening water into the coarse emulsion, and preparing raw emulsion; and pouring the raw emulsion into a high-speed homogenizer for stirring to obtain the fine-smooth and stable emulsion. The defoaming agent easily dissolves in water, and is small in specific surface area, high in defoaming speed, lasting in foam inhibition and small in use amount; the preparation method is convenient and easy to operate; the defoaming agent has no toxic effects on microorganisms, has an effect of promoting the growth of mycelia, is beneficial to microbial fermentation and is relatively environmentally friendly.
Owner:杭州彤诚新材料技术有限公司

Method for preparing nitrogen-doped P-type zinc oxide film in one step by using nitrogen as doping source

InactiveCN102212792AReduced control of relevant temperature parametersThe principle is simpleVacuum evaporation coatingSputtering coatingNitrogen gasOxide
The invention relates to a method for preparing a nitrogen-doped P-type zinc oxide film in one step by using nitrogen as a direct doping source, namely a magnetron sputtering method. In the magnetron sputtering process, metallic zinc is used as a target, argon is used as a sputtering gas, and oxygen and nitrogen are used as reaction gases; when the vacuum degree of a magnetron sputtering chamber reaches 10<-4>Pa, argon, oxygen and nitrogen in a certain ratio are introduced; and in the magnetron sputtering plating process, magnetron sputtering plating is performed under the condition that working air pressure, sputtering powder, substrate bias and plating time are kept at certain values, subsequent thermal treatment is not needed, and the nitrogen-doped P-type zinc oxide film is obtained by a direct one-step method. By the method, the nitrogen source doping problem of the zinc oxide film prepared in the prior art and complexity in thermal treatment needed after plating are solved, and control of related parameters of the thermal treatment is reduced. The method is simple; and because the nitrogen is used as the direct doping source, the reliabilities of the gases and the working parameters are strong, the quality of the film is good, and the resistivity can be well controlled in a certain range. Moreover, the P-type zinc oxide film is prepared by the one-step method.
Owner:(CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD +1
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