The invention relates to the technical field of
refraction film preparation, and mainly relates to a carbon-
germanium co-
sputtering refraction film and a preparation method thereof. The preparation method of the carbon-
germanium co-sputtered
refraction film comprises the following steps: configuring a substrate for pretreatment; placing the substrate in a multi-target magnetron
sputtering device, vacuumizing, introducing
argon, and activating the substrate by
plasma; placing a
graphite target and a
germanium target, keeping introducing
argon, newly introducing
methane and
hydrogen, carrying out
ion beam reaction to co-sputter the
graphite target and the germanium target, and stopping
sputtering after a refraction film is deposited. Carbon-germanium double-target co-sputtering is matched with introduction of
methane and
hydrogen, the release stability of carbon-germanium atoms is guaranteed through a
solid-state target material,
activated carbon groups are supplemented through
methane, methane dissociation is promoted through
hydrogen, the carbon-germanium
atomic ratio of a film layer can be preliminarily regulated and controlled,
refractive index control of deposition film forming can be adjusted, and meanwhile through co-sputtering and reaction gas of methane, the film forming efficiency is improved. The composition uniformity of the film layer is ensured, and the compact degree and the refraction performance of the film layer are improved.