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249results about How to "Fast oxidation" patented technology

Method for fabricating different gate oxide thicknesses within the same chip

A semiconductor structure having silicon dioxide layers of different thicknesses is fabricated by forming a sacrificial silicon dioxide layer on the surface of a substrate; implanting nitrogen ions through the sacrificial silicon dioxide layer into first areas of the semiconductor substrate; implanting chlorine and/or bromine ions through the sacrificial silicon dioxide layer into second areas of the semiconductor substrate where silicon dioxide having the highest thickness is to be formed; removing the sacrificial silicon dioxide layer; and then growing a layer of silicon dioxide on the surface of the semiconductor substrate. The growth rate of the silicon dioxide will be faster in the areas containing the chlorine and/or bromine ions and therefore the silicon dioxide layer will be thicker in those regions as compared to the silicon dioxide layer in the regions not containing the chlorine and/or bromine ions. The growth rate of the silicon dioxide will be slower in the areas containing the nitrogen ions and therefore the silicon dioxide layer will be thinner in those regions as compared to the silicon dioxide layer in the regions not containing the nitrogen ions. Also provided are structures obtained by the above process.
Owner:GLOBALFOUNDRIES INC

Hollow structure material as well as preparation method and use thereof

The invention discloses a hollow structure material. The hollow structure material comprises silicon particles and an amorphous carbon shell, wherein the silicon particles are arranged in the amorphous carbon shell. The hollow structure material has the advantages that a hollow part between a silicon kernel and the carbon shell can be used for volume expansion of silicon; direct contact between the silicon and an electrolyte solution is blocked by a carbon shell membrane of a surface layer, so that a steady solid-state electrolyte solution interface can be formed on the surface of the carbon shell; and amorphous carbon is high in electronic conductivity and high in ionic conductivity, so that lithium ions and electrons can be freely transported through the amorphous carbon. A carbon-coated hollow material is applied to an existing slurry coating method electrode preparation technology and lays a foundation for industrial application. The invention also discloses a preparation method of the hollow structure material. The preparation method does not relate to dangerous gas such as silicane or similar expensive instruments for chemical vapor deposition. The large-scale production manufacturing of the hollow structure material is easily realized. A production condition control requirement is not strict, so that the hollow structure material is high in repeatability.
Owner:NANJING AMPRIUS

Method for displaying original austenite grain boundaries of maraging stainless steel

The invention provides a method for displaying original austenite grain boundaries of maraging stainless steel. The displaying of the original austenite grain boundaries is completed by three steps, namely, preparing a sample, carrying out passivation treatment with concentrated nitric acid and carrying out electrolytic etching with concentrated nitric acid. The method comprises the following steps: firstly preparing the sample, grinding and polishing one surface of the sample and grinding the other surfaces of the sample; placing the polished sample in 55-65% (volume fraction) aqueous nitric acid solution and carrying out passivation treatment for 3-5 minutes; carrying out electrolytic etching on the sample at room temperature for 3-5 minutes by adopting stainless steel sheet as a cathode and the passivated sample as an anode at the electrolytic voltage of 5-8V; after the electrolysis, completely rinsing the sample with tap water, rinsing the sample with alcohol and carrying out blow-drying and then observing the clear and complete microstructure-interference-free original austenite grain boundaries under the microscope. The method has the advantages that after the passivation treatment, the grain boundaries are preferentially displayed as compared with microstructures; no residual etching products are caused; the voltage is relatively low and the etching end point is easy to control.
Owner:INST OF METAL RESEARCH - CHINESE ACAD OF SCI

Method for removing subaqueous organic matter with catalysis ozone oxidization

The invention relates to a method of catalytic ozone oxidation organic matter removal in water, which belongs to the water treatment technical field. The method solves the problems that: in the existing method of catalytic ozone oxidation organic matter removal in water, the utilization ratio of ozone is low, the organic pollutant is not enough oxidized, the cost is higher, and catalyzer is easily lost by adopting the metal catalytic ozone oxidation technology, the application is difficult to use in mass production, uneven surface exists on the solid catalyzer, and the inner diffusion velocity is lower. The method has the steps that: firstly, water containing the organic pollutant enters into an ozone contact tower; secondly, output water of the ozone contact tower enters into a catalyzing bed the inner part of which is filled with zerovalent ferric and filling material. The method solves the problems that uneven surface exists on the solid catalyzer and the inner diffusion velocity is lower, has the advantages of high catalytic activity, low cost, homogeneous catalysis oxidation and heterocatalysis oxidation of the catalyzer easily separating from water, improves the utilization ration of the ozone, and can be applied to the mass production.
Owner:HARBIN INST OF TECH

Preparation method of catalyst used for carrying out catalytic combustion on volatile organic compound containing low-concentration methane

The invention discloses a preparation method of a catalyst used for carrying out catalytic combustion on a volatile organic compound containing low-concentration methane. The catalyst consists of an active carrier, noble metal and assistant metallic oxide, wherein the noble metal and the assistant metallic oxide are loaded on the active carrier; the quality of the noble metal is 0.05 percent to 0.8 percent of active elements by element quality in final catalyst; the quality of the assistant metallic oxide is 0.0 percent to 20 percent of the quality of the final catalyst; the catalyst is prepared in a way that active ingredients are used as a carrier, and after the active ingredients are processed by aqueous alkali, the active ingredients dip in a solution which loads compound containing the active elements of the noble metal and the assistant metallic oxide, and the obtained product is dried in the shade, dried and roasted. The catalyst is used for the organic volatilization hydrocarbon catalytic combustion which contains low-concentration methane, and the catalytic combustion transformation effect of the methane is excellent while almost complete non-methane hydrocarbon transformation can be obtained.
Owner:JIANGSU EVERGREEN NEW MATERIAL TECH

Ozone pre-oxidation and laccase advanced water treatment method

The invention relates to an ozone pre-oxidation and laccase advanced water treatment method, which comprises the following steps of: mixing waste water, ozone and sodium percarbonate in a mixer; adding the mixture in an ozone reactor device for stirred reaction; making the mixture enter a tertiary sedimentation basin for solid-liquid separation; adding the separated supernate and laccase into a laccase reaction tank, and fully mixing the laccase with the waste water for reaction; mixing the diluted mediator and the effluent from the laccase reaction tank, and performing flocculent settling solid-liquid separation on the mixture in a final sedimentation basin; and performing anaerobic and aerobic biochemical treatment on the effluent. The method overcomes the defects of over-high cost, low efficiency of enzyme treatment, high enzyme consumption, difficult sedimentation and separation of enzyme per se, and the like. The method only makes two processing units of ozone pre-oxidation and laccase-mediator catalytic polymerization achieve good mutual acceleration and gradient treatment effects, accelerates decomposition of O3 to make micro-flocculation effect of the ozone pre-oxidation in the optimized pH value range, is favorable for reducing the coagulant consumption, can recycle the waste water, and has scale application.
Owner:NANJING SHENKELONG ENVIRONMENTAL PROTECTION

Low-consumption and low-emission nitric acid production method and production equipment thereof

The invention discloses a low-consumption and low-emission nitric acid production method and production equipment thereof. The method and the equipment adopts the same low-pressure level for oxidation and absorption, the double-pressurization high-pressure level is omitted, a molecular sieve absorption device is adopted for tail gas treatment of a nitric acid absorption tower, in addition, secondary air is used for taking reaction with nitric oxide absorbed in the molecular sieve absorption device to form regenerated gas, the regenerated gas is sent into the nitric acid absorption tower to be recovered and reutilized, the nitrogen oxide content in the tail gas is lower than 100mg / Nm<3>, in addition, the yield of the nitric acid can also be improved through the recovery and the utilization of regeneration gas, a layer of silk screen is arranged on a sieve plate tower disc of an oxidation section of the nitric acid absorption tower, the oxidation speed at high pressure and low pressure can be effectively accelerated, and an N20 decomposition catalyst layer is also additionally arranged in an oxidation reaction vessel, so the N20 content in the nitric oxide gas in the oxidation reaction vessel can be reduced to about 100PPM. The nitric acid production method does not need to adopt two pressure levels, no nitric oxide compressor is adopted, no tail gas ammonification re-treatment device is adopted, the investment is greatly saved, and the consumption is reduced.
Owner:CHINA CHENGDA ENG

Method for fabricating different gate oxide thickness within the same chip

A semiconductor structure having silicon dioxide layers of different thicknesses is fabricated by forming a sacrificial silicon dioxide layer on the surface of a substrate; implanting nitrogen ions through the sacrificial silicon dioxide layer into first areas of the semiconductor substrate; implanting chlorine and / or bromine ions through the sacrificial silicon dioxide layer into second areas of the semiconductor substrate where silicon dioxide having the highest thickness is to be formed; removing the sacrificial silicon dioxide layer; and then growing a layer of silicon dioxide on the surface of the semiconductor substrate. The growth rate of the silicon dioxide will be faster in the areas containing the chlorine and / or bromine ions and therefore the silicon dioxide layer will be thicker in those regions as compared to the silicon dioxide layer in the regions not containing the chlorine and / or bromine ions. The growth rate of the silicon dioxide will be slower in the areas containing the nitrogen ions and therefore the silicon dioxide layer will be thinner in those regions as compared to the silicon dioxide layer in the regions not containing the nitrogen ions. Also provided are structures obtained by the above process.
Owner:GLOBALFOUNDRIES INC
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