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13results about How to "Fast oxidation" patented technology

Wet catalytic oxidation treatment process for high-concentration organic wastewater

The invention belongs to the technical field of environment-friendly treatment of high-concentration organic wastewater, and particularly relates to a wet catalytic oxidation treatment process for high-concentration organic wastewater. Wastewater in the wet catalytic oxidation treatment process for the high-concentration organic wastewater is formed by combining a plurality of streams of wastewater. In order to ensure the safety of the wet oxidation process, the combined wastewater is firstly subjected to steam stripping pretreatment to remove light component organic matters therein, then is pressurized and heated, enters a wet oxidation reaction section to remove most of COD therein, is cooled and depressurized after the reaction is finished, and is fed into the existing multi-effect evaporation section; the multi-effect evaporation concentrated solution is returned to the wet oxidation section to continuously remove organic matters, and condensate water enters a subsequent biochemical treatment section. The wet catalytic oxidation treatment process for the high-concentration organic wastewater is wide in application range, high in treatment efficiency, high in oxidation speed and low in secondary pollution.
Owner:GANSU JINCHUANG LVFENG ENVIRONMENTAL TECH CO LTD

Silicon wafer processing method, silicon wafer with textured surface formed on single side surface and solar cell

The invention relates to the technical field of silicon wafer treatment processes, in particular to a silicon wafer treatment method, a silicon wafer with a textured surface formed on a single side surface and a solar cell. The silicon wafer processing method comprises the following steps: placing a silicon wafer in an ozone gas environment; performing ultraviolet irradiation on the single-side surface of the silicon wafer to form a silicon dioxide oxide layer; and performing texturing cleaning on the silicon wafer on which the silicon dioxide oxide layer is formed so as to form a textured surface on the surface of one side, back to the silicon dioxide oxide layer, of the silicon wafer. According to the silicon wafer processing method, a thick silicon dioxide oxide layer can be formed in a short time, defects in the silicon dioxide oxide layer can be effectively reduced, the quality of the silicon dioxide oxide layer is improved, the alkali resistance of silicon dioxide serving as a protective layer is effectively enhanced, and the quality of a textured surface obtained in the texturing step is improved.
Owner:ANHUI HUASUN ENERGY CO LTD

Agricultural machinery full-automatic fertilization device and method

The invention discloses a full-automatic fertilization device and method for agricultural machinery, and relates to the technical field of automatic fertilization. A motor is arranged at the top of the U-shaped fixing plate; a mixing barrel is arranged at the top of the base and is positioned below the U-shaped fixing plate; a water injection pipe is arranged on the right side of the top of the mixing barrel; a material injection pipe is arranged on the left side of the top of the mixing barrel; the top of the stirring rod penetrates and is fixedly installed at the bottom of the motor output end. The spraying assembly is driven by the electric sliding rail to move up and down in a reciprocating mode to conduct uniform fertilization and spraying on vegetation at different heights, the situation that fertilizer content received by the vegetation at different heights is difficult to balance is prevented, and meanwhile the situation that sufficient nutrients are difficult to provide for the vegetation due to too high evaporation speed of fertilizer mixed liquid in a summer high-temperature environment is avoided; and the survival rate of vegetation is ensured.
Owner:GONGZHULING JIATAI AGRI MASCH CO LTD

Charging pile with fire extinguishing device for new energy vehicle

The invention discloses a new energy automobile charging pile with a fire extinguishing device, and relates to the technical field of charging piles. The device comprises a base, the top of the base is provided with a charging main body, the left and right sides of the charging main body are provided with ventilation openings, the outer wall of the base is provided with a protective shell, and the top of the protective shell is designed to be a slope; the bottom of the inner wall of the charging main body is provided with a power supply main body; an anti-damage device is arranged on the upper portion in the charging body, an anti-softening device is arranged on the back of the anti-damage device, and an anti-erosion device is arranged at the bottom of the anti-softening device. The detection range of the detection assembly is effectively expanded, so that the accuracy of the detection result is improved, fire hazards in the charging main body are eliminated through carbon dioxide gas, economic losses caused by fire damage of the charging main body due to overload short circuit at high temperature are avoided, and the fire protection function of the charging main body is improved.
Owner:ZHONGKE AUTO PARTS (SUZHOU CO LTD

Novel flange for automobile engine

ActiveCN222597064Ufast oxidationavoid skewLap jointAutomotive engine
The utility model discloses a novel flange for an automobile engine, which relates to the technical field of flanges and comprises a first automobile engine pipeline, one end of the first automobile engine pipeline is fixedly connected with a first flange, and a connecting assembly is inserted into the first flange. The side, away from the first automobile engine pipeline, of the first flange is in lap joint with a flange gasket, the side, away from the first flange, of the flange gasket is in lap joint with a second flange, and the side, away from the flange gasket, of the second flange is fixedly connected with a second automobile engine pipeline; and one side of the flange sheet is fixedly connected with one end of a first automobile engine pipeline. Through the arrangement of the positioning grooves in the surface of the flange, the position of the positioning column inserted into the flange gasket can be accurately positioned, so that the position of the flange gasket is positioned, the position deflection of the flange gasket is avoided, and the flange gasket is more convenient to use.
Owner:JIANGSU FUHAO ELECTRIC CO LTD

Method for refining cobalt nickel hydroxide and separating nickel and cobalt

The invention discloses a method for refining cobalt nickel hydroxide and separating nickel and cobalt, and belongs to the technical field of metal production or refining. The method comprises the following steps: adding water into cobalt nickel hydroxide for wetting, introducing oxygen or ozone for oxidizing and slurrying, and performing ultrasonic enhancement to obtain cobalt nickel hydroxide slurrying liquid; adding dilute sulphuric acid for selective leaching; carrying out vanadium precipitation and iron removal on the leach liquor subjected to selective leaching; a phosphoric acid extraction agent, an alkyl hydroxime extraction agent and an organic diluent are compounded to form a synergistic extraction system, saponification is carried out, and the saponified synergistic extraction system is used for carrying out nickel and cobalt dynamic extraction separation on the leaching solution obtained after vanadium precipitation and iron removal. According to the method, the cobalt extraction speed of a synergistic extraction agent system is higher than that of nickel, cobalt is extracted preferentially, then nickel extraction is conducted on cobalt extraction raffinate, nickel and cobalt are directly extracted into an organic phase, and nickel and cobalt products are obtained through separation and purification. Efficient extraction of nickel and cobalt and effective separation of nickel and cobalt from iron, scandium, manganese and the like can be achieved, and the extraction pH is reduced.
Owner:CHINA ENFI ENG CORP +1

Oxidation treatment method and solar cell

The present application relates to the field of photovoltaic technology, and in particular to an oxidation treatment method and a solar cell, wherein the oxidation treatment method comprises the following steps: placing a silicon wafer to be oxidized in an oxidation furnace, wherein the silicon wafer to be oxidized comprises a base layer and an emitter region disposed on the surface of the base layer; performing a primary oxidation treatment on the surface of the emitter region using oxygen that has passed through a pure water bath during the heating stage of the oxidation furnace; performing a secondary oxidation treatment on the surface of the emitter region using oxygen that has passed through a pure water bath during the constant temperature stage of the oxidation furnace; performing a tertiary oxidation treatment on the surface of the emitter region using dry oxygen during the cooling stage of the oxidation furnace, and an oxide layer is formed on the surface of the emitter region. The oxidation treatment method provided by the present application reduces the cleaning times of the oxidation furnace and the diaphragm pump while ensuring the life of the silicon wafer, thereby improving the oxidation efficiency.
Owner:SHANGRAO JINKO SOLAR NO 3 INTELLIGENT MANUFACTURING CO LTD +1

Etching device and method applied to semiconductor chip production

The invention discloses an etching device and method applied to semiconductor chip production, and relates to the related technical field of chip production. The etching device comprises a base, an etching box is arranged at the top of the base, a photoresist assembly is arranged on the left side of the etching box, a plurality of obliquely-distributed injection holes are formed in the right side of the photoresist assembly, a plurality of limiting rods are symmetrically arranged on the outer wall of the etching box, sealing plates are arranged on the outer walls of the limiting rods, and telescopic rods are arranged at the corners of the bottom of the inner wall of the etching box. According to the invention, after the photoresist and the etching liquid are mixed, the photoetching resolution in the chip etching process is improved, so that the etching definition of the semiconductor chip is improved, the etching quality is improved, meanwhile, in the continuous movement process of the U-shaped pipe assembly, the upper and lower pressure difference of the etching liquid on the right side in the etching box is effectively changed, the time required for comprehensive etching of the chip is shortened, and the etching efficiency is improved. And the etching efficiency is improved.
Owner:WUXI XINGHUA HENGHUI TECH CO LTD

Catalyst for oxygen-reduced air flooding oil recovery and preparation method and application thereof

The application discloses a kind of catalysts for oxygen-reduced air drive oil recovery and its preparation method and application, it belongs to oil recovery technical field, comprising the following steps: S1, molybdenum disulfide is dispersed in deionized water, and molybdenum disulfide dispersion is obtained;S2, soluble transition metal salt solution is mixed with molybdenum disulfide dispersion, and two-component catalyst is obtained;S3, two-component catalyst is post-treated, and the catalyst for oxygen-reduced air drive oil recovery is obtained.The oxygen-reduced air drive oil recovery catalyst prepared by the application has good low-temperature reaction performance, fast oxidation speed, can speed up the process of low-temperature oxidation stage, and can also reduce the risk of oxygen penetration into the reservoir, which is beneficial to reduce the construction risk.Compared with traditional catalysts, the asphaltene content of the catalyst after oxidation is lower, which can not only improve the quality of oil products, but also improve the flow performance and oil recovery efficiency of oil products.
Owner:PETROCHINA CO LTD

Oxidation treatment device and method suitable for preparation of SiC powder particles for stirring casting

The invention discloses an oxidation treatment device and method suitable for preparation of SiC powder particles for stirring casting, a stirring barrel is rotatably connected to a rack and is driven by a motor to rotate, a heat conduction barrel is coaxially fixed in the stirring barrel, a resistance heater extends into the heat conduction barrel along the axis direction of the heat conduction barrel, an air outlet hole is formed in the resistance heater, and the heat conduction barrel is coaxially fixed in the heat conduction barrel. And wet oxygen supplied by the wet oxygen supply system enters the stirring barrel through the air outlet hole. The low-cost characteristic of the oxidation treatment technology is combined, and low-cost production of the oxidized SiC powder particles can be achieved.
Owner:JIANGSU UNIV OF TECH +1

Treatment system and process for treating high-concentration toxic wastewater by ultraviolet-Fenton method

The invention relates to a treatment system for treating high-concentration toxic wastewater by an ultraviolet-Fenton method, which comprises a wastewater treatment system, the wastewater treatment system comprises an acidification treatment tank, an oxidation treatment tank, a neutralization treatment tank, a sulfuric acid tank, a ferrous sulfate tank, a hydrogen peroxide tank, an alkaline water tank, a flocculant tank, a liquid inlet, a liquid outlet and a dosing port; the oxidation treatment tank is fixedly arranged on one side of the acidification treatment tank, the neutralization treatment tank is fixedly arranged on the other side of the acidification treatment tank, the sulfuric acid tank is fixedly arranged on one side of the acidification treatment tank, and the ferrous sulfate tank and the hydrogen peroxide tank are fixedly arranged on one side of the oxidation treatment tank. The alkaline water tank and the flocculating agent tank are fixedly arranged on one side of the neutralization treatment tank. The device can effectively reduce stirring dead angles, obtain large-area water body exchange, improve stirring uniformity, shorten reaction time, improve reaction sufficiency, reduce the dosage of chemicals and reduce the wastewater treatment cost.
Owner:JIANGSU SANQIANG ENVIRONMENTAL ENG CO LTD

Stirring mechanism matched with crystal pulling process production

The invention belongs to the technical field of crystal pulling process equipment, particularly relates to a stirring mechanism matched with crystal pulling process production, and aims to solve the problems that in the crystal pulling production process, filtering equipment needs to sufficiently and slowly oxidize volatile substances to prevent the volatile substances from being burnt and exploded when making contact with outside air, but the volatile substances filtered out in an ash bin are slowly oxidized, and the production efficiency is low. According to the technical scheme, the air cylinder fixing device comprises an air cylinder fixing barrel, an air cylinder is fixedly installed in the air cylinder fixing barrel through a plurality of screws, a cylinder rod connector is fixedly arranged at the end of an air cylinder rod, and a rotating arm is arranged below the air cylinder. According to the invention, inflammables in the ash bin can be fully oxidized, the danger of deflagration is prevented, the oxidation speed is accelerated, the preparation time of the process is shortened, and the production safety and efficiency are improved; the double-rocker mechanism is matched with the upper ratchet mechanism and the lower ratchet mechanism, one ratchet mechanism is responsible for unidirectional rotation, and the other ratchet mechanism is responsible for preventing the cantilever from being brought back when the air cylinder retracts, so that unnecessary reverse rotation is avoided, and the stirring stability and controllability are improved.
Owner:刘峰岳

Flash memory structure and forming method thereof

The invention discloses a flash memory structure and a forming method thereof. The structure comprises a substrate; the two storage gate structures are located on the substrate and are separated from each other, an opening is formed between the two storage structures, each storage gate structure comprises a floating gate, a control gate dielectric layer located on the floating gate and a control gate located on the control gate dielectric layer, each floating gate is provided with a first side wall exposed by the opening, and each control gate is provided with a second side wall exposed by the opening. The first side wall is of a corrugated structure, the corrugated structure comprises a plurality of protruding parts, the protruding parts are arranged in the direction perpendicular to the surface of the substrate, and the bottom size of each protruding part is larger than the top size of each protruding part; the erasing gate structure is positioned in the opening; the word line structures are located on the two sides of the storage gate structure and the erasing gate structure respectively, and the erasing efficiency of the formed flash memory structure is improved.
Owner:SEMICON MFG INT (BEIJING) CORP +1