45results about How to "Guaranteed to completely remove" patented technology

The invention relates to a mask for laser direct writing and an etching method of the mask. The mask comprises a polishing substrate, an organic thin film, an oxide thin film and a metal thin film, wherein the organic thin film is attached onto the surface of the polishing substrate, the oxide thin film is deposited on the surface of the organic thin film, the metal thin film is deposited on the surface of the oxide thin film. The metal film in the mask for laser direct writing has high heat conduction performance, heat generated by laser abalation can be timely conducted and dissipated, and the influence of laser abalation on a film layer is reduced; the oxide thin film is relatively high in laser abalation capability, and the line accuracy of laser direct writing can be ensured; and an organic film layer can react with a solvent, so that the mask can be enabled to be completely removed.

The invention discloses domestic health-care washing-up liquid and relates to the technical field of chemical cleaning agents. The domestic health-care washing-up liquid is prepared from the following raw materials in parts by weight: 10 to 11 parts of linear alkyl benzene sulfonic acid, 11 to 13 parts of alkylolamides, 0.07 to 0.09 part of preservative, 1.2 to 1.4 parts of sodium hydroxide, 6 to 10 parts of fatty alcohol-polyoxyethylene ether, 0.05 to 0.15 part of ethylene diamine tetraacetic acid, 0.5 to 1.5 parts of a thickening agent, 50 to 60 parts of deionized water and 20 to 30 parts of a health-care traditional Chinese medicine preparation. The domestic health-care washing-up liquid has the beneficial effects that the process flow is concise; the raw materials are proportioned reasonably; the washing-up liquid is prepared from innocuous and unpoisonous chemical products and traditional Chinese medicines, so the prepared washing-up liquid is gentle to hands and has fresh taste and innocuous and unpoisonous effect; and during daily use, the washing-up liquid can remove blots normally and has health-care effect, so the washing-up liquid achieves two things at one stroke, has high market value and is convenient to popularize and use.

The invention discloses a soil remediation sampler for stratified sampling of soil. The invention relates to the technical field of soil remediation. The soil remediation sampler for stratified sampling of soil comprises a sampling main cylinder, an air groove is annularly formed in the inner side wall surface of the sampling main cylinder, an inner cylinder is arranged on the inner side of theair groove; an extrusion transmission groove is annularly formed in the side wall of the top of the inner side of the inner cylinder; according to the soil remediation sampler for stratified samplingof soil, after Sampling is finished, a lower rod is controlled by control equipment to be lifted up; therefore, an extrusion block on the gas control equipment ascends and extrudes the interior of the inner cylinder to extrude gas above the extrusion block; the air groove, the extrusion transmission groove and an inflation groove are used for conducting, so that the air above the extrusion blockis impacted and extruded into a closed air bag on a closed device, the closed air bag is inflated and expanded to be reset and closed, and the effect of completely taking out sandy soil is achieved.

The invention relates to a method for remediating nickel and chlorinated organic compound combined polluted environmental water. The method comprises the following steps: (1) preparing bentonite-loaded zero-valent iron, namely, mixing bentonite, FeSO4.7H2O and NaBH4; stirring and reacting; washing with deoxidized water and ethyl alcohol; then freezing and drying in vacuum to obtain the bentonite-loaded zero-valent iron; (2) adjusting pH of Ni(II) and chlorinated organic compound combined polluted water to be 3-7; (3) adding the bentonite-loaded zero-valent iron prepared in step (1) to the combined polluted water in step (2) under inert gas protection. The method is simple in processes, low in cost, and free from secondary pollution to the environment, and is a simple, effective and low-cost method for remediating Ni(II) and chlorinated organic compound combined polluted water.

The intention provides a reactive distillation purifying method and device for removing carbon-containing impurities in chlorosilane, and belongs to the technical field of polycrystalline silicon production, wherein the reactive distillation tower device comprises a distillation section, a reaction section and a stripping section, the distillation section is filled with three sections of packing,the stripping section is filled with the packing, and the packing in the distillation section and the stripping section is structured packing; wherein a structural catalyst is arranged in the reactionsection, the stripping section is provided with a chlorine donor substance circulating device, a chlorosilane crude material is fed from the middle lower part of the distillation section, a chlorinedonor substance is fed from the upper part of the reaction section, and carbon-containing impurity methyl dichlorosilane in the chlorosilane crude material in the reaction section reacts with the chlorine donor under the action of the catalyst to generate high-boiling-point substance methyl trichlorosilane; the methyl trichlorosilane is finally extracted from the bottom of the tower, and high-purity chlorosilane is extracted from the side line of the middle upper part of the distillation section. The method solves the problem that the carbon-containing impurities in the chlorosilane are difficult to remove thoroughly under the existing process conditions, is simple to operate and low in investment cost, and the purity of the product chlorosilane can reach 99.999%.

The invention provides a detecting method for NIRS abnormal samples based on Monte Carlo cross validation. The detecting method for NIRS abnormal samples based on Monte Carlo cross validation comprises the following steps: (1) confirming the optimal principal component of the pretreated spectroscopic data using the group-outside-judging method and establishing an O-PLSR prediction model; (2) judging the stability of the O-PLSR prediction model; (3) establishing a large number of O-PLSR models randomly by means of MCCV and recognizing the strong influence point; (4) distinguishing the abnormal values in the strong influence points by two-trial-judging method; (5) verifying whether the abnormal samples are completely removed or not by means of MCCV method again. The detecting method for NIRS abnormal samples based on Monte Carlo cross validation can verify the abnormal samples more comprehensively and accurately, therefore, the completely removing of the abnormal samples can be ensured.

The invention relates to a blast furnace gas desulfurization purification system and method. The system comprises a heating device, an alkali spraying tower, a sintering device and a plurality of adsorption towers, wherein each adsorption tower is filled with a purification medium, a gas inlet of each adsorption tower is connected with a gas outlet of a TRT in an on-off manner, and a gas outlet of each adsorption tower is connected with a purified gas user in an on-off manner; a regeneration gas outlet of the heating device is connected with a gas outlet of each adsorption tower in an on-off manner, and the regeneration gas introduced into the adsorption towers is heated through the heating device; a gas inlet of the alkali spraying tower is connected with a gas inlet of each adsorption tower, and a gas outlet of the alkali spraying tower is connected with a gas inlet of each adsorption tower; a gas inlet of the sintering device is connected with gas inlets of the adsorption towers, and a heat source outlet of the sintering device is connected with a heat source inlet of the heating device. The technical problems of poor blast furnace gas purification effect and high investment cost are solved.

The invention relates to an alignment pattern, a semiconductor structure with the alignment pattern, and a manufacturing method of the semiconductor structure. The manufacturing method comprises the following steps of: arranging at least two standard pattern areas along a first direction, wherein each standard pattern area comprises at least two discrete sub-pattern areas, in the first direction,the distance between the adjacent sub-pattern areas in each standard pattern area is a first distance, the distance between the adjacent standard pattern areas is a second distance, and the second distance is larger than the first distance; and arranging shielding patterns, wherein the shielding patterns are located between the adjacent standard pattern areas, and gaps are formed between the shielding patterns and the adjacent standard pattern areas. According to the invention, the area of the open area in the alignment pattern can be reduced, and the defect problem caused by etching residuesis avoided, so that the alignment quality is improved.

The invention relates to chuck screw testing equipment. The chuck screw testing equipment comprises a circular vibrator, a linear feeder, a circular rotating disc, a detection mechanism and a materialscreening mechanism, and the linear feeder includes two sliding rods arranged in parallel and symmetrical and a limiting pressure rod located directly above a gap of the two sliding rods; a first adjusting rotary knob is arranged outside the two sliding rods, and the first adjusting rotary knob controls the two sliding rods to be relatively close or far apart; a second adjusting rotary knob is arranged outside the limiting pressure rod, and the second adjusting rotary knob controls the limiting pressure rod to approach or move away from the two sliding rods; an arc-shaped limiting pressure head is arranged at the lower end of the limiting pressure rod, a third adjusting rotary knob is arranged on the arc-shaped limiting pressure head, and the third adjusting rotary knob controls the arc-shaped limiting pressure head to raise or lower; and the material screening mechanism comprises an air injection winkling gun, an anti-leakage and anti-winkling part and a qualified piece deflector rodwhich are arranged in sequence in the rotating direction of a glass disk, and a muzzle of the air injection winkling gun is located at the top of a U-shaped clamping slot.

The invention provides a selecting process of regenerated polyester bottles. The selecting process comprises the following steps: A) disassembling polyester waste, selecting polyester bottles, and carrying out post-treatment on non-polyester bottles and impurities; B) cleaning the polyester bottles to remove label paper, bottle caps and impurities of the polyester bottles; C) manually selecting the cleaned polyester bottles to select qualified polyester bottles; and D) crushing and cleaning the polyester bottles obtained in the step C) to obtain regenerated polyester bottle sheets. According to the selecting process, impurities in the polyester waste are completely removed finally in a mode of preliminary selection, secondary selection and selection of selecting the polyester bottles first, and the selected polyester bottles are actually required polyester bottles, so that the quality of the regenerated polyester bottles is guaranteed.

The invention relates to a method and device for impurity removal and purification of dimethyldichlorosilane by reaction and rectification. A dimethyldichlorosilane crude material enters a tower through an inlet pipeline in a reaction section, the temperature of a stripping section is controlled, and the dimethyldichlorosilane crude material enters the reaction section upwards in a gas phase form;a chlorine source reactant enters the tower through a chlorine source reactant inlet pipeline in the reaction section, the temperature of a rectification section is controlled, and the dimethyldichlorosilane crude material enters the reaction section downwards in a liquid phase form; hydrogen-containing silane impurities in the dimethyldichlorosilane crude material react with the chlorine sourcereactant under action of a catalyst to generate a high-boiling-point substance; after the reaction, the high-boiling-point substance is extracted from the tower bottom through a tower bottom extraction pipeline; the chlorine source reactant enters the tower through a reactant return pipeline in the stripping section to supplement the chlorine source reactant, and the condensed gas phase at the tower top is intermittently extracted through an outlet of a gas phase pipeline; a part of the condensed chlorine source reactant flows back to the tower top through a tower top return pipeline, and a part of the condensed chlorine source reactant is extracted through a tower top liquid phase extraction pipeline. Hydrogen-containing silane is enriched by 10-100 times to obtain a high-purity dimethyldichlorosilane product.

The invention discloses a rust ring type corneal foreign body removing needle, and belongs to the technical field of medical instruments. The needle comprises a circumcision needle tube, a needle core, a holding handle and an adjusting wrench. By means of the mode, the problem that in the prior art, the rust ring is a part of the whole corneal lamellar collagenous fiber, the collagenous fiber needs to be cut off during removal, and the collagenous fiber of the rust ring foreign matter for a circle is difficult to cut off during needle tip sample removal or all other foreign matter removal at present can be solved. Corneal lamellar fibers are cut off after girdling, no obvious tight connection exists between layers relatively, separation is easy, and therefore the rust ring can be easily and completely scraped, cut and stripped through a rust ring scraping knife at the head end of the needle core.