The present invention provides a sputtering target containing a high concentration of Na, which can suppress discoloration, generation of spots, and abnormal discharge, and has high strength and is not easily broken, and a manufacturing method thereof. The sputtering target of the present invention has the following composition: the metal components other than F, S, and Se as the sputtering target contain Ga: 10-40 at%, Na: 1.0-15 at%, and the remainder is composed of Cu and unavoidable impurities. The composition contains Na in the state of Na compound composed of at least one of sodium fluoride, sodium sulfide and sodium selenide, the theoretical density ratio is 90% or more, the flexural strength is 100N / mm2 or more, and the volume resistivity is 1mΩ · cm or less, within an area of 1 cm2 on the target surface, less than one agglomerate of at least one of sodium fluoride, sodium sulfide, and sodium selenide of 0.05 mm2 or more exists on average.