The invention relates to the technical field of photoelectric materials, and discloses a
magnesium-doped
zinc oxide magnetron
sputtering target material and a preparation method thereof. The preparation method comprises the steps that 1,
zinc oxide powder is doped with
magnesium oxide powder and third oxide
powder, and then the mixed powder and an
ethanol solution are mixed so as to form
slurry; (2) ball milling is carried out on the
slurry, and then
drying and sieving are carried out so as to obtain powder for molding; (3) isostatic cool pressing is carried out on the powder so as to form a
green body; and (4) the
green body is slowly heated to 900-1150 DEG C, heat preservation is carried out for 30-90 minutes, then the
green body is quickly heated to the
sintering temperature of 1300-1450 DEG C, heat preservation is carried out for 120-480 minutes,
slow cooling is carried out so as to form a semi-finished product, and
cutting and
polishing are carried out so to obtain the
magnesium-doped
zinc oxide magnetron
sputtering target material. The target material has the advantages that the density is high, the
relative density is greater than 95% or above, meanwhile, the electrical resistivity is low and can reach 4*10<-2>, the resistance of the target material is far lower than the resistance of a target material in the prior art, the conductive effect is good, and the requirement for medium-frequency rapid
sputtering of a
coating production line can be met.