This invention provides a
halogen-free no-clean flux and its preparation method, belonging to the field of flux technology. The method includes the following steps: Step S1: L-
histidine and
itaconic acid are compounded and reacted, then concentrated under reduced pressure, dried, pulverized, and sieved to obtain a
histidine-
itaconic acid composite activator; Step S2:
Polyvinyl butyral is added to a mixed
solvent of isopropanol,
anhydrous ethanol, and
dipropylene glycol methyl
ether for
wetting, dispersion, and
dissolution, followed by the addition of hydrogenated
rosin and
triethyl citrate to obtain a resin-based solution; Step S3: The
histidine-
itaconic acid composite activator is added to a mixed
system of deionized water, isopropanol, and
anhydrous ethanol to obtain an activator solution; Step S4: The activator solution is slowly added to the resin-based solution, defoamed, filtered, and cured to obtain a
halogen-free no-clean flux. This invention achieves the goals of good
soldering activity, controllable residue, high
system uniformity, and good storage stability in
halogen-free no-clean flux.