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31results about How to "Solve process cost" patented technology

Manufacturing method of large-calibre seamless titanium alloy barrel body

The invention discloses a manufacturing method of a large-calibre seamless titanium alloy barrel body, which comprises the steps of: 1, casting: casting titanium alloy raw materials into a large-calibre titanium alloy barrel blank by using a vacuum smelting furnace and through a vacuum smelting method; 2, hot isostatic pressing: performing the hot isostatic pressing for the large-bore titanium alloy barrel blank in an inert protective atmosphere by using a hot isostatic pressing device; 3, mechanical machining: processing a chamfer angle for spinning at the head of the large-bore titanium alloy barrel blank after the hot isostatic pressing by using mechanical processing equipment to obtain a spinning barrel blank; 4, spinning: thermally spinning the mechanically processed spinning barrel blank with the total deformation rate not less than 60% for many times by using spinning equipment to obtain a large-bore seamless titanium alloy thin-wall barrel body; and 5, subsequent treatment. The production process has short process flow, high yield, low cost, high utilization rate of materials and easy realization, and the defects of the large-bore seamless titanium alloy barrel body, such as complex process, high cost, low yield and the like of the traditional production process can be effectively solved.
Owner:NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH

Industrial production system for producing high-silicon strip with magnetron sputtering continuous two-sided codeposition process

The invention discloses an industrialized production system for making a high-silicon steel strip by a process of magnetron sputtering continuous double-sided codeposition. The industrialized production system of a high-silicon silicon plate comprises a welding machine (3), a preheating chamber (4), a magnetron sputtering chamber (1), a diffusion chamber (5), a cooling chamber (6), and a coiler (7), which are sequentially arranged on a production line starting from the deliverty of the low-silicon silicon plate to the production system by an unwinding coiler (2) to the finish of the production of high-silicon silicon plate. The industrialized production system for making the silicon material by the process of the continuous double-sided codeposition, driven by the unwinding coiler (2), is capable of performing deposition on a the low-silicon silicon plate with a thickness of less than 0.35mm with silicon content of between 5 and 8 weight percent to by means of symmetrically disposing a plurality of cathode targets in the magnetron sputtering chamber, thereby achieving the aim of continuous deposition of silicon material with low energy consumption and high production efficiency. The industrialized production system solves the defect that the silicon plate of the commercialized Fe-6.5 weight percentage Si can only be produced by adopting a method of chemical gas-phase deposition.
Owner:BEIHANG UNIV

Method for purifying low-grade natural gypsum or gypsum tailings by recrystallization

The invention relates to the field of preparation of high purity gypsum and particularly relates to a method for purifying low-grade natural gypsum or gypsum tailings by recrystallization. The method provided by the invention mainly comprises the following six steps: crushing; screening; dissolving; crystallizing; washing; and drying. The method specifically comprises the following steps: crushing and screening the low-grade natural gypsum or gypsum tailings; then, adding the low-grade natural gypsum or gypsum tailings into an acid at special solubility; heating to a certain temperature till the low-grade natural gypsum or gypsum tailings is/are fully dissolved; carrying out solid-liquid separation to remove undissolved solid phase impurities while the solution is hot; cooling, recrystallizing a liquid phase at a relatively low temperature and carrying out solid-liquid separation; and washing and drying a filter cake to obtain the high purity gypsum. The liquid phase in the dissolving and crystallizing processes can be repeatedly used. According to the method provided by the invention, proper raw material granularity, solid liquid ratio, temperature and acid concentration are selected and the raw materials are dissolved and crystallized for a certain time to prepare gypsum with relatively high purity, so that the grade or performance of the gypsum is remarkably improved.
Owner:QINGHAI INST OF SALT LAKES OF CHINESE ACAD OF SCI

Method for producing electrolytic manganese from manganese carbonate ore with low manganese content and high iron content

The invention discloses a method for producing electrolytic manganese from manganese carbonate ore with low manganese content and high iron content. According to the method, the manganese carbonate ore with low manganese content and high iron content is mixed with manganese dioxide ore, and a direct leaching method is adopted. According to the technical scheme, the manganese carbonate ore is directly acid-leached to prepare a manganese sulfate solution, then the solution is prepared into electrolyte by a series of processes of neutralization, purification and filtering, and the electrolyte can enter an electrolytic bath for electrolysis by adding additives such as selenium dioxide, ammonium sulfite and the like. The method disclosed by the invention has the characteristics that a series of problems that reduction process equipment utilizing manganese dioxide ore to produce electrolytic manganese is large in investment, complex in process and high in cost, has serious production conditions and can not meet the requirements on environmental protection and the like for a long time are solved, and a new path for producing the electrolytic manganese from the manganese dioxide ore is provided; simultaneously, a new path for developing and utilizing the manganese carbonate ore with low manganese content and high iron content is also provided, so that the wastes can become valuables and national resources are fully utilized.
Owner:桂林翔云锰业有限责任公司

Method for biochemically treating coking wastewater

The invention discloses a method for biochemically treating coking wastewater. The method comprises the following steps of: pretreating coking wastewater; feeding pretreated coking wastewater into an anaerobic tank for anaerobic treatment; and feeding the treated wastewater into an aerobic three-phase fluidized bed for anaerobic treatment, wherein the pH of the anaerobic tank is between 6.0 and 7.5; the hydraulic retention time is between 8 and 30 hours; the pH of the aerobic three-phase fluidized bed is between 7.5 and 8.5; the hydraulic retention time is between 8 and 24 hours; the dissolved oxygen content is between 2 and 4mg/L; and effluent COD, ammonia nitrogen, volatile phenol and cyanide meet the steel industrial water pollutant effluent standard (GB13456-92) and the primary standard of the integrated wastewater effluent standard (GB 8978-1996). The method can effectively solve the problems of bad treatment effect, large amount of sludge, complicated process, high cost and the like caused by biochemically treating the coking wastewater by ammonia nitrogen and has the advantages of simple operation, low cost, economic feasibility, contribution to popularization, and capability of effectively improving and solving the problem of environment pollution caused by the coking wastewater.
Owner:南京洁水科技有限公司 +1

Forming method of semiconductor structure and forming method of transistor

The invention provides a forming method of a semiconductor structure and a forming method of a transistor. The forming method of the semiconductor structure comprises the steps that a semiconductor substrate is provided, the semiconductor substrate is made of an insulator upper semiconductor comprising a substrate, an insulation layer and a semiconductor layer; a hard mask layer is formed on the surface of the semiconductor substrate; part of the hard mask layer is removed, the rest of the hard mask layer serves as masks, forms a plurality of openings inside the semiconductor layer, and the surface of the insulation layer is exposed out; the side walls of the openings are etched by adopting the crystal orientation anisotropism wet process, and double-layer discrete nanowires are formed; then, the rest of the hard mask layer is removed, the insulation layer between the nanowires and the substrate is removed, and the double-layer discrete nanowires are suspended above the substrate; after the rest of the hard mask layer and the insulation layer are removed, thermal annealing is conducted on the nanowires so that the cross section of each nanowire becomes round. The forming method of the semiconductor structure is low in production cost, simple in process, and suitable for large-scale production.
Owner:SEMICON MFG INT (SHANGHAI) CORP

Preparation method for 3-(2,2-dichloroethyenyl)-2,2-dimethylcyclopropanecarboxylic acid

The invention provides a preparation method for 3-(2,2-dichloroethyenyl)-2,2-dimethylcyclopropanecarboxylic acid. The preparation method comprises the following steps: adding 200 g of trans-(+/-)-DV-chrysanthemic acid into 1000 to 2000 g of mother liquor under stirring and adjusting a pH value to 6.5 to 8.2 by using alkali so as to produce a trans-(+/-)-DV-chrysanthemate solution; dissolving 90 to 110 g of a resolving agent in water under stirring and adjusting a pH value to 2 to 5 by using acid so as to obtain an aqueous solution of the resolving agent; adding the aqueous solution of the resolving agent into the trans-(+/-)-DV-chrysanthemate solution drop by drop within 1 to 3 h under stirring to produce a solution including solid double salt; adding 200 to 400 g of a separating agent into the solution including the solid double salt under stirring and carrying out stirring to separate a solid double salt particle and a water phase; and adding acid under stirring to adjust the pH value of separated water phase liquid to 2 to 4 so as to form a solid and an aqueous solution, wherein the solid is 3-(2,2-dichloroethyenyl)-2,2-dimethylcyclopropanecarboxylic acid. The preparation method provided by the invention overcomes the problems of long production flow, complex process and high cost in conventional resolution methods for preparation of 3-(2,2-dichloroethyenyl)-2,2-dimethylcyclopropanecarboxylic acid.
Owner:正泓(盘锦)精细化工科技有限公司

Microwave amplifier and implementation method thereof

The invention discloses a microwave amplifier and an implementation method thereof, and belongs to the technical field of quantum mechanics, semiconductor physics and electronics. Polarization exciters in a transistor containing a heterojunction are excited to a high-energy level through pumping microwaves, and the polarization exciters excited to the high-energy level are downwards transitioned to a specified energy level in an energy level region by utilizing a chain effect of an input signal in an energy level transition process, so that amplification of input signal power is realized. Theproblems of crosstalk of a bias circuit of the direct-current bias amplifier, high circuit wiring requirement, severe direct-current voltage ripple interference and pulse amplifier working environmentrequirement, large size, complex process, high cost and the like are effectively solved; the microwave amplifier is realized by adopting a transistor manufactured by adopting a general semiconductorprocess, the amplifier is simple in structure and low in working temperature requirement, the pumping power can be provided in a space radiation form, and the microwave amplifier has very good flexibility.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

Steaming rack and steaming cabinet and oven having steaming rack

The invention relates to a steaming rack, a steaming cabinet having the steaming rack and an oven having the steaming rack. The steaming rack includes a frame, a cross beam, and a longitudinal beam; the frame is a rectangle formed through head-to-tail connection of metal pipes through welding; the cross beam is arranged between two opposite broad sides of the frame and fixed on the frame by usingthe metal pipes through welding, the frame and the cross beam form a base of the steaming rack, and the longitudinal beam is arranged between the two opposite long sides of the frame and fixed on thebase by using steel branches through welding. The frame and the cross beam of the steaming rack are made from the metal pipes and form the base together, the steel branches used for placing food are arranged on the base, and on one hand, the problem that the steaming rack made only from the steel branches is low in strength in the prior art is solved, on the other hand, the problem that in the prior art, the steaming rack made only from square pipes is complex in process and high in cost is solved. The steaming rack is high in strength and good in load-bearing ability, the processing technology is relatively simple, the processing cost is low, and the steaming rack is more suitable for large steaming cabinets and large ovens to use.
Owner:NANHAI BRANCH OF SHENZHEN GUOCHUANG MINGCHU COMML EQUIP MFG CO LTD

Silicone-rubber porous material array with elastic hollow fibers and preparing method thereof

The invention belongs to the technical field of porous-material additional materials, and particularly relates to a silicone-rubber porous material array with the elastic hollow fibers and a preparingmethod thereof. The porous material array comprises two layers or above of hollow fiber array structures, hollow fiber array structures of the layers adjacent up and down are intersected each other at a certain angle, and each layer of the hollow fiber array structure comprises multiple parallel elastic hollow fibers. The hollow fiber array structures obtained with the method serve as base materials, and formed buffering damping products or flexible electronic products have good compression and self-recovery capacity; different from an existing hollow silicone rubber manufacturing technology,the problems that in the prior art, the technology is complex, and the cost is high are solved, the silicone-rubber porous material array has the advantages of being simple in structure and capable of saving the labor cost, the time cost and the like, it is avoided that traditional hollow silicone rubber adopts a mold or a manual complex production technology, and different requirements of different users for 3D graphics, the geometric size and the like can be met.
Owner:JIANGNAN UNIV

RFLDMOS device and manufacturing method thereof

The invention provides a radio frequency (RF) laterally diffused metal oxide semiconductor (LDMOS) device and a manufacturing method thereof, which are characterized in that a substrate is provided, an epitaxial layer is formed on the substrate, a thick gate oxide layer is grown above the epitaxial layer, a source region forming region, a partial gate forming region close to a source and a partial drift region forming region close to a gate are opened by photoetching, and the thick gate oxide layer in the photoetching opening region is removed by utilizing a wet etching process. And forming undercuts at the two ends of the remaining thick gate oxide layer, growing a thin gate oxide layer above the epitaxial layer, forming a stepped gate oxide layer by the thin gate oxide layer and the thick gate oxide layer, and performing a subsequent process to form the stepped Faraday shielding case. According to the stepped Faraday shielding case, the breakdown voltage is considered, meanwhile, the hot carrier performance is improved, the resistance to ground of the Faraday shielding case is reduced, the reliability and the frequency characteristic of a device are effectively improved, and the single-layer Faraday shielding case can achieve the effect of a traditional Faraday shielding case with two layers or even three layers; the photoetching level of the Faraday shielding case is reduced, the process is simplified, and the cost is saved.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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