The application discloses a preparation method of two-dimensional material double-layer twisted-angle MoSe2 and two-dimensional material double-layer twisted-angle MoSe2. A double-tube limited
chemical vapor deposition system is adopted, a
silicon dioxide /
silicon wafer is used as a substrate, and the non-growth surface of the substrate is stacked back to back in an inner tube.
Molybdenum trioxide or
molybdenum chloride powder is used as a
molybdenum source, and
sodium chloride is added as a growth
promoter and placed on the upstream proximal end of the substrate.
Selenium powder is used as a
selenium source and placed in the outer tube upstream of the heat
radiation area. The carrier gas temperature rising rate is controlled to be 10-50 DEG C / min, only
inert gas is introduced in the temperature rising stage,
hydrogen is introduced to assist growth for 5-30 min after the temperature is raised to the growth temperature of 750-900 DEG C. Through salt assistance, double-tube limited space and precise
atmosphere time sequence control, effective regulation of the interlayer twist angle is realized, the two-dimensional material double-layer twisted-angle MoSe2 with uniform surface and high
crystallization quality is prepared, and the two-dimensional material double-layer twisted-angle MoSe2 has important significance for the research of new twisted-angle
optoelectronics and optoelectronic
integrated devices.