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246results about How to "Scale adjustable" patented technology

Nano hydrogenation catalysts composition and method of producing the same

The invention discloses nano-composite hydrogenation catalyst composition and a preparation method thereof. The catalyst composition includes active metal oxide and the composition of porous melt-resistant inorganic oxide. By utilizing the property that the precursors of the melt-resistant inorganic oxide, promoter oxide and the active metal oxide can form super-solubility nanometre micelle under the existence of surfactant with the VB value less than 1 and hydrocarbon composition, the invention facilitates the precursors and the hydroxide formed by precipitant to be in situ synthesized inside a micelle, so as to avoid the augment of the particle diameter of the oxide, and to facilitate the particle diameter to be in a single dispersed state. The catalyst of the invention has high specific surface area, large pore volume, large pore diameter, wide application range and good activity stability. The method of the invention has the advantages that the nano particle diameter is easy to be controlled, the distribution range of the particle diameter is narrow and the proportion of the carrier and the active component can be adjusted. The amount of the surfactant and the hydrocarbon component used for the method of the invention is less, and the cost is low.
Owner:CHINA PETROLEUM & CHEM CORP +1

Preparation method for scale-adjustable nano porous metal material

The invention discloses a preparation method for a scale-adjustable nano porous metal material and belongs to the field of porous material preparation. A pore-forming material is added to superfine metal powder, compression molding of the superfine metal powder is conducted, and then the superfine metal powder is sintered in a vacuum sintering furnace to obtain the porous material. The interior of the porous material contains multiple pore scales of nano-micron-milli, and the dual-adjustment of the inside pore scale of the porous material and the surface roughness scale of a metallic matrix can be achieved by controlling the parameters such as the grain size of the metal powder, the content and grain size of the pore-forming material, the sintering temperature and the holding time and the follow-up treatment process, so that the porous material has super hydrophilicity, and the efficiency of boiling heat transferring is significantly improved. The preparation method for the scale-adjustable nano porous metal material is low in cost, easy to operate and reliable in technology; the product can be used for a wick of a heat pipe, the evaporating surface of an evaporator and other boiling phase-changing heat transferring devices, so that the preparation method for the scale-adjustable nano porous metal material has good application prospects.
Owner:NORTH CHINA ELECTRIC POWER UNIV (BAODING)

Method for preparing primary column shaped horniness phase composite wear-resistant grinder dish

The invention discloses a method for preparing a composite wear resistant abrasive disk with a protogenous columnar hard phase. The wear resistant abrasive disk prepared by the method is formed by pouring and compounding a high hardness columnar alloy hard phase and a high tenacity base metal. The method comprises the following steps: weaving an alloy powder core wire material into a framework similar to the shape of the abrasive disk, and pouring smelted high temperature base material molten steel into a die cavity of an abrasive disk casting mould; putting the woven framework similar to the shape of the abrasive disk into the casting die cavity filled with the high temperature base metal molten steel quickly, performing cast-infiltration, sintering or melting on the woven alloy powder core wire material framework by using the heat of the high temperature base metal molten steel so as to generate a highly-dispersed high hardness columnar alloy hard phase in situ; and cooling the phase at room temperature to produce the composite wear resistant abrasive disk using high-tenacity and high-strength metal as a base and containing the metallurgically-combined protogenous columnar hard phase. The composite wear resistant abrasive disk with the protogenous columnar hard phase has ultra wear resistance and good impact resistant toughness, and the service life of the abrasive disk is close to or exceeds the imported products of the same type.
Owner:XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY

Semiconductor chip photo-electro-chemical mechanical polishing machining device

The invention discloses a semiconductor chip photo-electro-chemical mechanical polishing machining method and device. A chip is fixedly bonded to a polishing head through electrically-conductive adhesive. The lower portion of the chip is connected with a positive pole of an external power source through wires at an inner ring and an outer ring of an electrically-conductive sliding ring. A polishing pad is bonded to the bottom of a counter electrode disc. The counter electrode disc is fixed to the bottom of a polishing disc, and a through hole is machined in the position, corresponding to the polishing disc, of the counter electrode disc. The counter electrode disc is connected with a negative pole of the external power source through wires at the inner ring and the outer ring of an electrically-conductive sliding ring located above the counter electrode disc. Ultraviolet light transmitted by an ultraviolet light source can be cast to the surface of the chip through the through hole. Apolishing solution can be sprayed into the through hole and enter the contact area of the chip and the polishing pad. By means of the photo-electro-chemical mechanical polishing machining device, themachining method can be well implemented; the machining device has the advantages that the device is easy to operate and implement, and technological parameters can be flexibly adjusted; and the effects that in the practical machining process of the gallium nitride chip, the removal rate is high, and the surface quality achieved after machining is high are achieved.
Owner:DALIAN UNIV OF TECH

Graphite phased carbon nitride nano-ring material and its preparation method

The invention discloses a graphite phased carbon nitride (g-C3N4) nano-ring material and its preparation method, and belongs to the technical field of nanometer material preparation. The g-C3N4 nano-ring material is a ring structure, wherein the diameter of an outer ring is 20-1000 nm, the height of the outer ring is 20-200 nm, and the diameter of an internal circular hole is 10-800 nm. The preparation method includes steps of using melamine as a precursor and silicon dioxide nanosphere as a template; making the heated and sublimated precursor enter a high-temperature zone under the blowing of carrier gas to perform the heat polycondensation reaction; self-assembling a heat polycondensation product on the surface of the silicon dioxide nanosphere to form a g-C3N4 nano-ring; after cooling, removing the template by etching reagent, and drying the product to acquire the g-C3N4 nano-ring material. Compared with volume phase g-C3N4 formed by the heat polycondensation method, the g-C3N4 has higher specific surface area, more excellent photo-induced electron-cavity separating ability and better conductivity; thus the g-C3N4 can be used for photocatalysis hydrogen production, photocatalysis carbon dioxide reduction, and photocatalysis degraded organic matters, and other domains, and also can be used as carrier loaded catalyst or drug; therefore, the g-C3N4 nano-ring material has wide application prospect in energy source, environment and medicine domains.
Owner:DALIAN UNIV OF TECH

Method for preparing composite wear-resistant hammerhead

The invention discloses a method for preparing a high-ductility and high-abrasion composite hammerhead, which comprises the following steps: alloy dust core bars are bound into bundles and arranged in a hammerhead casting mould cavity, and the volume of the alloy dust core bars accounts for 20 to 60 percent of the total volume of the hammerhead; molten matrix metal is cast into the casting mould cavity, the alloy dust core bars are melted and dissolved under the heat effect of the matrix metal, a great number of alloy elements and the molten matrix metal generate metallurgical combination reaction so as to generate a highly dispersed alloy structure on the original position; and finally the alloy structure is cooled and solidified, and the bar-shaped hard phase is metallurgically and transitionally combined into a whole with the matrix metal, thereby preparing the composite hammerhead which takes the high-strength and high-ductility metal as the matrix and contains a certain number of metallurgically combined bar-shaped hard points. The composite hammerhead has high strength and high ductility of the matrix metal and high hardness and high wear resistance of the hard phase, can simultaneously bear high pressure and strong wear, and has the characteristics of long service life, low price and so on.
Owner:XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY

Photoelectrochemical mechanical polishing processing method of semiconductor wafer

The invention discloses a photoelectrochemical mechanical polishing processing method of a semiconductor wafer and a processing device. The method comprises the following steps that the wafer is fixedon a polishing head through a conductive adhesive in a bonding mode, and the wafer is connected to the positive electrode of an external power supply through leads of an inner ring and an outer ringof a conductive slip ring below the wafer; a polishing pad is adhered to the bottom of a counter electrode plate, the counter electrode plate is fixed at the bottom of a polishing plate, a through hole is formed in the position, corresponding to the polishing plate, of the counter electrode plate, and the counter electrode plate is connected to the negative electrode of the external power supply through the leads of the inner ring and the outer ring of the conductive slip ring above the counter electrode plate; and ultraviolet light emitted by an ultraviolet light source can irradiate the surface of the wafer through the through hole, and polishing solution can also be jetted into the through hole to be entered the contact area of the wafer and the polishing pad. The photoelectrochemical mechanical polishing processing device can well realize the processing method involved in the invention, and the processing device has the advantages that the operation is simple, the implementation iseasy, and the process parameters can be flexibly adjusted; and effects of being rapid in the removal rate and good in the processed surface quality can be obtained in actual processing of the galliumnitride wafers.
Owner:XIAMEN UNIV

Preparation method of multi-scale double-interface metal ceramic powder

The invention discloses a preparation method of multi-scale double-interface metal ceramic powder. The preparation method comprises the following steps of: preparing multi-scale ceramic particles by a mechanical alloying and screening process; preparing metal or alloy-coated multi-scale metal ceramic particles by a coating process; controlling the bonding state of a coated interface by a materialcomposition and thermal treatment process; performing glomeration granulation by matching coated metal ceramic particles with different scales so as to obtain double-interface metal ceramic particles; and performing densification and scale and density double grading so as to obtain metal ceramic powder with a multi-scale double-interface structure. The multi-scale double-interface metal ceramic powder prepared by the method has a double-interface structure in which a ceramic phase is combined with a coated phase and the interface binding between coated particles is controlled and the multi-scale characteristic of controllable scale and density distributions of ceramic particles and powder particles. The powder structure provided by the invention has novel design and high controllability. A metal ceramic material prepared from the powder has high intensity, high toughness and good market application prospect.
Owner:JIUJIANG UNIVERSITY

Simple and precise mixing device of injection molding machine

The invention discloses a simple and precise mixing device of an injection molding machine. The simple and precise mixing device comprises a mixing bin, wherein a fresh material hopper and an old material hopper are arranged above the mixing bin; the fresh material hopper is connected with a fresh material channel; an impeller A is rotationally arranged in the fresh material channel; one end face of the impeller A is connected with a locating rod; the locating rod is sleeved by a locating sleeve; the locating rod and the locating sleeve are connected together by a dowel pin to be capable of rotating together; a driving gear is arranged at the end part of the locating sleeve; the old material hopper is connected with an old material channel; an impeller B is rotationally arranged in the old material channel; a gear shaft is arranged at the end part of the impeller B; and the gear shaft and the driving gear are engaged and matched for transmission, so that the impeller B can rotate with the impeller A. Compared with the prior art, the device is simple in structure and low in manufacturing cost; a fixed quantity of reclaimed waste materials can be added into fresh materials; the resource usage efficiency is improved to the greatest extent; and the proportion of the fresh materials and the waste materials is adjustable.
Owner:宁波海洲机械有限公司

High specific surface area mesoporous zinc oxide nano-cluster and preparation method thereof

The invention relates to a high specific surface area mesoporous zinc oxide nano-cluster and a preparation method thereof. The obtained mesoporous zinc oxide nano-cluster is characterized by being formed by assembling and stacking hollow nanoparticles with the scale of 3-5 nm and the wall thickness of 1-2nm, and has the characteristics of high specific surface area, excellent photocatalytic performance and the like. The preparation method comprises the following steps: (1) mixing and stirring deionized water and ethylene glycol solution so as to obtain a mixed solution of ethylene glycol and water; (2) adding zinc nitrate, sodium hydroxide and sodium chloride aqueous solution into the mixed solution of ethylene glycol and water under rapid stirring conditions, and obtaining a reaction precursor solution for preparing the mesoporous zinc oxide nano-cluster; (3) reacting the reaction precursor solution for 1-10 hours while stirring at a room temperature, performing high-speed centrifugal separation and ultrasonic cleaning, drying, and calcining, so as to obtain the mesoporous zinc oxide nano-cluster. The high specific surface area mesoporous zinc oxide nano-cluster disclosed by the invention has important application values on aspects of photocatalytic degradation, drug delivery, bacteria resistance, environmental governance and protection and the like.
Owner:UNIV OF JINAN
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