The application provides application of
hafnium oxide-based
memristor in preparation of electronic switches and belongs to the technical field of microelectronic materials and devices. The
hafnium oxide-based
memristor used in preparation of the electronic switches has a bidirectional threshold characteristic, and the structure thereof comprises, from bottom to top, an
inert bottom
electrode, an intermediate layer, a buffer layer and an active top
electrode. The intermediate layer is a
hafnium oxide film subjected to
plasma treatment and annealing double treatment, the buffer layer is a silver
indium antimony tellurium film, and the active top
electrode is a
silver electrode. The
memristor can be converted from a
high resistance state to a
low resistance state at a
threshold voltage under positive and negative voltages, and can spontaneously recover to the
high resistance state when back scanning to a holding
voltage. The
hafnium oxide-based memristor is used in preparation of the electronic switches, the double treatment process and the AIST buffer layer complement each other, and the
hafnium oxide-based memristor is endowed with comprehensive performance, so that the application requirements of high-performance and low-power-consumption electronic switches can be fully met, and the practical development of the technology is promoted.