243results about How to "Optimal treatment process" patented technology

The invention provides a temperature adjustment device and method of a focusing ring. Energy is radiated onto the focusing ring by plasma and is downwards transferred to a base by a first thermal conduction pad, an insulation ring and a second thermal conduction pad, the first thermal conduction pad is in contact with a lower surface of the focusing ring, the insulation ring is in contact with a lower surface of the first thermal conduction pad, the second thermal conduction pad is in contact with a lower surface of the insulation ring, the base is in contact with the second thermal conduction pad, cooling and temperature reduction are performed by a cooling system arranged at the base, a heater which is arranged in a shielding ring is started to generate a controllable external heating source, the shielding ring is connected with the ground, energy of the external heating source is transferred to the focusing ring by the shielding ring, a third thermal conduction pad, an insulation ring and the first thermal conduction ring, the third thermal conduction pad is in contact with the shielding ring, the insulation ring is in contact with the third thermal conduction pad, and controllable temperature rise is performed on the focusing ring. By providing a good heat conduction cooling path and by combining a heating mode of a controllable parameter, fine control on a working temperature of the focusing ring is achieved, the focusing ring is tunable during etching, so that the process demand is satisfied.