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67 results about "Isocitric acid" patented technology

Isocitric acid is a structural isomer of citric acid. Salts and esters of isocitric acid are known as isocitrates. The isocitrate anion is a substrate of the citric acid cycle. Isocitrate is formed from citrate with the help of the enzyme aconitase, and is acted upon by isocitrate dehydrogenase.

Production process of high-quality ecological antibacterial health-care sock

The invention discloses a production process of a high-quality ecological antibacterial health-care sock. The production process of the high-quality ecological antibacterial health-care sock comprises the following steps of yarn manufacturing, sock weaving, seam allowance processing, reinforcing, setting, pre-drying, water bathing, drying and package detection. The production process of the high-quality ecological antibacterial health-care sock adopts the method that natural cotton fibers, aloe fibers and modal fibers are interlaced and makes full use of the good antibacterial effect of the aloe fibers, and the bottom of the sock adopts a flat structure, so that the fabric can meet the requirements for high air permeability and comfort. The aloe fibers are used for replacing traditional common viscose, and aloe isocitric acid calcium and other matter have the functions of improving the constitution, strengthening the heart, promoting blood circulation, softening hardened arteries, lowering the cholesterol content and expanding the blood capillaries, and have a certain inhibition effect on escherichia coli and staphylococcus aureus. Compared with the prior art, the high-quality ecological antibacterial health-care sock has good health-care performance and antibacterial performance.
Owner:浙江丰悦针纺有限公司

Amphiphilic Eu (III) complex, preparation method thereof and application thereof in sensing identification of citric acid/isocitric acid

The invention discloses an amphiphilic Eu (III) complex, a preparation method thereof and application thereof in sensing identification of citric acid/isocitric acid. The structural formula of the complex is shown in the specification; the complex is prepared by complexing a compound with lanthanide-series Eu (III), wherein the compound contain a double-alkyl-chain flexible tail group and a double pyridine carboxylic acid head group and serves as a ligand; the preparation method is simple and reaction conditions are mild. The amphiphilic Eu (III) complex has the characteristics that the fluorescent life is long, Stokes shift is large, and the coordination is unsaturated; the amphiphilic Eu (III) complex can be self-assembled in a water phase to form a vesicular supermolecule sensing interface with stable structure and uniform size, the vesicular supermolecule sensing interface is taken as a sensing platform, and by virtue of a synergetic complexation action between the Eu (III) complex assembled on the surfaces of vesicae and negative ions as well as the difference in capability of substituting water molecules bonded to Eu (III) ions by using carboxylic acid, the fluorescent sensitization degrees of the Eu (III) ions on the surface of the vesicae are differed, so that the high-sensitive and high-selectivity differentiation and identification for citric acid and isocitric acid and detection are achieved.
Owner:SHAANXI NORMAL UNIV

Wet electron chemical silicon-based material etching solution and preparation method thereof

The invention particularly relates to a wet electronic chemical silicon-based material etching solution. The solution comprises the following components in parts by weight: 25-45 parts of methanesulfonic acid; 10-30 parts of fluoride; 30-60 parts of a water-soluble acid; 0.5-9.5 parts of a complexing agent; 0.5-3.5 parts of a wetting agent; and the balance of water which makes the total parts of the components be 100 parts. The water-soluble acid comprises at least one of nitric acid, sulfuric acid, phosphoric acid, perchloric acid, sulfinic acid, formic acid, acetic acid, citric acid, isocitric acid and glycolic acid. The fluoride comprises at least one of trifluoromethanesulfonic acid, sodium fluoride, sodium hydrogen fluoride, ammonium fluoride, ammonium hydrogen fluoride, ammonium fluoborate, potassium fluoride, potassium hydrogen fluoride, aluminum fluoride, fluoboric acid, lithium fluoride, potassium fluoborate and calcium fluoride. The wet electron chemical silicon-based material etching solution can be used for safely, stably and efficiently etching a silicon substrate, can well solve the problem of insoluble byproducts generated in the etching process, has lower industrial safety risk in the production process, and lowers the cost required in a wastewater treatment procedure.
Owner:国创深圳新材料有限公司
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