The invention relates to the technical field of
monocrystalline silicon wafer texturing agents. The invention discloses a texturing additive for
monocrystalline silicon surface treatment. The texturing additive is prepared from the following components in percentage by weight: 0.01 to 1.0 percent of
sodium lignin sulfonate, 0.0001 to 0.01 percent of
sodium polynaphthaldehyde
sulfonate, 0.2 to 4 percent of
polyethylene glycol, 1.5 to 5 percent of
diethylene glycol butyl
ether, 1.5 to 2.5 percent of
potassium perfluorohexylsulfonate, 0.1 to 5 percent of
sodium diethylcaprylate and 82 to 96 percent of water. The invention further discloses a texturing agent for
monocrystalline silicon surface treatment, the texturing additive is added into a 1%-2%
sodium hydroxide or
potassium hydroxide solution, the mixture is mixed to be uniform at the temperature of 20-80 DEG C, and the
mass ratio of the texturing additive to the alkaline solution is (1-5): 100. The invention also discloses the monocrystalline
silicon surface texturing method. The method comprises the following steps: a monocrystalline
silicon wafer is pretreated; and the pretreated monocrystalline
silicon wafer is immersed in thetexturing agent for texturing, the texturing temperature is 70-90 DEG C, and the texturing time is 300-1200 s. The monocrystalline silicon surface treated by the texturing additive and the texturing agent achieves a good texturing effect, the textured surface size is controllable, the texturing rate is high, the
reflectivity is low, one side is clean, and the service life of the texturing agent islong.